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公开(公告)号：US20080298670A1
公开(公告)日：2008-12-04
申请号：US12153852
申请日：2008-05-27
申请人： Ryo Nakagaki , Minoru Harada , Takehiro Hirai
发明人： Ryo Nakagaki , Minoru Harada , Takehiro Hirai
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/10061 , G06T2207/30148
摘要： As a result of the improvement in throughput of review SEMs, the volume of defect image data which are collected in a semiconductor mass production line becomes larger. In order to achieve efficiency in management (deletion, search, display, and the like) of the image data in response to the above circumstance, a review SEM according to the present invention is configured to judge the importance levels of defect images taken and the like from information such as the classification results of the defect images, the defect feature computed from the defect images, and the imaging states of the defect images and to provide each of the defect images with the importance level and the like as supplementary information so that a large quantity of image data is managed on the basis of the supplementary information.
摘要翻译： 作为SEM的生产能力提高的结果，在半导体批量生产线中收集的缺陷图像数据的体积变大。 为了根据上述情况实现图像数据的管理（删除，搜索，显示等）的效率，根据本发明的评论SEM被配置为判断所拍摄的缺陷图像的重要性水平和 类似于诸如缺陷图像的分类结果，从缺陷图像计算的缺陷特征和缺陷图像的成像状态等信息，并且将每个缺陷图像作为补充信息提供重要度等，使得 基于补充信息来管理大量的图像数据。
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公开(公告)号：US20140072204A1
公开(公告)日：2014-03-13
申请号：US14112105
申请日：2012-04-16
申请人： Yohei Minekawa , Yuji Takagi , Minoru Harada , Takehiro Hirai , Ryo Nakagaki
发明人： Yohei Minekawa , Yuji Takagi , Minoru Harada , Takehiro Hirai , Ryo Nakagaki
CPC分类号： G06T7/001 , G01N21/9501 , G01N23/225 , G01N2223/421 , G01N2223/611 , G01N2223/646 , G06K9/6267 , G06T5/00 , G06T2207/10061 , G06T2207/30148 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： In automatic defect classification, a classification recipe must be set for each defect observation device. If a plurality of devices operate at the same stage, the classification class in the classification recipes must be the same. Problems have arisen whereby differences occur in the classification class in different devices when a new classification recipe is created. This defect classification system has a classification recipe storage unit; an information specification unit, the stage of a stored image, and device information. A corresponding defect specification unit specifies images of the same type of defect from images obtained from different image pickup devices at the same stage. An image conversion unit converts the images obtained from the different image pickup devices at the same stage into comparable similar images; and a recipe update unit records the classification classes in the classification recipes corresponding to the specified images of the same type of defect.
摘要翻译： 在自动缺陷分类中，必须为每个缺陷观察装置设定分类处方。 如果多个设备在同一阶段进行操作，则分类配方中的分类等级必须相同。 当创建新的分类配方时，出现了在不同装置中的分类等级中发生差异的问题。 该缺陷分类系统具有分类配方存储单元; 信息指定单元，存储图像的级和设备信息。 相应的缺陷指定单元从在相同阶段从不同图像拾取装置获得的图像中指定相同类型的缺陷的图像。 图像转换单元将从相同阶段的不同图像拾取装置获得的图像转换成可比较的相似图像; 并且配方更新单元将分类类别记录在与相同类型的缺陷的指定图像相对应的分类配方中。
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公开(公告)号：US20130294680A1
公开(公告)日：2013-11-07
申请号：US13979450
申请日：2011-12-07
申请人： Minoru Harada , Ryo Nakagaki , Takehiro Hirai
发明人： Minoru Harada , Ryo Nakagaki , Takehiro Hirai
IPC分类号： G06T7/00
CPC分类号： G06T7/0004 , G01N21/956 , G01N2021/8887 , G01N2223/401 , G01N2223/418 , G06T7/11 , G06T2207/10061 , G06T2207/30148 , H01L22/12 , H01L22/20
摘要： In an apparatus for automatically classifying an image picked up of a defect on a semiconductor wafer according to user defined class, when images picked up by a plurality of different observation apparatuses are inputted in a mixed manner, the defect image classification accuracy rate decreases due to image property differences corresponding to differences in the observation apparatuses. In an automatic image classification apparatus supplied with defect images picked up by a plurality of observation apparatuses, when preparing a recipe, image process parameters are adjusted and a classification discriminating surface is prepared for each observation apparatus. When classifying an image, the observation apparatus that picked up a defect image is identified based on accompanying information or the like of the image, and an image process and a classification process are performed by using the image process parameters and the classification discriminating surface corresponding to the observation apparatus that picked up the image. In order to efficiently adjust the image process parameters for each observation apparatus, appropriate image process parameters are automatically adjusted on the basis of an exemplified defect area. The image process parameters adjusted in a given observation apparatus may be used for setting the image process parameters for another observation apparatus.
摘要翻译： 在根据用户定义的类别自动分类在半导体晶片上的缺陷拍摄的图像的装置中，当以混合方式输入由多个不同的观察装置拾取的图像时，缺陷图像分类精度率由于 对应于观察装置的差异的图像特性差异。 在提供有由多个观察装置拍摄的缺陷图像的自动图像分类装置中，在准备配方时，调整图像处理参数，并为每个观察装置准备分类鉴别表面。 当对图像进行分类时，基于图像的伴随信息等识别拾取缺陷图像的观察装置，并且通过使用图像处理参数和对应于图像处理参数的分类识别表面来执行图像处理和分类处理 拾取图像的观察装置。 为了有效地调整每个观察装置的图像处理参数，基于示例的缺陷区域自动调整适当的图像处理参数。 在给定观察装置中调整的图像处理参数可以用于设置用于另一观察装置的图像处理参数。
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公开(公告)号：US20130108147A1
公开(公告)日：2013-05-02
申请号：US13639103
申请日：2011-04-01
申请人： Minoru Harada , Ryo Nakagaki , Takehiro Hirai , Naoki Hosoya
发明人： Minoru Harada , Ryo Nakagaki , Takehiro Hirai , Naoki Hosoya
IPC分类号： G06T7/00
CPC分类号： G06T7/0004 , G06T7/001 , G06T2207/10061 , G06T2207/30148 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Disclosed is a method of inspecting an object to be inspected in a semiconductor manufacturing process, for resolving the problem to increase defect detection sensitivity. An image capture means is used to image capture a designated area of the object to be inspected; a defect is detected in the captured image; a circuit pattern is recognized from the captured image; a characteristic value is computed, relating to an image tone and shape, from the detected defect; a characteristic value is computed, relating to the image tone and shape, from the recognized circuit pattern; either a specified defect or circuit pattern is filtered and extracted from the detected defect and the recognized circuit pattern; a mapping characteristic value is determined from the characteristic value of either the filtered and extracted specified defect or circuit pattern; and the distribution of the determined characteristic values is displayed onscreen in a map format.
摘要翻译： 公开了一种在半导体制造过程中检查被检查物体的方法，用于解决问题以增加缺陷检测灵敏度。 图像捕捉装置用于对要检查的对象的指定区域进行图像捕获; 在捕获的图像中检测到缺陷; 从捕获的图像识别电路图案; 从检测到的缺陷中计算与图像色调和形状相关的特征值; 根据识别的电路图案计算与图像色调和形状相关的特征值; 从检测到的缺陷和识别的电路图案中滤出并提取指定的缺陷或电路图案; 根据滤波和提取的指定缺陷或电路图案的特征值确定映射特征值; 并且以映射格式在屏幕上显示所确定的特征值的分布。
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公开(公告)号：US08824773B2
公开(公告)日：2014-09-02
申请号：US13515643
申请日：2010-11-19
CPC分类号： H01J37/26 , G01N23/22 , G01N2223/421 , G01N2223/6116 , G01N2223/6466 , G06T7/0004 , G06T2200/24 , G06T2207/10061 , G06T2207/20081 , G06T2207/30148
摘要： A defect observation device including an input-output unit supplied with information of a taught defect, and information of an ideal output of the taught defect, and configured to display a processing result based upon a determined image processing parameter set; and an automatic determination unit configured to: select image processing parameter sets which are less in number than the total number of all image processing parameter sets, out of all image processing parameter sets, calculate image processing results on an input defect image, by using the selected image processing parameter sets, calculate a coincidence degree for each of the selected image processing parameter sets, estimate distribution of an index value in all image processing parameter sets from distribution of the coincidence degree for the selected image processing parameter sets, and determine an image processing parameter set to have a high coincidence degree out of all image processing parameter sets.
摘要翻译： 一种缺陷观察装置，包括：提供教导缺陷的信息的输入输出单元和教导缺陷的理想输出的信息，并且被配置为基于确定的图像处理参数集显示处理结果; 以及自动确定单元，被配置为：在所有图像处理参数组中，选择数量少于所有图像处理参数组的总数的图像处理参数组，通过使用所述图像处理参数组来计算输入缺陷图像上的图像处理结果 选择的图像处理参数组，对所选择的图像处理参数组中的每一个计算一致度，根据所选择的图像处理参数组的重合程度的分布来估计所有图像处理参数组中的索引值的分布，并且确定图像 处理参数设置为在所有图像处理参数集中具有高重合度。
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公开(公告)号：US20130140457A1
公开(公告)日：2013-06-06
申请号：US13515643
申请日：2010-11-19
IPC分类号： H01J37/26
CPC分类号： H01J37/26 , G01N23/22 , G01N2223/421 , G01N2223/6116 , G01N2223/6466 , G06T7/0004 , G06T2200/24 , G06T2207/10061 , G06T2207/20081 , G06T2207/30148
摘要： A defect observation device supplied with a taught defect and an ideal output obtained by conducting image processing on the taught defect as its input and capable of conducting work of setting image processing parameters required to classify defect kinds easily and fast is provided.The defect observation device includes an input-output unit 123 which is supplied with information of a taught defect and information of an ideal output of the taught defect and which displays a processing result based upon a determined image processing parameter set, and an automatic determination unit 124 for selecting image processing parameter sets which are less in number than the total number of all image processing parameter sets, out of all image processing parameter sets, calculating image processing results on an input defect image, by using the selected image processing parameter sets, calculating a coincidence degree for each of the selected image processing parameter sets, estimating distribution of an index value in all image processing parameter sets from distribution of the coincidence degree for the selected image processing parameter sets, and determining an image processing parameter set having a high coincidence degree out of all image processing parameter sets.
摘要翻译： 提供了一种缺陷观察装置，其提供了教导缺陷和通过对教导缺陷进行图像处理而获得的理想输出作为其输入并且能够进行设置容易且快速地分类缺陷种类所需的图像处理参数的工作。 缺陷观察装置包括输入输出单元123，该输入输出单元123被提供有教导缺陷的信息和教导缺陷的理想输出的信息，并且基于确定的图像处理参数集显示处理结果;以及自动确定单元 124，用于选择数量少于所有图像处理参数组的总数的图像处理参数组，在所有图像处理参数组中，通过使用所选择的图像处理参数集计算输入缺陷图像上的图像处理结果， 计算所选择的图像处理参数组中的每一个的一致度，根据所选择的图像处理参数组的一致度分布来估计所有图像处理参数组中的索引值的分布，并且确定具有高的图像处理参数组 所有图像处理参数集合的重合度。
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公开(公告)号：US09082585B2
公开(公告)日：2015-07-14
申请号：US13143345
申请日：2009-11-27
申请人： Go Kotaki , Atsushi Miyamoto , Ryo Nakagaki , Takehiro Hirai
发明人： Go Kotaki , Atsushi Miyamoto , Ryo Nakagaki , Takehiro Hirai
CPC分类号： H01J37/222 , G06T7/001 , G06T2207/10061 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2817 , H01L22/12
摘要： An imaging region of a high-magnification reference image capable of being acquired in a low-magnification field without moving a stage from a position at which a defective region has been imaged at a low magnification is searched for and if the search is successful, an image of the imaging region itself is acquired and the high-magnification reference image is acquired. If the search is unsuccessful, the imaging scheme is switched to that in which the high-magnification reference image is acquired from a chip adjacent to the defective region.
摘要翻译： 搜索能够在低放大倍率领域中获取的高倍率参考图像的成像区域，而不将舞台从低倍率下的缺陷区域成像的位置移动，并且如果搜索成功，则 获取成像区域本身的图像并获取高倍率参考图像。 如果搜索不成功，则将成像方案切换到从与缺陷区相邻的芯片获取高倍率参考图像的方案。
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公开(公告)号：US20110285839A1
公开(公告)日：2011-11-24
申请号：US13143345
申请日：2009-11-27
申请人： Go Kotaki , Atsushi Miyamoto , Ryo Nakagaki , Takehiro Hirai
发明人： Go Kotaki , Atsushi Miyamoto , Ryo Nakagaki , Takehiro Hirai
IPC分类号： H04N7/18
CPC分类号： H01J37/222 , G06T7/001 , G06T2207/10061 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2817 , H01L22/12
摘要： An imaging region of a high-magnification reference image capable of being acquired in a low-magnification field without moving a stage from a position at which a defective region has been imaged at a low magnification is searched for and if the search is successful, an image of the imaging region itself is acquired and the high-magnification reference image is acquired. If the search is unsuccessful, the imaging scheme is switched to that in which the high-magnification reference image is acquired from a chip adjacent to the defective region.
摘要翻译： 搜索能够在低放大倍率领域中获取的高倍率参考图像的成像区域，而不将舞台从低倍率下的缺陷区域成像的位置移动，并且如果搜索成功，则 获取成像区域本身的图像并获取高倍率参考图像。 如果搜索不成功，则将成像方案切换到从与缺陷区相邻的芯片获取高倍率参考图像的方案。
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19.发明授权公开(公告)号：US09335277B2
公开(公告)日：2016-05-10
申请号：US14239653
申请日：2012-07-09
申请人： Ryo Nakagaki , Takehiro Hirai , Kenji Obara
发明人： Ryo Nakagaki , Takehiro Hirai , Kenji Obara
IPC分类号： G06K9/00 , G01N21/95 , G01N23/225 , H01L21/66
CPC分类号： G01N21/9501 , G01N23/2251 , G01N2223/6116 , H01L22/12
摘要： A region-of-interest determination apparatus includes: a calculation unit and a region determination unit. The calculation unit calculates a degree of a defect based on at least a plurality of kinds of defect attribute information regarding defect data. The defect data includes an image corresponding to a defect position detected on a specimen by inspection thereof or an image corresponding to a defect position predicted to be likely to develop a defect on the specimen, where both images are obtained by imaging. The region determination unit extracts the defect data of which the degree is higher than a predetermined level, and determines the region to be observed or inspected on the specimen based on the extracted defect data.
摘要翻译： 感兴趣区域确定装置包括：计算单元和区域确定单元。 计算单元基于关于缺陷数据的至少多种缺陷属性信息来计算缺陷程度。 缺陷数据包括通过检查对应于在样本上检测到的缺陷位置的图像，或者与通过成像获得两个图像而被预测为可能发生样本上的缺陷的缺陷位置相对应的图像。 区域确定单元提取程度高于预定水平的缺陷数据，并且基于提取的缺陷数据确定样本上要观察或检查的区域。
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20.发明申请公开(公告)号：US20140198975A1
公开(公告)日：2014-07-17
申请号：US14239653
申请日：2012-07-09
申请人： Ryo Nakagaki , Takehiro Hirai , Kenji Obara
发明人： Ryo Nakagaki , Takehiro Hirai , Kenji Obara
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N23/2251 , G01N2223/6116 , H01L22/12
摘要： The present invention aims at efficiently determining the partial regions to be inspected with high sensitivity and measured with high accuracy.A region-of-interest determination apparatus includes: a calculation unit which calculates the incidence of a defect based on at least a plurality of kinds of defect attribute information regarding defect data, the defect data including an image corresponding to a defect position detected on a specimen by inspection thereof or an image corresponding to a defect position predicted to be likely to develop a defect on the specimen, both images being obtained by imaging; and a region determination unit which extracts the defect data of which the incidence is higher than a predetermined level, and determines the region to be observed or inspected on the specimen based on the extracted defect data.
摘要翻译： 本发明旨在以高灵敏度有效地确定待检查的部分区域并以高精度测量。 感兴趣区域确定装置包括：计算单元，其基于关于缺陷数据的至少多种缺陷属性信息来计算缺陷的发生率，所述缺陷数据包括与在 通过检查检查样本或与被预测为可能在样本上产生缺陷的缺陷位置相对应的图像，两个图像通过成像获得; 以及区域确定单元，其提取入射高于预定水平的缺陷数据，并且基于所提取的缺陷数据来确定在样本上观察或检查的区域。
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