公开(公告)号：US11979973B2

公开(公告)日：2024-05-07

申请号：US17163945

申请日：2021-02-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dohyung Kim ,  Seongchul Hong ,  Insung Kim ,  Jinhong Park ,  Jungchul Lee

IPC: H05G2/00 ,  G03F7/00 ,  H01L21/268

CPC classification number: H05G2/008 ,  H01L21/268 ,  G03F7/70033

Abstract: Disclosed are semiconductor manufacturing apparatuses and operating methods thereof. The semiconductor manufacturing apparatus includes an oscillation unit that includes a first seed laser, a second seed laser, and a seed module, wherein the first seed laser oscillates a first pulse, and wherein the second seed laser oscillates a second pulse, and an extreme ultraviolet generation unit configured to use the first and second pulses to generate extreme ultraviolet light. The seed module includes a plurality of mirrors configured to allow the first and second pulses to travel along first and second paths, respectively, and a pulse control optical system including a first optical element, a second optical element, and a third optical element. The pulse control optical system is on the second path that does not overlap the first path. The third optical element includes a lens between the first optical element and the second optical element.

公开(公告)号：US20210385932A1

公开(公告)日：2021-12-09

申请号：US17163945

申请日：2021-02-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dohyung Kim ,  Seongchul Hong ,  Insung Kim ,  Jinhong Park ,  Jungchul Lee

IPC: H05G2/00 ,  H01L21/268

Abstract: Disclosed are semiconductor manufacturing apparatuses and operating methods thereof. The semiconductor manufacturing apparatus includes an oscillation unit that includes a first seed laser, a second seed laser, and a seed module, wherein the first seed laser oscillates a first pulse, and wherein the second seed laser oscillates a second pulse, and an extreme ultraviolet generation unit configured to use the first and second pulses to generate extreme ultraviolet light. The seed module includes a plurality of mirrors configured to allow the first and second pulses to travel along first and second paths, respectively, and a pulse control optical system including a first optical element, a second optical element, and a third optical element. The pulse control optical system is on the second path that does not overlap the first path. The third optical element includes a lens between the first optical element and the second optical element.

公开(公告)号：US09642234B2

公开(公告)日：2017-05-02

申请号：US15064942

申请日：2016-03-09

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seungkoo Lee ,  Insung Kim

IPC: H05G2/00 ,  G02B19/00

CPC classification number: H05G2/006 ,  G02B19/0095 ,  H05G2/008

Abstract: Described is an extreme ultraviolet (EUV) light generator apparatus. The EUV light generator apparatus includes a droplet nozzle, a central electromagnet including a central coil wound around the droplet nozzle, and a droplet generator including side electromagnets around the central electromagnet.

公开(公告)号：US09078334B2

公开(公告)日：2015-07-07

申请号：US14105654

申请日：2013-12-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hoyeon Kim ,  Insung Kim ,  Jinho Jeon

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/006 ,  G03F7/70916 ,  H05G2/008

Abstract: An extreme ultraviolet light (EUL) source device is disclosed, the device comprising: a chamber in which a gas flow and a droplet stream are provided; a droplet generator through which target material is changed into the droplet stream; and a shroud positioned along the droplet stream, the shroud shielding the droplet stream from the gas flow, wherein the droplet stream is irradiated by laser to produce plasma and generate an extreme ultraviolet light. The shroud includes flow guide surface features that guide accumulated target material away from a collector mirror that reflects and focuses the EUL.

Abstract translation: 公开了一种极紫外光（EUL）源装置，该装置包括：设置有气流和液滴流的室; 目标材料通过该液滴发生器变成液滴流; 以及沿着液滴流定位的护罩，所述护罩屏蔽来自所述气流的液滴流，其中所述液滴流被激光照射以产生等离子体并产生极紫外光。 护罩包括引导表面特征，其引导累积的目标材料远离反射和聚焦EUL的收集器反射镜。