公开(公告)号：US11835850B2

公开(公告)日：2023-12-05

申请号：US17173245

申请日：2021-02-11

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Sanghyun Kim ,  Jinho Jeon

IPC分类号： G03F1/24 ,  G03F1/58 ,  G03F1/60 ,  H01L21/033

CPC分类号： G03F1/24 ,  G03F1/58 ,  G03F1/60 ,  H01L21/0332 ,  H01L21/0337

摘要： A reticle in an apparatus for extreme ultraviolet (EUV) exposure includes a substrate having an image area and a black border area surrounding the image area, a multi-layer structure on the image area and the black border area of the substrate, the multi-layer structure to reflect EUV light, a capping layer covering the multi-layer structure, first absorber layer patterns on the capping layer in the image area and the black border area, and an absorber structure on the capping layer in the black border area, the absorber structure including one of the first absorber layer patterns, a hard mask pattern, and a second absorber layer pattern sequentially stacked, the absorber structure covering an entire upper surface of the capping layer in the black border area.

公开(公告)号：US20140319387A1

公开(公告)日：2014-10-30

申请号：US14105654

申请日：2013-12-13

申请人： Samsung Electronics Co., Ltd.

发明人： Hoyeon Kim ,  Insung Kim ,  Jinho Jeon

IPC分类号： H05G2/00

CPC分类号： H05G2/006 ,  G03F7/70916 ,  H05G2/008

摘要： An extreme ultraviolet light (EUL) source device is disclosed, the device comprising: a chamber in which a gas flow and a droplet stream are provided; a droplet generator through which target material is changed into the droplet stream; and a shroud positioned along the droplet stream, the shroud shielding the droplet stream from the gas flow, wherein the droplet stream is irradiated by laser to produce plasma and generate an extreme ultraviolet light. The shroud includes flow guide surface features that guide accumulated target material away from a collector mirror that reflects and focuses the EUL.

摘要翻译： 公开了一种极紫外光（EUL）源装置，该装置包括：设置有气流和液滴流的室; 目标材料通过该液滴发生器变成液滴流; 以及沿着液滴流定位的护罩，所述护罩屏蔽来自所述气流的液滴流，其中所述液滴流被激光照射以产生等离子体并产生极紫外光。 护罩包括引导表面特征，其引导累积的目标材料远离反射和聚焦EUL的收集器反射镜。

公开(公告)号：US09078334B2

公开(公告)日：2015-07-07

申请号：US14105654

申请日：2013-12-13

申请人： Samsung Electronics Co., Ltd.

发明人： Hoyeon Kim ,  Insung Kim ,  Jinho Jeon

IPC分类号： H05G2/00 ,  G03F7/20

CPC分类号： H05G2/006 ,  G03F7/70916 ,  H05G2/008

摘要： An extreme ultraviolet light (EUL) source device is disclosed, the device comprising: a chamber in which a gas flow and a droplet stream are provided; a droplet generator through which target material is changed into the droplet stream; and a shroud positioned along the droplet stream, the shroud shielding the droplet stream from the gas flow, wherein the droplet stream is irradiated by laser to produce plasma and generate an extreme ultraviolet light. The shroud includes flow guide surface features that guide accumulated target material away from a collector mirror that reflects and focuses the EUL.

摘要翻译： 公开了一种极紫外光（EUL）源装置，该装置包括：设置有气流和液滴流的室; 目标材料通过该液滴发生器变成液滴流; 以及沿着液滴流定位的护罩，所述护罩屏蔽来自所述气流的液滴流，其中所述液滴流被激光照射以产生等离子体并产生极紫外光。 护罩包括引导表面特征，其引导累积的目标材料远离反射和聚焦EUL的收集器反射镜。