公开(公告)号：US20210001357A1

公开(公告)日：2021-01-07

申请号：US16918341

申请日：2020-07-01

Applicant: SEMES CO., LTD.

Inventor： Chang Suk OH ,  Woo Sin JUNG ,  UnKyu KANG

IPC: B05B1/16 ,  B08B7/04 ,  B08B3/08 ,  B05B15/555 ,  G03F7/16

Abstract: An apparatus for performing liquid treatment for a substrate is provided. The apparatus for performing the liquid treatment for the substrate may include a housing having a treatment space, a substrate support unit to support and rotate the substrate in the treatment space, a liquid feeding unit including a nozzle device including a central exhaust port and multiple first outer exhaust ports, which are provided in a shape of a ring to form a concentric circle with the central exhaust port to feed mutually different treating liquids onto the substrate through respective exhaust ports, and a controller to control the liquid feeding unit.