Transverse ultra-thin insulated gate bipolar transistor having high current density
    12.
    发明授权
    Transverse ultra-thin insulated gate bipolar transistor having high current density 有权
    具有高电流密度的横向超薄绝缘栅双极晶体管

    公开(公告)号:US09240469B2

    公开(公告)日:2016-01-19

    申请号:US14439715

    申请日:2012-12-27

    Abstract: A transverse ultra-thin insulated gate bipolar transistor having current density includes: a P substrate, where the P substrate is provided with a buried oxide layer thereon, the buried oxide layer is provided with an N epitaxial layer thereon, the N epitaxial layer is provided with an N well region and P base region therein, the P base region is provided with a first P contact region and an N source region therein, the N well region is provided with an N buffer region therein, the N well region is provided with a field oxide layer thereon, the N buffer region is provided with a P drain region therein, the N epitaxial layer is provided therein with a P base region array including a P annular base region, the P base region array is located between the N well region and the P base region, the P annular base region is provided with a second P contact region and an N annular source region therein, and the second P contact region is located in the N annular source region. The present invention greatly increases current density of a transverse ultra-thin insulated gate bipolar transistor, thus significantly improving the performance of an intelligent power module.

    Abstract translation: 具有电流密度的横向超薄绝缘栅双极晶体管包括:P基板,其中P基板在其上设置有掩埋氧化物层,所述掩埋氧化物层在其上设置有N外延层,提供N外延层 在其中具有N阱区域和P基极区域,P基极区域中设置有第一P接触区域和N源极区域,N阱区域中设置有N个缓冲区域,N阱区域设置有 在其上的场氧化物层,N缓冲区在其中设置有P漏极区,N外延层中设置有包括P环状基极区的P基区阵列,P基区阵列位于N阱之间 区域和P基区域中,P环状基部区域设置有第二P接触区域和N环状源极区域,第二P接触区域位于N环状源极区域中。 本发明大大增加了横向超薄绝缘栅双极晶体管的电流密度,从而显着提高了智能功率模块的性能。

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