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    Window molding apparatus and method of molding window using the same
    14.
    发明授权
    Window molding apparatus and method of molding window using the same 有权

    公开(公告)号：US11135752B2

    公开(公告)日：2021-10-05

    申请号：US15863085

    申请日：2018-01-05

    Applicant: Samsung Display Co., Ltd.

    Inventor： Hyunseung Seo ,  Jonghwan Cho ,  Woojin Cho

    IPC: B29C45/26 ,  B29C45/03 ,  H05K5/00 ,  H05K5/03 ,  B29C45/00 ,  B29C45/33 ,  B29C45/44 ,  B29L31/00

    Abstract: A window molding apparatus includes an upper mold, a lower mold under the upper mold, and a side mold under the upper mold and adjacent to at least one side of the lower mold. The upper mold includes a first surface, the lower mold includes a second surface having a portion facing the first surface, and the side mold includes a third surface. The first surface includes a first flat surface and a first bent surface extending from the first flat surface, the second surface includes a second flat surface facing the first flat surface and a second bent surface extending from the second flat surface, and the third surface includes a third bent surface contacting one end of the first bent surface and facing the second bent surface.

    Window and display device having the same
    16.
    发明授权
    Window and display device having the same 有权

    公开(公告)号：US10224502B2

    公开(公告)日：2019-03-05

    申请号：US15178345

    申请日：2016-06-09

    Applicant: Samsung Display Co., Ltd.

    Inventor： Jonghwan Cho ,  Hyunseung Seo

    IPC: H01L51/52 ,  H01L51/00 ,  B05D7/00 ,  G06F1/16 ,  H04M1/02

    Abstract: A display device including a display panel and a window. The display panel includes a first curved display portion. The window covers the display panel and includes a base substrate having a light transmittance. The base substrate includes a bent portion. The bent portion is defined by bending at least a portion of the base substrate and covers the first curved display portion. The base substrate includes a composition material comprising a plurality of different polymer materials.

    PLASMA TREATMENT APPARATUS AND METHOD OF PLASMA TREATING A SUBSTRATE USING THE SAME
    18.
    发明申请
    PLASMA TREATMENT APPARATUS AND METHOD OF PLASMA TREATING A SUBSTRATE USING THE SAME 审中-公开
    等离子体处理装置和使用其处理基板的等离子体处理方法

    公开(公告)号：US20170032932A1

    公开(公告)日：2017-02-02

    申请号：US15157344

    申请日：2016-05-17

    Applicant: Samsung Display Co., Ltd.

    Inventor： Youngsik Yoon ,  Jaehoon Jung ,  Daeho Yoon ,  Jonghwan Cho

    IPC: H01J37/32 ,  C23C16/455 ,  C23C16/50

    Abstract: Exemplary embodiments of the inventive concept provide a plasma treatment apparatus with a substrate support unit, a plasma unit, a first rotation driving unit, and a gas supply part. The substrate support unit supports a substrate. The plasma unit generates a plasma and provides the plasma to the substrate. The first rotation driving unit is coupled to the plasma unit to rotate the plasma unit with respect to the substrate support unit. The gas supply part supplies a source gas to the plasma unit. The plasma unit includes a body, a first electrode located in the body, a second electrode located in the body and facing the first electrode, and a pipe located between the first and second electrodes to flow the source gas therethrough.

    Abstract translation: 本发明构思的示例性实施例提供了具有衬底支撑单元，等离子体单元，第一旋转驱动单元和气体供应部件的等离子体处理设备。 基板支撑单元支撑基板。 等离子体单元产生等离子体并将等离子体提供给基板。 第一旋转驱动单元联接到等离子体单元以相对于基板支撑单元旋转等离子体单元。 气体供应部件将源气体供应到等离子体单元。 等离子体单元包括主体，位于主体中的第一电极，位于主体中并面向第一电极的第二电极，以及位于第一和第二电极之间的管以使源气体流过其中的管。

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