公开(公告)号：US10095103B2

公开(公告)日：2018-10-09

申请号：US14671822

申请日：2015-03-27

Applicant: Samsung Display Co. Ltd.

Inventor： Kwang Woo Park ,  Jun Hyuk Woo ,  Jeong Won Kim ,  Seung Bo Shim ,  Jin Ho Ju

IPC: G03F1/52 ,  G02B5/20 ,  G03F1/54 ,  G03F7/20

Abstract: A photomask is provided. A photomask, comprising: a transparent substrate; and a plurality of filter layers disposed on the transparent substrate, wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough.

公开(公告)号：US09857682B2

公开(公告)日：2018-01-02

申请号：US14924301

申请日：2015-10-27

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Seung Bo Shim ,  Jeong Won Kim ,  Jun Hyuk Woo ,  Jin Ho Ju ,  Kwang Woo Park ,  Byung Uk Kim ,  Tae-Hoon Yeo ,  Hyoc-Min Youn ,  Sang-Hoon Lee

IPC: G03F7/038 ,  G03F7/039 ,  C08K5/23 ,  C08K5/42 ,  H01L27/32 ,  H01L51/00 ,  G03F7/023

CPC classification number: G03F7/039 ,  C08K5/23 ,  C08K5/42 ,  G03F7/0233 ,  G03F7/038 ,  H01L27/3246 ,  H01L27/3248 ,  H01L51/0043 ,  H01L51/0094 ,  C08L83/04

Abstract: A positive photosensitive siloxane resin composition includes a) a siloxane copolymer obtained by performing hydrolysis and condensation polymerization of i) at least one reactive silane represented by the following Chemical Formula 1 and ii) at least one 4-functional reactive silane represented by the following Chemical Formula 2 under a catalyst, the copolymer having a polystyrene-converted weight average molecular weight Mw of 1,000 to 20,000, b) a 1,2-quinonediazide compound, and c) a solvent, (R1)nSi(R2)4-n  [Chemical Formula 1] Si(R3)4  [Chemical Formula 2] wherein R1s may each independently be any one of an alkyl group having 1 to 10 carbon atoms and an aryl group having 6 to 15 carbon atoms, R2 may be an alkoxy group having 1 to 4 carbon atoms, phenoxy, or acetoxy, R3s may each independently be any one of an alkoxy group having 1 to 4 carbon atoms, phenoxy, or an acetoxy group, and n may be a natural number of 1 to 3.

公开(公告)号：US08691479B1

公开(公告)日：2014-04-08

申请号：US13779482

申请日：2013-02-27

Applicant: Samsung Display Co., Ltd.

Inventor： Bong-Yeon Kim ,  Min Kang ,  Jeong Won Kim ,  Jin Ho Ju ,  Jun Hyuk Woo ,  Hyun Joo Lee

IPC: G03F1/32

CPC classification number: G03F1/32 ,  G03F1/38

Abstract: An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 μm, and a transmission ratio of the halftone layer may range from about 10% to about 50%.