公开(公告)号：US20230186460A1

公开(公告)日：2023-06-15

申请号：US18060830

申请日：2022-12-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Myungjun LEE ,  Jinseob KIM ,  Wookrae KIM ,  Jinyong KIM ,  Jaehwang JUNG ,  Sungho JANG

IPC: G06T7/00 ,  H04N23/56 ,  H04N23/10

CPC classification number: G06T7/001 ,  H04N23/56 ,  H04N23/10 ,  H01L27/108

Abstract: A semiconductor measurement device may include an illumination apparatus having a polarizer on a propagation path of light output from a light source; an optical assembly including an objective lens configured to allow light passing through the polarizer to be incident on a sample and a beam splitter configured to transmit light reflected from the sample to first and second sensors; and a controller. The controller may be configured to determine an alignment state of patterns in a first region of the sample using a first original image output by the first sensor and an alignment state of patterns in a second region of the sample using a second original image output by the second sensor. The first sensor includes a first image sensor and a self-interference generator in a path along which light is incident on the first image sensor. The second sensor includes a second image sensor.

公开(公告)号：US20230114817A1

公开(公告)日：2023-04-13

申请号：US17857291

申请日：2022-07-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Inho SHIN ,  Wookrae KIM ,  Changhyeong YOON ,  Myungjun LEE ,  Heonju SHIN ,  Sangil IM ,  Sungho JANG

IPC: G06T7/62 ,  G06T7/00

Abstract: A semiconductor measurement apparatus includes an illumination unit including a light source, and a polarizer disposed on a propagation path of light emitted from the light source; an optical unit configured to direct the light passing through the polarizer to be incident onto a sample, and to transmit the light, reflected from the sample, to an image sensor; and a controller configured to process an original image, output by the image sensor, to determine a critical dimension of a structure included in a region of the sample on which the light is incident. The controller acquires a two-dimensional image. The controller orthogonally decomposes the two-dimensional image corresponding to a selected wavelength into a plurality of bases, generates one-dimensional data including a plurality of weights corresponding to the plurality of bases, and uses the one-dimensional data to determine a selected critical dimension among critical dimensions of the structure.