-
公开(公告)号：US20230204493A1
公开(公告)日：2023-06-29
申请号：US18111229
申请日：2023-02-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang JUNG , Yasuhiro HIDAKA , Mitsunori NUMATA , Wookrae KIM , Jinseob KIM , Myungjun LEE
CPC classification number: G01N21/211 , G01N21/9501 , G02B27/10 , G01N2021/214
Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
-
公开(公告)号：US20240230314A9
公开(公告)日：2024-07-11
申请号：US18317395
申请日：2023-05-15
Applicant: Samsung Electronics Co., Ltd.
Inventor： Garam CHOI , Wookrae KIM , Jinseob KIM , Jinyong KIM , Sungho JANG , Younguk JIN , Daehoon HAN
IPC: G01B9/02 , G01B9/02097
CPC classification number: G01B9/02044 , G01B9/02097 , G01B2210/56 , G01B2290/70
Abstract: A semiconductor measurement apparatus may include an illumination unit configured to irradiate light to the sample, an image sensor configured to receive light reflected from the sample and output multiple interference images representing interference patterns of polarization components of light, an optical unit in a path through which the image sensor receives light and including an objective lens above the sample, and a control unit configured to obtain, by processing the multi-interference image, measurement parameters determined from the polarization components at each of a plurality of azimuth angles defined on a plane perpendicular to a path of light incident to the image sensor. The control unit may be configured to determine a selected critical dimension to be measured from a structure in the sample based on measurement parameters. The illumination unit and/or the optical unit may include a polarizer and a compensator having a ¼ wave plate.
-
公开(公告)号：US20240133673A1
公开(公告)日：2024-04-25
申请号：US18317395
申请日：2023-05-14
Applicant: Samsung Electronics Co., Ltd.
Inventor： Garam CHOI , Wookrae KIM , Jinseob KIM , Jinyong KIM , Sungho JANG , Younguk JIN , Daehoon HAN
IPC: G01B9/02 , G01B9/02097
CPC classification number: G01B9/02044 , G01B9/02097 , G01B2210/56 , G01B2290/70
Abstract: A semiconductor measurement apparatus may include an illumination unit configured to irradiate light to the sample, an image sensor configured to receive light reflected from the sample and output multiple interference images representing interference patterns of polarization components of light, an optical unit in a path through which the image sensor receives light and including an objective lens above the sample, and a control unit configured to obtain, by processing the multi-interference image, measurement parameters determined from the polarization components at each of a plurality of azimuth angles defined on a plane perpendicular to a path of light incident to the image sensor. The control unit may be configured to determine a selected critical dimension to be measured from a structure in the sample based on measurement parameters. The illumination unit and/or the optical unit may include a polarizer and a compensator having a ¼ wave plate.
-
公开(公告)号：US20220005715A1
公开(公告)日：2022-01-06
申请号：US17174731
申请日：2021-02-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Myungjun LEE , Changhyeong YOON , Wookrae KIM , Jaehwang JUNG , Jinseob KIM
Abstract: Provided are a diffraction-based metrology apparatus having high measurement sensitivity, a diffraction-based metrology method capable of accurately performing measurement on a semiconductor device, and a method of manufacturing a semiconductor device using the metrology method. The diffraction-based metrology apparatus includes a light source that outputs a light beam, a stage on which an object is placed, a reflective optical element that irradiates the light beam onto the object through reflection, such that the light beam is incident on the object at an inclination angle, the inclination angle being an acute angle, a detector that detects a diffracted light beam that is based on the light beam reflected and diffracted by the object and a processor that measures a 3D pupil matrix for the diffracted light beam and analyze the object based on the 3D pupil matrix.
-
公开(公告)号：US20250052667A1
公开(公告)日：2025-02-13
申请号：US18754702
申请日：2024-06-26
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jooyoun KANG , Gideok KIM , Kwangsoo KIM , Wookrae KIM , Jaeseok SON , Eunjoo LEE , Soonhong Charles HWANG
IPC: G01N21/21 , G01N21/95 , G01N21/956
Abstract: An optical measurement apparatus includes a first light emitter configured to emit a first light on a surface of a sample, a second light emitter configured to emit a second light on the surface of the sample on which the first light is focused, a physical property detector configured to obtain physical property information of the sample by detecting a change in an amount of light of the second light due to a photothermal effect of the first light on the surface of the sample, and at least one structure detector configured to obtain structural information of the sample by detecting a reflected light of at least one of the first light and the second light that is reflected from the surface of the sample.
-
Patent Agency Ranking
公开(公告)号：US20220074848A1
公开(公告)日：2022-03-10
申请号：US17204059
申请日：2021-03-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang JUNG , Yasuhiro HIDAKA , Mitsunori NUMATA , Wookrae KIM , Jinseob KIM , Myungjun LEE
Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
-
公开(公告)号：US20210364420A1
公开(公告)日：2021-11-25
申请号：US17081568
申请日：2020-10-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang JUNG , Wookrae KIM , Myoungki AHN , Changhyeong YOON
IPC: G01N21/21
Abstract: A measurement system is disclosed. A measurement system includes an illumination module, a mirror module, a stage, and a detector. The illumination module includes a light source, an optical fiber, a collimating mirror, a polarization state generator, a beam control mirror, and a relay mirror. The mirror module includes a first beam splitter and a reflective objective mirror. The beam control mirror is movable to relay light received from the polarization state generator to various positions on the relay mirror.
-
8.发明申请公开(公告)号：US20200185240A1
公开(公告)日：2020-06-11
申请号：US16509835
申请日：2019-07-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Wookrae KIM , Kwangsoo KIM , Gwangsik PARK
Abstract: An inspection apparatus includes a first optical module including a first light source configured to emit first light to a semiconductor structure, a second light source configured to emit second light different from the first light to a portion adjacent to a portion to which the first light is emitted in the semiconductor structure, a detector configured to detect the second light reflected toward the second light source, and a lock-in amplifier connected to the first optical module and the detector.
-
公开(公告)号：US20240272561A1
公开(公告)日：2024-08-15
申请号：US18373030
申请日：2023-09-26
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Junho SHIN , Seungbeom PARK , Jangwoon SUNG , Hojun LEE , Wookrae KIM , Myungjun LEE
CPC classification number: G03F7/706839 , G03F7/706 , G03F7/70641 , G06T7/001 , G06T2207/30148
Abstract: Provided is a method of managing a semiconductor processing apparatus, including irradiating, by a light source, a plurality of regions included in a diffuser on a mask stage with extreme ultraviolet (EUV) light, reflecting or transmitting, by the diffuser, the EUV light, transmitting, by an optical system, the EUV light from the diffuser, receiving, by an image sensor, the EUV light from the optical system, obtaining, by the image sensor, a plurality of original images corresponding to the plurality of regions, generating, based on an optical prediction model, a plurality of predictive images estimating a diffraction pattern in the image sensor, adjusting an optical prediction model by comparing the plurality of predictive images with the plurality of original images, and generating, based on the optical prediction model, a plurality of wavefront images corresponding to optical characteristics of each of the plurality of mirrors.
-
10.发明公开公开(公告)号：US20240212122A1
公开(公告)日：2024-06-27
申请号：US18528206
申请日：2023-12-04
Applicant: Samsung Electronics Co., Ltd.
Inventor： Namyoon KIM , Doory KIM , Wookrae KIM , Myungjun LEE , Jaehwang JUNG , Changhoon CHOI , Dokyung JEONG , Uidon JEONG
CPC classification number: G06T7/0004 , G02B21/008 , G06T5/30 , G06T7/13 , G06T2207/10056 , G06T2207/10064 , G06T2207/30148
Abstract: A fluorescence microscopy metrology system includes an optical system configured to generate first light and second light having different wavelengths, a microscope body configured to irradiate a sample, coated with a fluorescent material, with the first light and the second light received from the optical system, and to receive fluorescence reflected from the sample, an image detection device configured to detect a fluorescence image corresponding to the received fluorescence, and a nanostructure analysis device configured to measure line edge roughness (LER) from the detected fluorescence image, to analyze power spectral density (PSD), or to detect a nanoparticle defect.
-
-
-
-
-
-
-
-
-
Search Results
13
records
(took 0.021 seconds)
