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公开(公告)号：US20230074302A1
公开(公告)日：2023-03-09
申请号：US17826320
申请日：2022-05-27
Applicant: Samsung Electronics Co., Ltd.
Inventor： Yunje CHO , Subong SHON , Myungjun LEE , Taehyoung LEE , Yeny YIM
Abstract: A scanning electron microscope (SEM) device includes: an electron beam source configured to emit an electron beam; a lens unit disposed between the electron beam source and a stage configured to seat an object including structures having a pattern is seated, and including a scanning coil, the scanning coil configured to generate an electromagnetic field to provide a lens, and an astigmatism adjuster; and a control unit. The control unit is configured to change a working distance between the lens unit and the object to obtain a plurality of original images, obtain a pattern image, in which the structures appear, and a plurality of kernel images, in which a distribution of the electron beam on the object appears, from the plurality of original images, and control the astigmatism adjuster to adjust the focus and the astigmatism of the lens unit using feature values extracted from the plurality of kernel images.
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公开(公告)号：US20240112881A1
公开(公告)日：2024-04-04
申请号：US18196499
申请日：2023-05-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jonghyeok PARK , Kwangrak KIM , Jiwoong KIM , Hyenok PARK , Jeonghyeon WANG , Myungjun LEE , Yunje CHO , Junghee CHO , Yun HWANG
IPC: H01J37/28 , G01B11/22 , H01J37/20 , H01J37/304 , H01J37/305
CPC classification number: H01J37/28 , G01B11/22 , H01J37/20 , H01J37/304 , H01J37/305 , H01J37/1472 , H01J2237/24578
Abstract: A substrate analysis system includes a load-lock module configured to load or unload a substrate on which a pattern layer is formed; a milling module configured to form a milling surface from which at least a portion of the pattern layer is removed; a depth measuring module configured to measure a milling depth of an analysis region formed on the milling surface; an imaging module configured to capture a two-dimensional image of the analysis region; and a control module controlling the substrate to circulate through the milling module, the depth measuring module, and the imaging module, when the milling depth is shallower than a set target depth, wherein the milling module adjusts a path of the ion beam so that the ion beam moves horizontally in the milling region according to a scanning profile received based on an intensity map of the ion beam.
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公开(公告)号：US20230204493A1
公开(公告)日：2023-06-29
申请号：US18111229
申请日：2023-02-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang JUNG , Yasuhiro HIDAKA , Mitsunori NUMATA , Wookrae KIM , Jinseob KIM , Myungjun LEE
CPC classification number: G01N21/211 , G01N21/9501 , G02B27/10 , G01N2021/214
Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
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公开(公告)号：US20220005715A1
公开(公告)日：2022-01-06
申请号：US17174731
申请日：2021-02-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Myungjun LEE , Changhyeong YOON , Wookrae KIM , Jaehwang JUNG , Jinseob KIM
Abstract: Provided are a diffraction-based metrology apparatus having high measurement sensitivity, a diffraction-based metrology method capable of accurately performing measurement on a semiconductor device, and a method of manufacturing a semiconductor device using the metrology method. The diffraction-based metrology apparatus includes a light source that outputs a light beam, a stage on which an object is placed, a reflective optical element that irradiates the light beam onto the object through reflection, such that the light beam is incident on the object at an inclination angle, the inclination angle being an acute angle, a detector that detects a diffracted light beam that is based on the light beam reflected and diffracted by the object and a processor that measures a 3D pupil matrix for the diffracted light beam and analyze the object based on the 3D pupil matrix.
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公开(公告)号：US20240167806A1
公开(公告)日：2024-05-23
申请号：US18232673
申请日：2023-08-10
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Seungwoo LEE , Jinwoo AHN , Taejoong KIM , Myungjun LEE
IPC: G01B9/02 , G01B9/02015
CPC classification number: G01B9/02043 , G01B9/02032
Abstract: Provided is a pupil image measuring device including a light source configured to generate and output a light, a stage on which a measurement target is loaded, an optical system configured to transmit the light output from the light source, to the measurement target, a detector configured to detect a light reflected from the measurement target, and a spatial light distribution controller configured to adjust an intensity or amount of the light output from the light source or the reflected light, for each space of a plurality of spaces of the spatial light distribution controller, wherein the spatial light distribution controller is disposed on a pupil plane.
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Patent Agency Ranking
公开(公告)号：US20220074848A1
公开(公告)日：2022-03-10
申请号：US17204059
申请日：2021-03-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang JUNG , Yasuhiro HIDAKA , Mitsunori NUMATA , Wookrae KIM , Jinseob KIM , Myungjun LEE
Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
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公开(公告)号：US20210080743A1
公开(公告)日：2021-03-18
申请号：US16848169
申请日：2020-04-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Myungjun LEE , Seungbeom Park , Jaehyeon Son , Jaehwang Jung , Taewan Kim , Kyungwon Yun
Abstract: Provided is a super-resolution holographic microscope including a light source configured to emit input light, a diffraction grating configured to split the input light into first diffracted light and second diffracted light, a mirror configured to reflect the first diffracted light, a wafer stage arranged on an optical path of the second diffracted light and on which a wafer is configured to be arranged, and a camera configured to receive the first diffracted light that is reflected by the mirror and the second diffracted light that is reflected by the wafer to generate a plurality of hologram images of the wafer.
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公开(公告)号：US20240272561A1
公开(公告)日：2024-08-15
申请号：US18373030
申请日：2023-09-26
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Junho SHIN , Seungbeom PARK , Jangwoon SUNG , Hojun LEE , Wookrae KIM , Myungjun LEE
CPC classification number: G03F7/706839 , G03F7/706 , G03F7/70641 , G06T7/001 , G06T2207/30148
Abstract: Provided is a method of managing a semiconductor processing apparatus, including irradiating, by a light source, a plurality of regions included in a diffuser on a mask stage with extreme ultraviolet (EUV) light, reflecting or transmitting, by the diffuser, the EUV light, transmitting, by an optical system, the EUV light from the diffuser, receiving, by an image sensor, the EUV light from the optical system, obtaining, by the image sensor, a plurality of original images corresponding to the plurality of regions, generating, based on an optical prediction model, a plurality of predictive images estimating a diffraction pattern in the image sensor, adjusting an optical prediction model by comparing the plurality of predictive images with the plurality of original images, and generating, based on the optical prediction model, a plurality of wavefront images corresponding to optical characteristics of each of the plurality of mirrors.
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9.发明公开公开(公告)号：US20240212122A1
公开(公告)日：2024-06-27
申请号：US18528206
申请日：2023-12-04
Applicant: Samsung Electronics Co., Ltd.
Inventor： Namyoon KIM , Doory KIM , Wookrae KIM , Myungjun LEE , Jaehwang JUNG , Changhoon CHOI , Dokyung JEONG , Uidon JEONG
CPC classification number: G06T7/0004 , G02B21/008 , G06T5/30 , G06T7/13 , G06T2207/10056 , G06T2207/10064 , G06T2207/30148
Abstract: A fluorescence microscopy metrology system includes an optical system configured to generate first light and second light having different wavelengths, a microscope body configured to irradiate a sample, coated with a fluorescent material, with the first light and the second light received from the optical system, and to receive fluorescence reflected from the sample, an image detection device configured to detect a fluorescence image corresponding to the received fluorescence, and a nanostructure analysis device configured to measure line edge roughness (LER) from the detected fluorescence image, to analyze power spectral density (PSD), or to detect a nanoparticle defect.
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公开(公告)号：US20230375463A1
公开(公告)日：2023-11-23
申请号：US18082040
申请日：2022-12-15
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Seoyeon JEONG , Seungwoo LEE , Inho SHIN , Wookrae KIM , Myungjun LEE , Jaehwang JUNG
IPC: G01N21/21 , G02B27/28 , G01N21/956 , G01B11/24
CPC classification number: G01N21/211 , G02B27/283 , G01N21/956 , G01B11/2441 , G01B2210/56
Abstract: A semiconductor measurement apparatus includes an illumination unit configured to provide illumination light including linearly polarized light beams having different wavelengths, an optical unit including an objective lens configured to allow the illumination light to be incident on a sample, the optical unit being configured to transmit reflection light generated when the illumination light is reflected from the sample, a self-interference generator configured to self-interfere the reflection light transmitted from the optical unit and transmit the reflection light to a first image sensor, for each wavelength, and a controller. The controller is configured to process a measurement image output by the image sensor to divide the measurement image into a first image representing an intensity ratio of a polarization component of the reflection light and a second image representing a phase difference of the polarization component of the reflection light, for each wavelength.
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