公开(公告)号：US20250044222A1

公开(公告)日：2025-02-06

申请号：US18767486

申请日：2024-07-09

Applicant: SAMSUNG ELECTRONICS CO., LTD

Inventor： Seungwoo LEE ,  Jinseob KIM ,  Jinyong KIM ,  Taejoong KIM ,  Jinwoo AHN ,  Jaehwang JUNG ,  Taeyong JO ,  Garam CHOI

IPC: G01N21/31 ,  G06T7/11

Abstract: An image measurement device includes an optical system that transmits light output to an image detection unit, the image detection unit configured to detect the light and generate an image, and an image processing unit that extracts spectral data from the image, wherein the image processing unit generates a profile according to an amount of light for each of a plurality of pixels based on the image, and performs Fourier transform on the profile.

公开(公告)号：US20230204493A1

公开(公告)日：2023-06-29

申请号：US18111229

申请日：2023-02-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaehwang JUNG ,  Yasuhiro HIDAKA ,  Mitsunori NUMATA ,  Wookrae KIM ,  Jinseob KIM ,  Myungjun LEE

IPC: G01N21/21 ,  G01N21/95 ,  G02B27/10

CPC classification number: G01N21/211 ,  G01N21/9501 ,  G02B27/10 ,  G01N2021/214

Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.

公开(公告)号：US20220074848A1

公开(公告)日：2022-03-10

申请号：US17204059

申请日：2021-03-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaehwang JUNG ,  Yasuhiro HIDAKA ,  Mitsunori NUMATA ,  Wookrae KIM ,  Jinseob KIM ,  Myungjun LEE

IPC: G01N21/21 ,  G02B27/10 ,  G01N21/95

Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.

公开(公告)号：US20210364420A1

公开(公告)日：2021-11-25

申请号：US17081568

申请日：2020-10-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaehwang JUNG ,  Wookrae KIM ,  Myoungki AHN ,  Changhyeong YOON

IPC: G01N21/21

Abstract: A measurement system is disclosed. A measurement system includes an illumination module, a mirror module, a stage, and a detector. The illumination module includes a light source, an optical fiber, a collimating mirror, a polarization state generator, a beam control mirror, and a relay mirror. The mirror module includes a first beam splitter and a reflective objective mirror. The beam control mirror is movable to relay light received from the polarization state generator to various positions on the relay mirror.

公开(公告)号：US20220005715A1

公开(公告)日：2022-01-06

申请号：US17174731

申请日：2021-02-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Myungjun LEE ,  Changhyeong YOON ,  Wookrae KIM ,  Jaehwang JUNG ,  Jinseob KIM

IPC: H01L21/67 ,  G01N21/47 ,  G01N21/88 ,  G01N21/95

Abstract: Provided are a diffraction-based metrology apparatus having high measurement sensitivity, a diffraction-based metrology method capable of accurately performing measurement on a semiconductor device, and a method of manufacturing a semiconductor device using the metrology method. The diffraction-based metrology apparatus includes a light source that outputs a light beam, a stage on which an object is placed, a reflective optical element that irradiates the light beam onto the object through reflection, such that the light beam is incident on the object at an inclination angle, the inclination angle being an acute angle, a detector that detects a diffracted light beam that is based on the light beam reflected and diffracted by the object and a processor that measures a 3D pupil matrix for the diffracted light beam and analyze the object based on the 3D pupil matrix.

公开(公告)号：US20240212122A1

公开(公告)日：2024-06-27

申请号：US18528206

申请日：2023-12-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Namyoon KIM ,  Doory KIM ,  Wookrae KIM ,  Myungjun LEE ,  Jaehwang JUNG ,  Changhoon CHOI ,  Dokyung JEONG ,  Uidon JEONG

IPC: G06T7/00 ,  G02B21/00 ,  G06T5/30 ,  G06T7/13

CPC classification number: G06T7/0004 ,  G02B21/008 ,  G06T5/30 ,  G06T7/13 ,  G06T2207/10056 ,  G06T2207/10064 ,  G06T2207/30148

Abstract: A fluorescence microscopy metrology system includes an optical system configured to generate first light and second light having different wavelengths, a microscope body configured to irradiate a sample, coated with a fluorescent material, with the first light and the second light received from the optical system, and to receive fluorescence reflected from the sample, an image detection device configured to detect a fluorescence image corresponding to the received fluorescence, and a nanostructure analysis device configured to measure line edge roughness (LER) from the detected fluorescence image, to analyze power spectral density (PSD), or to detect a nanoparticle defect.

公开(公告)号：US20230375463A1

公开(公告)日：2023-11-23

申请号：US18082040

申请日：2022-12-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seoyeon JEONG ,  Seungwoo LEE ,  Inho SHIN ,  Wookrae KIM ,  Myungjun LEE ,  Jaehwang JUNG

IPC: G01N21/21 ,  G02B27/28 ,  G01N21/956 ,  G01B11/24

CPC classification number: G01N21/211 ,  G02B27/283 ,  G01N21/956 ,  G01B11/2441 ,  G01B2210/56

Abstract: A semiconductor measurement apparatus includes an illumination unit configured to provide illumination light including linearly polarized light beams having different wavelengths, an optical unit including an objective lens configured to allow the illumination light to be incident on a sample, the optical unit being configured to transmit reflection light generated when the illumination light is reflected from the sample, a self-interference generator configured to self-interfere the reflection light transmitted from the optical unit and transmit the reflection light to a first image sensor, for each wavelength, and a controller. The controller is configured to process a measurement image output by the image sensor to divide the measurement image into a first image representing an intensity ratio of a polarization component of the reflection light and a second image representing a phase difference of the polarization component of the reflection light, for each wavelength.

公开(公告)号：US20230186460A1

公开(公告)日：2023-06-15

申请号：US18060830

申请日：2022-12-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Myungjun LEE ,  Jinseob KIM ,  Wookrae KIM ,  Jinyong KIM ,  Jaehwang JUNG ,  Sungho JANG

IPC: G06T7/00 ,  H04N23/56 ,  H04N23/10

CPC classification number: G06T7/001 ,  H04N23/56 ,  H04N23/10 ,  H01L27/108

Abstract: A semiconductor measurement device may include an illumination apparatus having a polarizer on a propagation path of light output from a light source; an optical assembly including an objective lens configured to allow light passing through the polarizer to be incident on a sample and a beam splitter configured to transmit light reflected from the sample to first and second sensors; and a controller. The controller may be configured to determine an alignment state of patterns in a first region of the sample using a first original image output by the first sensor and an alignment state of patterns in a second region of the sample using a second original image output by the second sensor. The first sensor includes a first image sensor and a self-interference generator in a path along which light is incident on the first image sensor. The second sensor includes a second image sensor.

公开(公告)号：US20210082725A1

公开(公告)日：2021-03-18

申请号：US16849631

申请日：2020-04-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaehwang JUNG ,  Gwangsik Park ,  Wookrae Kim ,  Juntaek Oh

IPC: H01L21/67 ,  G02B27/28 ,  G02B27/42 ,  G02B27/30 ,  G01N21/25 ,  G01N21/27 ,  G01N21/21 ,  G01N21/88 ,  G01N21/95 ,  G02B27/10 ,  G06T7/00

Abstract: Provided is a wafer inspection apparatus including a monochromator that extracts monochromatic light, a collimator that outputs the monochromatic light as parallel light, a first polarization assembly that polarizes the parallel light and radiates the polarized light to a wafer, an imaging optical system that condenses light reflected from the wafer, a spectroscope that splits the condensed light into a plurality of spectrums, a first lens that condenses the plurality of spectrums, a second polarization assembly that outputs the plurality of spectrums as a plurality of polarized lights having different diffraction orders and a difference of 90°, a second lens that condenses the plurality of polarized lights, a third polarization assembly that outputs common polarized light based on the plurality of polarized interfering with each other, a camera that generates a phase difference image based on the common polarized light, and a signal processor that analyzes the phase difference image.