PATTERN WIDTH CORRECTION SYSTEM AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME

    公开(公告)号:US20200012186A1

    公开(公告)日:2020-01-09

    申请号:US16261105

    申请日:2019-01-29

    Abstract: A pattern width correction system includes a pattern width measurement unit configured to measure a width of a first pattern formed at a first distance, where the first pattern is formed by irradiating first light modulated using first pattern data, a first error data calculator configured to generate first error data on the basis of the measured width of the first pattern, a regression analyzer configured to perform regression analysis on the first error data to generate a first relational expression between X-Y coordinates of the first pattern and a width error of the first pattern, a second error data calculator configured to generate second error data in a manipulation area having a second distance by using the first relational expression, and a pattern data correction unit configured to generate second pattern data by correcting the first pattern data on the basis of the second error data.

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