公开(公告)号：US08477297B2

公开(公告)日：2013-07-02

申请号：US13305827

申请日：2011-11-29

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01N21/41

CPC classification number: B29D11/0098 ,  G01M11/0228

Abstract: The method measures first transmitted wavefronts and second transmitted wavefronts by respectively causing reference light to enter an object placed in plural placement states in a first medium and a second medium, calculates an aberration sensitivity with respect to changes of the placement state of the object, and calculates an alignment error of the object in each placement state by using the aberration sensitivity and the first and second transmitted wavefronts measured in each placement state. The method further calculates first and second reference transmitted wavefronts respectively acquirable when causing the reference light to enter the reference object placed in placement states including the alignment errors in the first medium and the second medium, and calculates a refractive index distribution of the object which a shape component thereof is removed, by using the first and second transmitted wavefronts and the first and second reference transmitted wavefronts.

Abstract translation: 该方法通过分别使参考光进入第一介质和第二介质中放置在多个放置状态的物体来测量第一透射波前和第二透射波前，相对于物体的放置状态的变化计算像差灵敏度，以及 通过使用像差灵敏度和在每个放置状态下测量的第一和第二发射波前来计算每个放置状态中物体的对准误差。 该方法进一步计算当引用参考光进入放置在包括第一介质和第二介质中的对准误差的放置状态的参考对象时的第一和第二参考传输波阵面，并计算物体的折射率分布 通过使用第一和第二传输波前以及第一和第二参考传输波前去除其形状分量。

公开(公告)号：US20100190115A1

公开(公告)日：2010-07-29

申请号：US12280926

申请日：2007-02-28

Applicant: Seima Kato ,  Chidane Ouchi

Inventor： Seima Kato ,  Chidane Ouchi

IPC: G03F7/20 ,  G01B11/02 ,  G03B27/54

CPC classification number: G03F7/706

Abstract: A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg2/λ where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measurement light, and m is an integer except for 0.

Abstract translation: 测量装置包括布置在目标光学系统的物平面上并具有透射测量光的窗口的第一掩模，具有用于减小测量光的相干性的反射表面的第二掩模和配置在所述衍射光栅中的衍射光栅 通过第一掩模和目标光学系统，将衍射光栅与目标光学系统的像面之间的距离Lg分别满足Lg = m·Pg2 /λ 其中Pg是衍射光栅的光栅间距，λ是测量光的波长，m是除0之外的整数。

公开(公告)号：US20090268188A1

公开(公告)日：2009-10-29

申请号：US12419194

申请日：2009-04-06

Applicant: Seima Kato ,  Chidane Ouchi

Inventor： Seima Kato ,  Chidane Ouchi

IPC: G03B27/72

CPC classification number: G03F7/706 ,  G03F7/70066

Abstract: An exposure apparatus includes an illumination optical system. The illumination optical system includes a first member configured to define an illuminated region of a reflective mask having a pattern to be projected onto a substrate; a second member configured to define an illuminated region in which a measurement pattern used in measuring wavefront aberration of a projection optical system is illuminated, the second member being able to be inserted into and removed from an optical path of the illumination optical system; and a condensing mirror configured to condense light from the first member on the pattern to be projected onto the substrate and light from the second member on the measurement pattern. The illuminated region defined by the second member is smaller than the illuminated region defined by the first member.

Abstract translation: 曝光装置包括照明光学系统。 所述照明光学系统包括：第一构件，被配置为限定具有要投影到衬底上的图案的反射掩模的照明区域; 第二构件，被配置为限定照明区域，其中用于测量投影光学系统的波前像差的测量图案被照射，所述第二构件能够插入到所述照明光学系统的光路中并从所述照明光学系统的光路中移除; 以及会聚镜，其被配置为将来自第一构件的光在要投影到衬底上的图案上聚集，并且来自第二构件的光在测量图案上。 由第二构件限定的照明区域小于由第一构件限定的照明区域。

公开(公告)号：US08525982B2

公开(公告)日：2013-09-03

申请号：US13114309

申请日：2011-05-24

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01N21/41 ,  G01B9/00

CPC classification number: G01N21/41 ,  G01M11/0228 ,  G01N21/45

Abstract: A method includes the steps of measuring a first transmitted wavefront in a first medium having a first refractive index and a second transmitted wavefront in a second medium having a second refractive index different from the first refractive index, and obtaining a refractive index distribution projected value of the object in each orientation by removing a shape component of the object utilizing measurement results of the first transmitted wavefront and the second transmitted wavefront and each transmitted wavefront of a reference object that has the same shape as that of the object and a specific refractive index distribution and is located in one of the first medium and the second medium with the same orientation as that of the object, and calculating a three-dimensional refractive index distribution of the object based on a plurality of refractive index distribution projected values corresponding to the plurality of orientations.

Abstract translation: 一种方法包括以下步骤：在具有第一折射率和第二透射波前的第一介质中测量具有不同于第一折射率的第二折射率的第二介质中的第一透射波前，并获得折射率分布预测值 使用具有与物体相同形状的参考对象的第一透射波阵面和第二透射波阵面以及每个透射波面的测量结果，以及特定的折射率分布来去除物体的形状分量， 并且位于与所述物体相同取向的所述第一介质和所述第二介质中的一个中，并且基于与所述多个对象对应的多个折射率分布投影值来计算所述物体的三维折射率分布 方位。

公开(公告)号：US08004691B2

公开(公告)日：2011-08-23

申请号：US11721397

申请日：2006-04-24

Applicant: Chidane Ouchi ,  Akihiro Nakauchi ,  Seima Kato

Inventor： Chidane Ouchi ,  Akihiro Nakauchi ,  Seima Kato

IPC: G01B9/02 ,  G02B27/42

CPC classification number: G03F7/706 ,  G01M11/0264 ,  G01M11/0271

Abstract: A measuring apparatus includes a pinhole mask, located on an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light beam, and a diffraction grating for splitting the measuring light beam that has passed the pinhole mask and the optical system, in which Lg=m·Pg2/λ is met, where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measuring light beam, m is an integer other than zero, and Lg is a distance between the diffraction grating and an image plane of the optical system. The measuring apparatus detects an interferogram formed by interference between a plurality of the measuring light beams split by the diffraction grating. The plurality of measuring light beams includes an aberration of the optical system.

Abstract translation: 一种测量装置，包括：针孔掩模，位于待测光学系统的物平面上，并且具有多个用于从测量光束产生球面波的针孔;以及衍射光栅，用于分割具有 通过针孔掩模和满足Lg = m·Pg2 /λ的光学系统，其中Pg是衍射光栅的光栅间距，λ是测量光束的波长，m是除零以外的整数， Lg是衍射光栅与光学系统的像平面之间的距离。 测量装置检测由由衍射光栅分裂的多个测量光之间的干涉形成的干涉图。 多个测量光束包括光学系统的像差。

公开(公告)号：US20100245842A1

公开(公告)日：2010-09-30

申请号：US12728878

申请日：2010-03-22

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01B9/02

CPC classification number: G01M11/0271 ,  G01M11/0228 ,  G01M11/0257 ,  G01N21/45

Abstract: A transmitted wavefront measuring method comprises the steps of emitting light 101 from a light source 100 onto an object to be measured 120 to receive interfering light transmitted through the object and a diffraction grating 130 on a light receiving portion 140 disposed at a predetermined distance from the diffraction grating to measure an intensity distribution of the interfering light T10, performing a Fourier transform of the intensity distribution to calculate a frequency distribution T20, and obtaining a transmitted wavefront of the object based on a primary frequency spectrum in the frequency distribution T30 to T90. The step of obtaining the transmitted wavefront comprises the steps of performing an inverse Fourier transform of the primary frequency spectrum with reference to a grating frequency of the diffraction grating to calculate a complex amplitude of the interfering light T60, and obtaining the transmitted wavefront based on the complex amplitude T90.

Abstract translation: 透射波面测量方法包括以下步骤：将光101从光源100发射到待测物体120上以接收透过物体的干涉光;以及在受光部分140上的衍射光栅130，所述衍射光栅130设置在距离物体预定距离处 用于测量干涉光T10的强度分布，执行强度分布的傅里叶变换以计算频率分布T20，并且基于频率分布T30至T90中的主频谱获得对象的发射波阵面。 获得发送波前的步骤包括以下步骤：参考衍射光栅的光栅频率执行主频谱的傅里叶逆变换，以计算干涉光T60的复振幅，并且基于 复振幅T90。

公开(公告)号：US20090290136A1

公开(公告)日：2009-11-26

申请号：US11721397

申请日：2006-04-24

Applicant: Chidane Ouchi ,  Akihiro Nakauchi ,  Seima Kato

Inventor： Chidane Ouchi ,  Akihiro Nakauchi ,  Seima Kato

IPC: G03B27/54 ,  G01B9/02

CPC classification number: G03F7/706 ,  G01M11/0264 ,  G01M11/0271

Abstract: A measuring apparatus includes a pinhole mask, located at an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light beam, and a diffraction grating for splitting the measuring light beam that has passed the pinhole mask and the optical system, wherein Lg=m·Pg2/λ is met, where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measuring light beam, m is an integer other than zero, and Lg is a distance between the diffraction grating and an image plane of the optical system. The measuring apparatus calculates a wavefront aberration of the optical system from an interferogram formed by causing interference of the measuring light beams split by the diffraction grating.

Abstract translation: 测量装置包括：针孔掩模，位于待测光学系统的物平面上，并且具有多个用于从测量光束产生球面波的针孔;以及衍射光栅，用于分割具有 通过针孔掩模和光学系统，其中满足Lg = m.Pg2 /λ，其中Pg是衍射光栅的光栅间距，λ是测量光束的波长，m是除零以外的整数，以及 Lg是衍射光栅与光学系统的像面之间的距离。 测量装置根据由衍射光栅分裂的测量光束的干涉而形成的干涉图来计算光学系统的波前像差。

公开(公告)号：US07474413B2

公开(公告)日：2009-01-06

申请号：US11364600

申请日：2006-02-27

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01B9/02

CPC classification number: G03F7/706

Abstract: Disclosed is a method of analyzing an interference fringe, with which method the optical characteristics of an optical system to be examined can be analyzed very precisely. In one preferred form of the invention, the analyzing method includes a step of detecting information related to a first interference fringe produced by interference of two light fluxes, a step of detecting information related to a second interference fringe produced while changing a phase of one of the two light fluxes by π as multiplied by an odd number (e.g., 1π, 3π, . . . ), and a step of detecting averaged information of phase information of the two interference fringes, on the basis of the detected information of the first and second interference fringes and by use of Fourier transform.

Abstract translation: 公开了一种分析干涉条纹的方法，通过该方法可以非常精确地分析要检查的光学系统的光学特性。 在本发明的一个优选形式中，分析方法包括检测与由两个光束的干扰产生的第一干涉条纹有关的信息的步骤，检测与改变第二干涉条纹相关的信息的步骤， 将pi的两个光通量乘以奇数（例如，1pi，3pi，...），以及基于检测到的第一信号的信息检测两个干涉条纹的相位信息的平均信息的步骤 和第二干涉条纹和使用傅里叶变换。

公开(公告)号：US07443515B2

公开(公告)日：2008-10-28

申请号：US11204439

申请日：2005-08-15

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01B11/02

CPC classification number: G03F7/706 ,  G01J9/02

Abstract: A measuring apparatus for measuring the optical properties of an optical system including a mask with a slit and a window, upon which different light beams are focused to derive an interference pattern. The interference pattern can be used to obtain optical properties of the optical system.

Abstract translation: 一种用于测量包括具有狭缝和窗口的掩模的光学系统的光学特性的测量装置，在该光学系统上聚焦不同的光束以导出干涉图案。 可以使用干涉图案来获得光学系统的光学特性。

公开(公告)号：US20060044569A1

公开(公告)日：2006-03-02

申请号：US11204439

申请日：2005-08-15

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01B11/02

CPC classification number: G03F7/706 ,  G01J9/02

Abstract: A measuring apparatus for measuring the optical properties of an optical system including a mask with a slit and a window, upon which different light beams are focused to derive an interference pattern. The interference pattern can be used to obtain optical properties of the optical system.

Abstract translation: 一种用于测量包括具有狭缝和窗口的掩模的光学系统的光学特性的测量装置，在该光学系统上聚焦不同的光束以导出干涉图案。 可以使用干涉图案来获得光学系统的光学特性。