公开(公告)号：US20160133454A1

公开(公告)日：2016-05-12

申请号：US14934200

申请日：2015-11-06

Applicant: Semes Co., Ltd.

Inventor： Young Hun Lee ,  Eui Sang Lim ,  Jae Myoung Lee

IPC: H01L21/02 ,  B08B7/00

CPC classification number: B08B7/0021 ,  H01L21/02057 ,  H01L21/02101 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67069

Abstract: Disclosed are systems and methods for treating a substrate. The method may include supplying supercritical carbon dioxide into a chamber to treat a substrate. Here, temperature and pressure of the chamber is maintained to allow carbon dioxide to be directly changed from a gas state to a supercritical state when the carbon dioxide is supplied into the chamber.

Abstract translation: 公开了用于处理基材的系统和方法。 该方法可以包括将超临界二氧化碳供应到室中以处理基底。 这里，保持室的温度和压力，以便当将二氧化碳供应到室中时，使二氧化碳直接从气态改变为超临界状态。