公开(公告)号：US20160121374A1

公开(公告)日：2016-05-05

申请号：US14930206

申请日：2015-11-02

Applicant: Semes Co., Ltd

Inventor： Young Hun Lee ,  Eui Sang Lim ,  Jae Myoung Lee

IPC: B08B7/00 ,  H01L21/02 ,  H01L21/67

CPC classification number: B08B7/0021 ,  B08B3/02 ,  B08B2203/0229 ,  F26B3/04 ,  F26B5/005 ,  F26B11/18 ,  F26B21/14 ,  H01L21/02101 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67103 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/68742

Abstract: A substrate treating apparatus is disclosed. The apparatus may include a housing including an upper body and a lower body coupled to each other to define a treatment space, the lower body being provided below the upper body, a supporting unit coupled to the upper body, the supporting unit supporting an edge of a substrate disposed in the treatment space, a fluid supplying unit configured to supply fluid into the treatment space, a sealing member provided between and in contact with the upper and lower bodies, the sealing member hermetically isolating the treatment space from an outer space, and an isolation plate installed between the sealing member and the supporting unit. The isolation plate may be provided to face the sealing member.

Abstract translation: 公开了一种基板处理装置。 所述装置可以包括壳体，所述壳体包括彼此联接以限定处理空间的上主体和下体，所述下体设置在所述上​​身下方，支撑单元联接到所述上身，所述支撑单元支撑 设置在处理空间中的基板，配置成向处理空间供给流体的流体供给单元，设置在上下体之间并与上下体接触的密封构件，密封构件使处理空间与外部空间隔离，以及 安装在密封构件和支撑单元之间的隔离板。 隔离板可以设置成面对密封构件。

公开(公告)号：US11024517B2

公开(公告)日：2021-06-01

申请号：US15607356

申请日：2017-05-26

Applicant: SEMES CO., LTD.

Inventor： Young Hun Lee ,  Jae Myoung Lee

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/687 ,  B08B3/04 ,  B08B3/08 ,  B08B3/14

Abstract: Disclosed are an apparatus and a method for liquid-treating a substrate. An apparatus for treating a substrate includes a liquid treatment chamber that supplies a liquid onto the substrate to liquid-treat the substrate, a drying chamber that removes the remained liquid on the substrate, and a transfer unit that transfers the substrate between the liquid treatment chamber and the drying chamber, wherein the transfer unit includes a hand that supports the substrate, and a weight measuring unit that measures a weight of the remained liquid on the substrate. A weight of a remained liquid on a substrate may be measured by measuring a weight of the substrate while the substrate is transferred.

公开(公告)号：US10079142B2

公开(公告)日：2018-09-18

申请号：US15165020

申请日：2016-05-26

Applicant: SEMES CO., LTD.

Inventor： Dae Min Kim ,  Sul Lee ,  Bok Kyu Lee ,  Jae Myoung Lee

IPC: H01L21/02 ,  B08B15/00 ,  C11D11/00 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/02052 ,  B08B2203/0229 ,  C11D11/0047 ,  H01L21/67051 ,  H01L21/6875

Abstract: An apparatus for treating a substrate includes an injecting member having a first nozzle configured to supply a first chemical to the substrate that is mounted on the supporting unit, and a second nozzle configured to supply a second chemical, which is different from the first chemical, to the substrate that is mounted on the supporting unit, and a controller configured to supply the first chemical before supplying the second chemicals and to control the first chemical, which is variable according to a type of thin film on the substrate mounted on the supporting unit, to be supplied.

公开(公告)号：US09527118B2

公开(公告)日：2016-12-27

申请号：US14934200

申请日：2015-11-06

Applicant: Semes Co., Ltd.

Inventor： Young Hun Lee ,  Eui Sang Lim ,  Jae Myoung Lee

IPC: H01L21/331 ,  H01L21/8222 ,  B08B7/00 ,  H01L21/02 ,  H01L21/67

CPC classification number: B08B7/0021 ,  H01L21/02057 ,  H01L21/02101 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67069

Abstract: Disclosed are systems and methods for treating a substrate. The method may include supplying supercritical carbon dioxide into a chamber to treat a substrate. Here, temperature and pressure of the chamber is maintained to allow carbon dioxide to be directly changed from a gas state to a supercritical state when the carbon dioxide is supplied into the chamber.

Abstract translation: 公开了用于处理基材的系统和方法。 该方法可以包括将超临界二氧化碳供应到室中以处理基底。 这里，保持室的温度和压力，以便当将二氧化碳供应到室中时，使二氧化碳直接从气态改变为超临界状态。

公开(公告)号：US11020777B2

公开(公告)日：2021-06-01

申请号：US16700940

申请日：2019-12-02

Applicant: Semes Co., Ltd.

Inventor： Young Hun Lee ,  Eui Sang Lim ,  Jae Myoung Lee

IPC: B08B7/00 ,  H01L21/67 ,  H01L21/687 ,  B08B3/02 ,  F26B5/00 ,  F26B3/04 ,  F26B11/18 ,  F26B21/14 ,  H01L21/02

Abstract: A substrate treating apparatus is disclosed. The apparatus may include a housing including an upper body and a lower body coupled to each other to define a treatment space, the lower body being provided below the upper body, a supporting unit coupled to the upper body, the supporting unit supporting an edge of a substrate disposed in the treatment space, a fluid supplying unit configured to supply fluid into the treatment space, a sealing member provided between and in contact with the upper and lower bodies, the sealing member hermetically isolating the treatment space from an outer space, and an isolation plate installed between the sealing member and the supporting unit. The isolation plate may be provided to face the sealing member.

公开(公告)号：US09978584B2

公开(公告)日：2018-05-22

申请号：US15251760

申请日：2016-08-30

Applicant: Semes Co., Ltd.

Inventor： Young Hun Lee ,  Eui Sang Lim ,  Min Jun Cho ,  Jae Myoung Lee

IPC: H01L21/02 ,  H01L21/67 ,  H01L21/306 ,  B08B7/00 ,  F26B21/10 ,  F26B21/06

CPC classification number: H01L21/02101 ,  B08B7/0021 ,  F26B21/06 ,  F26B21/10 ,  H01L21/02046 ,  H01L21/30604 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67069

Abstract: A method for treating a substrate, in which a supercritical fluid is supplied into a chamber, in which the substrate is carried, to treat the substrate, the method including a supply step of supplying the supercritical fluid into the chamber until a pressure of the interior of the chamber reaches a preset pressure, and a substrate treating step of performing a supercritical process while repeating supply and exhaust of the supercritical fluid into and out of the interior of the chamber after the supply step, wherein a flow rate of the supercritical fluid supplied into the chamber in the supply step is variable.

公开(公告)号：US20180012755A1

公开(公告)日：2018-01-11

申请号：US15251760

申请日：2016-08-30

Applicant: Semes Co., Ltd.

Inventor： Young Hun Lee ,  Eui Sang Lim ,  Min Jun Cho ,  Jae Myoung Lee

IPC: H01L21/02 ,  B08B7/00 ,  F26B21/06 ,  H01L21/306 ,  H01L21/67 ,  F26B21/10

CPC classification number: H01L21/02101 ,  B08B7/0021 ,  F26B21/06 ,  F26B21/10 ,  H01L21/02046 ,  H01L21/30604 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67069

Abstract: A method for treating a substrate, in which a supercritical fluid is supplied into a chamber, in which the substrate is carried, to treat the substrate, the method including a supply step of supplying the supercritical fluid into the chamber until a pressure of the interior of the chamber reaches a preset pressure, and a substrate treating step of performing a supercritical process while repeating supply and exhaust of the supercritical fluid into and out of the interior of the chamber after the supply step, wherein a flow rate of the supercritical fluid supplied into the chamber in the supply step is variable.

公开(公告)号：US20140060575A1

公开(公告)日：2014-03-06

申请号：US14012523

申请日：2013-08-28

Applicant: SEMES CO. LTD

Inventor： Kang Suk Lee ,  Jae Myoung Lee ,  Bok Kyu Lee ,  Yong Hee Lee ,  Jin Bok Lee

IPC: H01L21/02

CPC classification number: H01L21/02057 ,  H01L21/67028 ,  H01L21/6715

Abstract: Provided is a substrate treating method. The substrate treating method may include treating a substrate by using a chemical solution; rinsing the substrate by using pure water after treating the substrate by using the chemical solution; and treating the substrate by using an organic solvent, wherein the substrate treating method further includes coating the substrate with a hydrophobic membrane between the treating of the chemical solution and the treating of the organic solvent.

Abstract translation: 提供了一种基板处理方法。 基板处理方法可以包括使用化学溶液处理基板; 通过使用化学溶液处理基材后，使用纯水冲洗基材; 以及使用有机溶剂处理所述基材，其中所述基材处理方法还包括在所述化学溶液的处理和所述有机溶剂的处理之间用疏水膜涂覆所述基材。

公开(公告)号：US11804386B2

公开(公告)日：2023-10-31

申请号：US17244722

申请日：2021-04-29

Applicant: SEMES CO., LTD.

Inventor： Young Hun Lee ,  Jae Myoung Lee

IPC: H01L21/06 ,  H01L21/677 ,  H01L21/687 ,  H01L21/67

CPC classification number: H01L21/6704 ,  H01L21/6719 ,  H01L21/67023 ,  H01L21/67051 ,  H01L21/67253 ,  H01L21/67703 ,  H01L21/67742 ,  H01L21/67781 ,  H01L21/68707 ,  H01L21/68764

Abstract: Disclosed are an apparatus and a method for liquid-treating a substrate. An apparatus for treating a substrate includes a liquid treatment chamber that supplies a liquid onto the substrate to liquid-treat the substrate, a drying chamber that removes the remained liquid on the substrate, and a transfer unit that transfers the substrate between the liquid treatment chamber and the drying chamber, wherein the transfer unit includes a hand that supports the substrate, and a weight measuring unit that measures a weight of the remained liquid on the substrate. A weight of a remained liquid on a substrate may be measured by measuring a weight of the substrate while the substrate is transferred.

公开(公告)号：US11703520B2

公开(公告)日：2023-07-18

申请号：US17482845

申请日：2021-09-23

Applicant: SEMES CO., LTD.

Inventor： Yong-Jun Seo ,  Sang Hyun Son ,  Ji Su Hong ,  Jae Myoung Lee ,  Dong Ok Ahn

IPC: G01P5/12 ,  G01P13/04 ,  G01P13/00 ,  G01P13/02

CPC classification number: G01P5/12 ,  G01P13/006 ,  G01P13/02 ,  G01P13/045

Abstract: The inventive concept provides a wafer type sensor unit which acquires data on a wind direction and a wind velocity of an air flow during processing, the wafer type sensor unit supported by a supporting unit of a substrate processing apparatus. The unit comprising a wafer-shaped circuit board and a hot-wired wind velocity sensor placed apart from an upper surface of the circuit board.