公开(公告)号：US20210225612A1

公开(公告)日：2021-07-22

申请号：US17144647

申请日：2021-01-08

申请人： Tokyo Electron Limited

发明人： Eiki KAMATA ,  Taro IKEDA ,  Mikio SATO ,  Nobuhiko YAMAMOTO

IPC分类号： H01J37/32 ,  H05H1/46

摘要： An array antenna radiates an electromagnetic wave into a chamber of a plasma processing apparatus. The array antenna includes antennas and coupling prevention elements arranged at intervals between the antennas. Each of the coupling prevention elements includes a first member connected to a ceiling wall which is a ground surface in the chamber and a second member connected to a tip end of the first member or a vicinity of the tip end of the first member.

公开(公告)号：US20210125814A1

公开(公告)日：2021-04-29

申请号：US17076463

申请日：2020-10-21

申请人： Tokyo Electron Limited

发明人： Mikio SATO ,  Eiki KAMATA ,  Taro IKEDA

IPC分类号： H01J37/32 ,  H01L21/67 ,  H01L21/66 ,  C23C16/50 ,  C23C16/52

摘要： A method of controlling a scanning-type plasma processing apparatus using a phased array antenna, includes observing light emission of plasma generated inside a processing container through observation windows provided at multiple positions in the processing container, calculating an in-plane distribution of values representing characteristics of the plasma on a substrate, based on data on the observed light emission of the plasma, and correcting a scanning pattern and/or a plasma density distribution of the plasma based on the calculated in-plane distribution of the values representing the characteristics of the plasma on the substrate.