公开(公告)号：US20220269182A1

公开(公告)日：2022-08-25

申请号：US17501848

申请日：2021-10-14

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tai-Yu CHEN ,  Shang-Chieh CHIEN ,  Sheng-Kang YU ,  Li-Jui CHEN ,  Heng-Hsin LIU

IPC: G03F7/20 ,  G06N20/00

Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a collector and a plurality of vibration sensors coupled to the collector. The vibration sensors generate sensor signals indicative of shockwaves from laser pulses and impacts from debris. The system utilizes the sensor signals to improve the quality of EUV light generation.

公开(公告)号：US20210149317A1

公开(公告)日：2021-05-20

申请号：US16683432

申请日：2019-11-14

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Hsiang CHEN ,  Sheng-Kang YU ,  Shang-Chieh CHIEN ,  Li-Jui CHEN

IPC: G03F9/00 ,  G03F7/20

Abstract: A method of controlling a temperature of the semiconductor device includes operating an semiconductor apparatus; maintaining a temperature of a vessel of the semiconductor apparatus with a first cooling output by a cooling controller; heating the vessel for removing a material on the vessel; transferring a first signal, by a converter, to the cooling controller when heating the vessel; and reducing the first cooling output to a second cooling output by the cooling controller base on the first signal.

公开(公告)号：US20200041783A1

公开(公告)日：2020-02-06

申请号：US16517511

申请日：2019-07-19

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Kuo-An LIU ,  Gwan-Sin CHANG ,  Bharath Kumar Pulicherla ,  Li-Jui CHEN ,  Sheng-Kang YU ,  Chung-Cheng WU ,  Zhiqiang WU

IPC: G02B27/00 ,  G21K1/06 ,  H05G2/00

Abstract: An EUV collector mirror for an extreme ultra violet (EUV) radiation source apparatus includes an EUV collector mirror body on which a reflective layer as a reflective surface is disposed, a trajectory correcting device attached to or embedded in the EUV collector mirror body and a trajectory correcting device to adjust the trajectory of metal from the reflective surface of the EUV collector mirror body to an opposite side of the EUV collector mirror body.