公开(公告)号：US11448975B2

公开(公告)日：2022-09-20

申请号：US17171119

申请日：2021-02-09

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Ching Lee ,  Te-Chih Huang ,  Yu-Piao Fang

IPC: G03F7/20 ,  G03F1/42 ,  G03F1/22 ,  G03F1/24

Abstract: An overlay mark includes a first, a second, a third, and a fourth component. The first component is located in a first region of the first overlay mark and includes a plurality of gratings that extend in a first direction. The second component is located in a second region of the first overlay mark and includes a plurality of gratings that extend in the first direction. The third component is located in a third region of the first overlay mark and includes a plurality of gratings that extend in a second direction different from the first direction. The fourth component is located in a fourth region of the first overlay mark and includes a plurality of gratings that extend in the second direction. The first region is aligned with the second region. The third region is aligned with the fourth region.