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11.发明申请公开(公告)号：US20110150345A1
公开(公告)日：2011-06-23
申请号：US13034237
申请日：2011-02-24
IPC分类号： G06K9/62
CPC分类号： G06K9/6204 , G06K9/4633
摘要： A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product.
摘要翻译： 能够选择合适的测量对象图案的模式匹配方法，即使在包含周期性结构的样本上，也可以使计算机程序使计算机执行模式匹配。 在执行对象样本的基于设计数据的第一图像与第二图像之间的匹配的图案匹配方法中，确定在区域中是否包括周期性结构以执行匹配，以便选择图案 基于在所述图像中设置的原始点与构成所述周期性结构的图案之间的距离，在所述区域中包括周期性结构的情况下，以及基于所述图像中的图案的一致性来选择图案 在周期性结构不包括在所述区域中的情况下，以及计算机程序产品。
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12.发明申请公开(公告)号：US20080037830A1
公开(公告)日：2008-02-14
申请号：US11698988
申请日：2007-01-29
IPC分类号： G06K9/00
CPC分类号： G06K9/6204 , G06K9/4633
摘要： A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product.
摘要翻译： 能够选择合适的测量对象图案的模式匹配方法，即使在包含周期性结构的样本上，也可以使计算机程序使计算机执行模式匹配。 在执行对象样本的基于设计数据的第一图像与第二图像之间的匹配的图案匹配方法中，确定在区域中是否包括周期性结构以执行匹配，以便选择图案 基于在所述图像中设置的原始点与构成所述周期性结构的图案之间的距离，在所述区域中包括周期性结构的情况下，以及基于所述图像中的图案的一致性来选择图案 在周期性结构不包括在所述区域中的情况下，以及计算机程序产品。
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公开(公告)号：US20070223803A1
公开(公告)日：2007-09-27
申请号：US11723577
申请日：2007-03-21
IPC分类号： G06K9/00
CPC分类号： G06K9/2036 , G06T7/0006 , G06T2207/10056 , G06T2207/30148 , H01J2237/221 , H01J2237/24592
摘要： It is an object of the invention to provide a suitable method for identifying depression/protrusion information in a design data; and a program and an apparatus for the same; for example, even in the case that similar portions are arranged, to provide a method for enabling a pattern matching with high precision between the design data and an image obtained by an image formation apparatus or the like; and a program and an apparatus for the same. To attain the above object, a pattern matching method, wherein, using information concerning a depression and/or a protrusion of the pattern on the design data, or a pattern portion and/or a non-pattern portion on the design data, pattern matching is executed between the pattern on the design data and the pattern on said image; and a program for the same are provided.
摘要翻译： 本发明的目的是提供一种用于在设计数据中识别抑郁/突出信息的合适方法; 以及用于其的程序和装置; 例如，即使在配置相似部分的情况下，也可以提供一种能够在设计数据和由图像形成装置等获得的图像之间实现高精度的图案匹配的方法; 以及用于其的程序和装置。 为了实现上述目的，提供了一种图案匹配方法，其中使用关于设计数据上的图案的凹陷和/或突出的信息，或者设计数据上的图案部分和/或非图案部分的图案匹配 在设计数据上的图案和所述图像上的图案之间执行; 并提供其程序。
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14.发明授权公开(公告)号：US08244042B2
公开(公告)日：2012-08-14
申请号：US13034237
申请日：2011-02-24
IPC分类号： G06K9/32
CPC分类号： G06K9/6204 , G06K9/4633
摘要： A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product.
摘要翻译： 能够选择合适的测量对象图案的模式匹配方法，即使在包含周期性结构的样本上，也可以使计算机程序使计算机执行模式匹配。 在执行对象样本的基于设计数据的第一图像与第二图像之间的匹配的图案匹配方法中，确定在区域中是否包括周期性结构以执行匹配，以便选择图案 基于在所述图像中设置的原始点与构成所述周期性结构的图案之间的距离，在所述区域中包括周期性结构的情况下，以及基于所述图像中的图案的一致性来选择图案 在周期性结构不包括在所述区域中的情况下，以及计算机程序产品。
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公开(公告)号：US07889909B2
公开(公告)日：2011-02-15
申请号：US11723577
申请日：2007-03-21
IPC分类号： G06K9/00
CPC分类号： G06K9/2036 , G06T7/0006 , G06T2207/10056 , G06T2207/30148 , H01J2237/221 , H01J2237/24592
摘要： It is an object of the invention to provide a suitable method for identifying depression/protrusion information in a design data; and a program and an apparatus for the same; for example, even in the case that similar portions are arranged, to provide a method for enabling a pattern matching with high precision between the design data and an image obtained by an image formation apparatus or the like; and a program and an apparatus for the same. To attain the above object, a pattern matching method, wherein, using information concerning a depression and/or a protrusion of the pattern on the design data, or a pattern portion and/or a non-pattern portion on the design data, pattern matching is executed between the pattern on the design data and the pattern on said image; and a program for the same are provided.
摘要翻译： 本发明的目的是提供一种用于在设计数据中识别抑郁/突出信息的合适方法; 以及用于其的程序和装置; 例如，即使在配置相似部分的情况下，也可以提供一种能够在设计数据和由图像形成装置等获得的图像之间实现高精度的图案匹配的方法; 以及用于其的程序和装置。 为了实现上述目的，提供了一种图案匹配方法，其中使用关于设计数据上的图案的凹陷和/或突出的信息，或者设计数据上的图案部分和/或非图案部分的图案匹配 在设计数据上的图案和所述图像上的图案之间执行; 并提供其程序。
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16.发明授权Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus 有权样品尺寸检测/测量方法和样品尺寸检测/测量仪器公开(公告)号：US08338804B2
公开(公告)日：2012-12-25
申请号：US13041894
申请日：2011-03-07
CPC分类号： G01B15/04 , G03F1/86 , G06T7/001 , G06T7/13 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： One of principal objects of the present invention is to provide a sample dimension measuring method for detecting the position of an edge of a two-dimensional pattern constantly with the same accuracy irrespective of the direction of the edge and a sample dimension measuring apparatus. According to this invention, to accomplish the above object, it is proposed to correct the change of a signal waveform of secondary electrons which depends on the direction of scanning of an electron beam relative to the direction of a pattern edge of an inspection objective pattern. It is proposed that when changing the scanning direction of the electron beam in compliance with the direction of a pattern to be measured, errors in the scanning direction and the scanning position are corrected. In this configuration, a sufficient accuracy of edge detection can be obtained irrespective of the scanning direction of the electron beam.
摘要翻译： 本发明的主要目的之一是提供一种用于以与边缘的方向无关的方式以相同的精度恒定地检测二维图案的边缘的位置的样本尺寸测量方法和样本尺寸测量装置。 根据本发明，为了实现上述目的，提出了相对于检查对象图案的图案边缘的方向取决于电子束的扫描方向的二次电子的信号波形的变化。 建议当根据要测量的图案的方向改变电子束的扫描方向时，校正扫描方向和扫描位置的误差。 在该结构中，与电子束的扫描方向无关，可以获得足够的边缘检测精度。
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17.发明授权Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus 有权样品尺寸检测/测量方法和样品尺寸检测/测量仪器公开(公告)号：US07923703B2
公开(公告)日：2011-04-12
申请号：US12279564
申请日：2007-02-09
CPC分类号： G01B15/04 , G03F1/86 , G06T7/001 , G06T7/13 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： One of principal objects of the present invention is to provide a sample dimension measuring method for detecting the position of an edge of a two-dimensional pattern constantly with the same accuracy irrespective of the direction of the edge and a sample dimension measuring apparatus. According to this invention, to accomplish the above object, it is proposed to correct the change of a signal waveform of secondary electrons which depends on the direction of scanning of an electron beam relative to the direction of a pattern edge of an inspection objective pattern. It is proposed that when changing the scanning direction of the electron beam in compliance with the direction of a pattern to be measured, errors in the scanning direction and the scanning position are corrected. In this configuration, a sufficient accuracy of edge detection can be obtained irrespective of the scanning direction of the electron beam.
摘要翻译： 本发明的主要目的之一是提供一种用于以与边缘的方向无关的方式以相同的精度恒定地检测二维图案的边缘的位置的样本尺寸测量方法和样本尺寸测量装置。 根据本发明，为了实现上述目的，提出了相对于检查对象图案的图案边缘的方向取决于电子束的扫描方向的二次电子的信号波形的变化。 建议当根据要测量的图案的方向改变电子束的扫描方向时，校正扫描方向和扫描位置的误差。 在该结构中，与电子束的扫描方向无关，可以获得足够的边缘检测精度。
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18.发明申请SAMPLE DIMENSION INSPECTING/MEASURING METHOD AND SAMPLE DIMENSION INSPECTING/MEASURING APPARATUS 有权样本尺寸检查/测量方法和样品尺寸检查/测量装置公开(公告)号：US20090218491A1
公开(公告)日：2009-09-03
申请号：US12279564
申请日：2007-02-09
IPC分类号： G01N23/00
CPC分类号： G01B15/04 , G03F1/86 , G06T7/001 , G06T7/13 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： One of principal objects of the present invention is to provide a sample dimension measuring method for detecting the position of an edge of a two-dimensional pattern constantly with the same accuracy irrespective of the direction of the edge and a sample dimension measuring apparatus. According to this invention, to accomplish the above object, it is proposed to correct the change of a signal waveform of secondary electrons which depends on the direction of scanning of an electron beam relative to the direction of a pattern edge of an inspection objective pattern. It is proposed that when changing the scanning direction of the electron beam in compliance with the direction of a pattern to be measured, errors in the scanning direction and the scanning position are corrected. In this configuration, a sufficient accuracy of edge detection can be obtained irrespective of the scanning direction of the electron beam.
摘要翻译： 本发明的主要目的之一是提供一种用于以与边缘的方向无关的方式以相同的精度恒定地检测二维图案的边缘的位置的样本尺寸测量方法和样本尺寸测量装置。 根据本发明，为了实现上述目的，提出了相对于检查对象图案的图案边缘的方向取决于电子束的扫描方向的二次电子的信号波形的变化。 建议当根据要测量的图案的方向改变电子束的扫描方向时，校正扫描方向和扫描位置的误差。 在该结构中，与电子束的扫描方向无关，可以获得足够的边缘检测精度。
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公开(公告)号：US20100138801A1
公开(公告)日：2010-06-03
申请号：US12698201
申请日：2010-02-02
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G01R31/303
摘要： A system and a method for detecting a defect, capable of extracting a defect occurring depending on finishing accuracy required for circuit operation are provided. The system includes a timing analyzer for extracting a critical path in which a high accuracy is required for a signal transmission operation as compared with other portions based on circuit design data, a critical path extractor for comparing the circuit design data with layout design data on a pattern and for extracting graphical data including the critical path extracted by the timing analyzer, an inspection recipe creator for deciding a portion to be inspected, based on coordinate information on the graphical data including the critical path extracted by the critical path extractor, and an SEM defect review apparatus for acquiring an image of the decided portion to be inspected on a wafer according to an inspection recipe created by the inspection recipe creator.
摘要翻译： 提供一种用于检测缺陷的系统和方法，其能够提取根据电路操作所需的精加工精度而发生的缺陷。 该系统包括用于提取与其他部分相比基于电路设计数据而与信号传输操作相比需要高精度的关键路径的定时分析器，用于将电路设计数据与布局设计数据进行比较的关键路径提取器 基于关于包括由关键路径提取器提取的关键路径的图形数据的坐标信息，以及扫描电子显微镜（SEM）来提取包括由定时分析器提取的关键路径的图形数据，用于决定待检查部分的检查配方生成器 缺陷检查装置，用于根据由检查配方创建者创建的检查配方在晶片上获取所确定的待检查部分的图像。
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20.发明申请Method and apparatus for measuring dimension of a pattern formed on a semiconductor wafer 有权用于测量形成在半导体晶片上的图案的尺寸的方法和装置公开(公告)号：US20060288325A1
公开(公告)日：2006-12-21
申请号：US11342694
申请日：2006-01-31
IPC分类号： G06F17/50
CPC分类号： G03F7/70625
摘要： In an imaging recipe creating apparatus that uses a scanning electron microscope to create an imaging recipe for SEM observation of a semiconductor pattern, in order that the imaging recipe for measuring the wiring width and other various dimension values of the pattern from an observation image and thus evaluating the shape of the pattern is automatically generated within a minimum time by the analysis using the CAD image obtained by conversion from CAD data, an CAD image creation unit that creates the CAD image by converting the CAD data into an image format includes an image-quantizing width determining section, a brightness information providing section, and a pattern shape deformation processing section; the imaging recipe being created using the CAD image created by the CAD image creation unit.
摘要翻译： 在使用扫描电子显微镜创建半导体图案的SEM观察的成像配方的成像配方制作装置中，为了从观察图像测量布线宽度和图案的其他各种尺寸值的成像配方，从而 通过使用通过从CAD数据转换获得的CAD图像的分析，在最小时间内自动生成图案的形状，通过将CAD数据转换为图像格式来创建CAD图像的CAD图像创建单元， 量化宽度确定部分，亮度信息提供部分和图案形状变形处理部分; 使用由CAD图像创建单元创建的CAD图像来创建成像配方。
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