NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND ELECTRONIC PARTS
    11.
    发明申请
    NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND ELECTRONIC PARTS 有权
    负型型光敏树脂组合物,图案形成方法和电子部件

    公开(公告)号:US20090181224A1

    公开(公告)日:2009-07-16

    申请号:US12067911

    申请日:2006-06-20

    IPC分类号: B32B3/10 G03F7/004 G03F7/20

    摘要: A negative-type photosensitive resin composition which is good in sensitivity and resolution, a pattern forming method by the use thereof wherein a pattern which can be developed in an alkali aqueous solution, is excellent in sensitivity, resolution and heat resistance and has a good shape is obtained, and highly reliable electronic parts are provided. The negative-type photosensitive rein composition includes (a) a polymer that has a phenolic hydroxyl group at a terminal and is soluble in the alkali aqueous solution, (b) a compound that generates an acid by irradiating active light, and (c) a compound that can be crosslinked or polymerized by an action of the acid.

    摘要翻译: 敏感性和分辨率好的负型感光性树脂组合物,其中可以在碱性水溶液中显影的图案的图案形成方法具有优异的灵敏度,分辨率和耐热性,并且具有良好的形状 并且提供高可靠性的电子部件。 负型感光性组合物包含(a)末端具有酚羟基并且可溶于碱性水溶液的聚合物,(b)通过照射活性光而产生酸的化合物,和(c) 可以通过酸的作用进行交联或聚合的化合物。

    POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, ELECTRONIC COMPONENT
    13.
    发明申请
    POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, ELECTRONIC COMPONENT 有权
    正性感光树脂组合物,形成图案的方法,电子元件

    公开(公告)号:US20100258336A1

    公开(公告)日:2010-10-14

    申请号:US12739127

    申请日:2008-10-29

    IPC分类号: H05K1/00 G03F7/004 G03F7/20

    摘要: Provided are a positive photosensitive resin composition that is developable in an alkaline aqueous solution and gives a good shaped pattern that is excellent in heat resistance and mechanical property, a method for producing the pattern and an electronic component. The positive photosensitive resin composition contains (a) polybenzoxazole or a polybenzoxazole precursor polymer having a structural unit represented by either a general formula (1) or (2) and satisfying conditions (i) and/or (ii), (b) a compound that generates an acid by being irradiated with active light ray and (c) a compound having a structure represented by a general formula (3) crosslinkable or polymerizable with said component (a).

    摘要翻译: 提供一种可在碱性水溶液中显影的正型感光性树脂组合物,并且具有耐热性和机械性能优异的良好成型图案,该图案的制造方法和电子部件。 正型感光性树脂组合物含有(a)聚苯并恶唑或具有由通式(1)或(2)表示的结构单元并满足条件(i)和/或(ii),(b)的化合物的聚苯并恶唑前体聚合物, 其通过用活性光线照射产生酸,和(c)具有与所述组分(a)可交联或可聚合的由通式(3)表示的结构的化合物。

    Negative-type photosensitive resin composition, pattern forming method and electronic parts
    14.
    发明授权
    Negative-type photosensitive resin composition, pattern forming method and electronic parts 有权
    负型感光性树脂组合物,图案形成方法和电子部件

    公开(公告)号:US08758977B2

    公开(公告)日:2014-06-24

    申请号:US13006300

    申请日:2011-01-13

    IPC分类号: G03F7/023 G03F7/038 G03F7/38

    摘要: A negative-type photosensitive resin composition which is good in sensitivity and resolution, a pattern forming method by the use thereof wherein a pattern which can be developed in an alkali aqueous solution, is excellent in sensitivity, resolution and heat resistance and has a good shape is obtained, and highly reliable electronic parts are provided. The negative-type photosensitive rein composition includes (a) a polymer that has a phenolic hydroxyl group at a terminal and is soluble in the alkali aqueous solution, (b) a compound that generates an acid by irradiating active light, and (c) a compound that can be crosslinked or polymerized by an action of the acid.

    摘要翻译: 敏感性和分辨率好的负型感光性树脂组合物,其中可以在碱性水溶液中显影的图案的图案形成方法具有优异的灵敏度,分辨率和耐热性,并且具有良好的形状 并且提供高可靠性的电子部件。 负型感光性组合物包含(a)末端具有酚羟基并且可溶于碱性水溶液的聚合物,(b)通过照射活性光而产生酸的化合物,和(c) 可以通过酸的作用进行交联或聚合的化合物。

    Positive photosensitive resin composition, process for producing pattern and electronic parts
    15.
    发明授权
    Positive photosensitive resin composition, process for producing pattern and electronic parts 失效
    正型感光性树脂组合物,图案和电子部件的制造方法

    公开(公告)号:US06436593B1

    公开(公告)日:2002-08-20

    申请号:US09666541

    申请日:2000-09-21

    IPC分类号: G03F7021

    摘要: Disclosed are a positive type photosensitive resin composition which comprises (A) a polyimide precursor or a polyoxazole precursor having a group represented by —OR, wherein R represents a monovalent group constituting a acetal or ketal, an alkoxyalkyl group or an alkylsilyl group, which can be converted into a hydrogen atom by decomposition with an action of an acid, in the molecule which is bonded to an aromatic ring, and (B) a compound which generates an acid by irradiating radiation, a process for producing the same and electronic parts using the same.

    摘要翻译: 公开了一种正型型感光性树脂组合物,其包含(A)具有由-OR表示的基团的聚酰亚胺前体或聚恶唑前体,其中R表示构成缩醛或缩酮的一价基团,烷氧基烷基或烷基甲硅烷基,其可以 在与芳香环结合的分子中通过酸分解而转化为氢原子,(B)通过照射辐射产生酸的化合物,其制备方法和使用的电子部件 一样。