摘要:
The invention relates a halftone phase shift photomask and a blank therefor, which enables the transmittance of a phase shift portion to be varied even after blank or photomask fabrication, can accommodate to a variety of patterns, and can be fabricated on a mass scale. The exposure light transmittance of a halftone phase shift layer is arbitrarily variable within the range of 1% to 50%, inclusive, by exposing the blank or photomask to a high temperature elevated to at least 150.degree. C., to an oxidizing atmosphere, or to a reducing atmosphere at a step that can provided independent of the steps for film-forming or photomask fabrication step. This enables the exposure light transmittance of the halftone phase shift layer to be changed to any desired value after blank or photomask fabrication, and so an optimal halftone phase shift photomask to be obtained depending on the size, area, location, shape, and the like of the transferred pattern.
摘要:
A chromium blank for forming a black matrix-screen to be used as a color filter for a liquid crystal display is formed by forming at least a first antireflection film, a second antireflection film and a screening film sequentially in that order on one major surface of a transparent substrate. Each of the first and the second antireflection film is a semitransparent film formed of a chromium compound or a chromium mixture, containing chromium as a principal component, and the screening film is formed of chromium, a chromium compound containing chromium as a principal component. The transparent substrate, the first antireflection film, the second antireflection film and the screening film meet an inequality: n.sub.s
摘要:
The invention relates to a halftone phase shift photomask which is controlled with precision in terms of its transmittance at a wavelength applied to inspection, and measuring equipment, so that its quality can easily be assured even when its phase difference at an exposure wavelength is controlled at 180° C. with precision and its transmittance is set at 1 to 20% as desired at that wavelength. The halftone phase shift photomask (107) comprises on a transparent substrate (101) and a halftone phase shift film containing at least tantalum, oxygen, carbon and nitrogen, and has a multilayer structure comprising at least two or more different layers (102) and (103).
摘要:
A permanent connector for optical fibers comprises a protective glass tube (2), a capillary tube (1) received therein and eccentrically joined thereto, the two tubes being made of ultraviolet-transmitting glass, and an adhesive-passing groove (1c) formed in the middle portion of the capillary tube (1) and opening on the side opposite to the side where they are joined together. An ultraviolet-curing type adhesive agent is charged into the permanent connector for optical fibers and the ends of optical fibers (3, 4) are inserted thereinto through the opposite ends thereof until the clads (3a, 4a) are butted against each other in the capillary tube (1) while pushing out the adhesive agent and air. And ultraviolet rays are radiated to cure the adhesive agent (6), thereby connecting the optical fibers (3, 4) together.
摘要:
An optical fiber fixing element consists of a glass tube having an inner hole for receiving a clad portion of an optical fiber and which is formed at one end with a conical flared portion converging into the inner hole and a recess for receiving a cover portion of the optical fiber thereinto, both the flared portion and the recess being formed concentrically with the glass tube. A method of manufacturing such optical fiber fixing element is also provided which comprises forming an erosion resistant film on an outer surface, other than an end face, of a glass tube having an inner hole, treating the end face of the glass tube with a glass erosive solution to thereby form a flared portion, and grinding the flared portion to thereby form a recess in the flared portion.