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1.发明授权Chromium blanks for forming black matrix-screen and color filter for liquid crystal display 失效用于形成用于液晶显示的黑色矩阵屏幕和滤色器的铬空白
公开(公告)号：US5592317A
公开(公告)日：1997-01-07
申请号：US576138
申请日：1995-12-21
申请人： Junji Fujikawa , Yukio Iimura , Masahiro Takahashi , Takashi Nishimoto , Hiroyuki Matsui , Masanobu Fujita
发明人： Junji Fujikawa , Yukio Iimura , Masahiro Takahashi , Takashi Nishimoto , Hiroyuki Matsui , Masanobu Fujita
IPC分类号： G02B5/20 , G02F1/1335 , G03F1/00
CPC分类号： G02F1/133512 , G03F7/0007
摘要： A chromium blank for forming a black matrix-screen to be used as a color filter for a liquid crystal display is formed by forming at least a first antireflection film, a second antireflection film and a screening film sequentially in that order on one major surface of a transparent substrate. Each of the first and the second antireflection film is a semitransparent film formed of a chromium compound or a chromium mixture, containing chromium as a principal component, and the screening film is formed of chromium, a chromium compound containing chromium as a principal component. The transparent substrate, the first antireflection film, the second antireflection film and the screening film meet an inequality: n.sub.s
摘要翻译： 用于形成用作液晶显示器的滤色器的黑色矩阵屏的铬坯通过在至少一个主表面依次形成至少第一防反射膜，第二抗反射膜和屏蔽膜 透明基材。 第一和第二抗反射膜中的每一个是由以铬为主要成分的铬化合物或铬混合物形成的半透明膜，筛选膜由以铬为主要成分的铬化合物形成。 透明衬底，第一抗反射膜，第二抗反射膜和屏蔽膜满足不等式：ns
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2.发明授权Blanks for halftone phase shift photomasks, halftone phase shift photomasks, and methods for fabricating them 失效半色调相移光掩模的空白，半色调相移光掩模及其制造方法
公开(公告)号：US5614335A
公开(公告)日：1997-03-25
申请号：US282465
申请日：1994-08-01
申请人： Keiji Hashimoto , Junji Fujikawa , Hiroshi Mohri , Masahiro Takahashi , Hiroyuki Miyashita , Yukio Iimura
发明人： Keiji Hashimoto , Junji Fujikawa , Hiroshi Mohri , Masahiro Takahashi , Hiroyuki Miyashita , Yukio Iimura
IPC分类号： G03F1/32 , G03F1/68 , H01L21/027 , G03F9/00
CPC分类号： G03F1/32
摘要： The invention relates a halftone phase shift photomask and a blank therefor, which enables the transmittance of a phase shift portion to be varied even after blank or photomask fabrication, can accommodate to a variety of patterns, and can be fabricated on a mass scale. The exposure light transmittance of a halftone phase shift layer is arbitrarily variable within the range of 1% to 50%, inclusive, by exposing the blank or photomask to a high temperature elevated to at least 150.degree. C., to an oxidizing atmosphere, or to a reducing atmosphere at a step that can provided independent of the steps for film-forming or photomask fabrication step. This enables the exposure light transmittance of the halftone phase shift layer to be changed to any desired value after blank or photomask fabrication, and so an optimal halftone phase shift photomask to be obtained depending on the size, area, location, shape, and the like of the transferred pattern.
摘要翻译： 本发明涉及一种半色调相移光掩模及其空白处理，即使在空白或光掩模制造之后，相移部分的透射率也能够变化，可以适应各种图案，并且可以大规模制造。 半色调相变层的曝光透光率可以在1％至50％的范围内任意变化，包括在内，将空白或光掩模暴露于升高至少150℃的高温至氧化气氛，或 在可以独立于成膜或光掩模制造步骤的步骤的步骤中进行还原气氛。 这使得半色调相移层的曝光光透射率在空白或光掩模制造之后变为任何期望值，因此根据尺寸，面积，位置，形状等获得最佳半色调相移光掩模 的转移模式。
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3.发明授权Blanks for halftone phase shift photomasks, halftone phase shift photomasks, and methods for fabricating them 失效半色调相移光掩模的空白，半色调相移光掩模及其制造方法
公开(公告)号：US5721075A
公开(公告)日：1998-02-24
申请号：US783829
申请日：1997-01-13
申请人： Keiji Hashimoto , Junji Fujikawa , Hiroshi Mohri , Masahiro Takahashi , Hiroyuki Miyashita , Yukio Iimura
发明人： Keiji Hashimoto , Junji Fujikawa , Hiroshi Mohri , Masahiro Takahashi , Hiroyuki Miyashita , Yukio Iimura
IPC分类号： G03F1/32 , G03F1/68 , H01L21/027 , G03F9/00
CPC分类号： G03F1/32
摘要： The invention relates a halftone phase shift photomask and a blank therefor, which enables the transmittance of a phase shift portion to be varied even after blank or photomask fabrication, can accommodate to a variety of patterns, and can be fabricated on a mass scale. The exposure light transmittance of a halftone phase shift layer is arbitrarily variable within the range of 1% to 50%, inclusive, by exposing the blank or photomask to a high temperature elevated to at least 150.degree. C., to an oxidizing atmosphere, or to a reducing atmosphere at a step that can provided independent of the steps for film-forming or photomask fabrication step. This enables the exposure light transmittance of the halftone phase shift layer to be changed to any desired value after blank or photomask fabrication, and so an optimal halftone phase shift photomask to be obtained depending on the size, area, location, shape, and the like of the transferred pattern.
摘要翻译： 本发明涉及一种半色调相移光掩模及其空白处理，即使在空白或光掩模制造之后，相移部分的透射率也能够变化，可以适应各种图案，并且可以大规模制造。 半色调相变层的曝光透光率可以在1％至50％的范围内任意变化，包括在内，将空白或光掩模暴露于升高至少150℃的高温至氧化气氛，或 在可以独立于成膜或光掩模制造步骤的步骤的步骤中进行还原气氛。 这使得半色调相移层的曝光光透射率在空白或光掩模制造之后变为任何期望值，因此根据尺寸，面积，位置，形状等获得最佳半色调相移光掩模 的转移模式。
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4.发明授权Halftone phase shift photomask, halftone phase shift photomask blank, and methods of producing the same 失效半色调相移光掩模，半色调相移光掩模坯料及其制造方法
公开(公告)号：US5538816A
公开(公告)日：1996-07-23
申请号：US225905
申请日：1994-04-11
申请人： Keiji Hashimoto , Junji Fujikawa , Hiroshi Mohri , Masahiro Takahashi , Hiroyuki Miyashita , Yukio Iimura
发明人： Keiji Hashimoto , Junji Fujikawa , Hiroshi Mohri , Masahiro Takahashi , Hiroyuki Miyashita , Yukio Iimura
CPC分类号： G03F1/32 , Y10T428/24868
摘要： A halftone phase shift photomask designed so that it is possible to shorten the photoengraving process, use a production line for a conventional photomask, prevent lowering of the contract between the transparent and semitransparent regions at a long wavelength in the visible region, which is used for inspection and measurement, and also prevent charge-up during electron beam exposure, and that ordinary physical cleaning process can be used for the halftone phase shift photomask. The halftone phase shift photomask has on a transparent substrate (1) a region which is semitransparent to exposure light and a region which is transparent to the exposure light so that the phase difference between light passing through the transparent region and light passing through the semitransparent region is substantially .pi. radians. A semitransparent film that constitutes the semitransparent region is arranged in the form of a multilayer film including layers (3, 4) of chromium or a chromium compound. For example, the layer (3) is formed of chromium oxide, chromium oxide nitride, chromium oxide carbide, or chromium oxide nitride carbide, and the layer (4) is formed of chromium or chromium nitride. The layer (3) mainly serves as a phase shift layer, while the layer (4) mainly serves as a transmittance control layer that suppresses the rise of transmittance at the long wavelength side. The semitransparent film is formed by physical vapor deposition.
摘要翻译： 设计成可以缩短光刻工艺的半色调相移光掩模，使用用于常规光掩模的生产线，防止在可见光区域的长波长处的透明区域和半透明区域之间的收缩降低，其用于 检查和测量，并且还防止电子束暴露期间的充电，并且普通的物理清洁过程可用于半色调相移光掩模。 半色调相移光掩模在透明基板（1）上具有与曝光光半透明的区域和对曝光光透明的区域，使得通过透明区域的光与通过半透明区域的光之间的相位差 基本上是pi弧度。 构成半透明区域的半透明膜以包含铬或铬化合物的层（3,4）的多层膜的形式排列。 例如，层（3）由氧化铬，氧化铬氮化物，氧化铬碳化物或氧化铬氮化物构成，层（4）由铬或氮化铬形成。 层（3）主要用作相移层，而层（4）主要用作抑制长波长侧的透射率上升的透射率控制层。 半透明膜通过物理气相沉积形成。
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公开(公告)号：US5419988A
公开(公告)日：1995-05-30
申请号：US102488
申请日：1993-08-05
IPC分类号： H01L21/027 , G03F1/00 , G03F9/00
CPC分类号： G03F1/26 , G03F1/30 , G03F1/32 , Y10T428/24917
摘要： A phase shift photomask and a photomask blank used to produce the same. A dry etching stopper layer, which is disposed between a substrate and a light-shielding layer or between the substrate and a phase shifter layer, is made of either a film mainly composed of tin oxide nitride, which has high etching selectivity and high permeability, or an alumina film formed by sputtering, followed by heat treatment carried out in an oxidizing atmosphere, thereby enabling the required overetching to be satisfactorily performed during etching of the phase shifter layer, and thus making it possible to effect precise phase control. In addition, it is possible to eliminate the occurrence of an in-plane transmittance distribution.
摘要翻译： 相移光掩模和用于制造相同的光掩模坯料。 设置在基板和遮光层之间或基板与移相器层之间的干蚀刻停止层由主要由氧化锡氮化物构成的膜构成，其具有高蚀刻选择性和高磁导率， 或通过溅射形成的氧化铝膜，然后在氧化气氛中进行热处理，从而能够在蚀刻移相层期间令人满意地进行所需的过蚀刻，从而可以实现精确的相位控制。 另外，可以消除面内透射率分布的发生。
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公开(公告)号：US09911856B2
公开(公告)日：2018-03-06
申请号：US12900145
申请日：2010-10-07
IPC分类号： H01L29/786 , H01L29/423
CPC分类号： H01L29/7869 , H01L29/42384 , H01L29/78606 , H01L29/78696
摘要： One of objects is to provide a semiconductor device with stable electric characteristics, in which an oxide semiconductor is used. The semiconductor device includes a thin film transistor including an oxide semiconductor layer, and a silicon oxide layer over the thin film transistor. The thin film transistor includes a gate electrode layer, a gate insulating layer whose thickness is equal to or larger than 100 nm and equal to or smaller than 350 nm, the oxide semiconductor layer, a source electrode layer and a drain electrode layer. In the thin film transistor, the difference of the threshold voltage value is 1 V or less between before and after performance of a measurement in which the voltage of 30 V or −30 V is applied to the gate electrode layer at a temperature of 85° C. for 12 hours.
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公开(公告)号：US09635313B2
公开(公告)日：2017-04-25
申请号：US13538560
申请日：2012-06-29
CPC分类号： G06F3/04845 , G06F3/1454 , G06F17/30056 , G06F2203/04803 , G06F2203/04806 , G06Q10/10 , H04L12/1813 , H04L12/1822 , H04L12/1827 , H04L65/403 , H04M2250/62 , H04N7/15
摘要： An information processing system and a method for operating same are provided. The information processing system includes a first information processing apparatus and a second information processing apparatus. The first information processing apparatus is configured to display a first synchronous image in a first window, the first window having an operation right. The second information processing apparatus has a synchronous state or an asynchronous state. The second information processing apparatus is configured to: display a second synchronous image; in response to a first request, switch from the synchronous state to the asynchronous state; and in response to a second request, switch from the asynchronous state to the synchronous state.
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公开(公告)号：US09627198B2
公开(公告)日：2017-04-18
申请号：US12894791
申请日：2010-09-30
IPC分类号： H01L21/00 , H01L21/84 , H01L21/02 , H01L29/786 , H01L27/12
CPC分类号： H01L21/02554 , G02F1/1368 , G02F1/167 , H01L21/02164 , H01L21/02172 , H01L21/02266 , H01L21/02422 , H01L21/02565 , H01L21/02631 , H01L21/477 , H01L27/1225 , H01L27/127 , H01L27/3262 , H01L29/24 , H01L29/66969 , H01L29/7869 , H01L29/78696
摘要： An object is to provide a semiconductor device with stable electric characteristics in which an oxide semiconductor is used. The impurity concentration in the oxide semiconductor layer is reduced in the following manner: a silicon oxide layer including many defects typified by dangling bonds is formed in contact with the oxide semiconductor layer, and an impurity such as hydrogen or moisture (a hydrogen atom or a compound including a hydrogen atom such as H2O) included in the oxide semiconductor layer is diffused into the silicon oxide layer. Further, a mixed region is provided between the oxide semiconductor layer and the silicon oxide layer. The mixed region includes oxygen, silicon, and at least one kind of metal element that is included in the oxide semiconductor.
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9.发明授权Electronic device including memory arrays with variable resistance storage elements arranged on different sides of a word line driving unit 有权电子设备包括具有布置在字线驱动单元的不同侧上的可变电阻存储元件的存储器阵列公开(公告)号：US09535834B2
公开(公告)日：2017-01-03
申请号：US14563645
申请日：2014-12-08
申请人： Dong-Keun Kim , Masahiro Takahashi , Tsuneo Inaba
发明人： Dong-Keun Kim , Masahiro Takahashi , Tsuneo Inaba
IPC分类号： G06F12/08 , G11C13/00 , G11C11/4099 , G11C11/16
CPC分类号： G11C13/004 , G06F3/061 , G06F3/0656 , G06F3/0679 , G06F12/0207 , G06F12/08 , G06F12/0875 , G06F2212/2024 , G06F2212/452 , G06F2212/60 , G11C11/161 , G11C11/1655 , G11C11/1659 , G11C11/1673 , G11C11/4099 , G11C13/0002 , G11C13/0004 , G11C13/0007 , G11C13/0026 , G11C2013/0054 , G11C2213/79 , G11C2213/82
摘要： An electronic device includes a semiconductor device, wherein the semiconductor device includes: a word line driving unit for driving a plurality of word lines; a first cell array arranged at one side of the word line driving unit; a second cell array arranged at the other side of the word line driving unit; a bias voltage generation unit, arranged between the first cell array and the second cell array, for generating a bias voltage based on currents flowing through the first reference resistance element included in the first cell array and the second reference resistance element included in the second cell array; a first read control unit; and a second read control unit.
摘要翻译： 电子设备包括半导体器件，其中半导体器件包括：用于驱动多个字线的字线驱动单元; 布置在字线驱动单元的一侧的第一单元阵列; 布置在所述字线驱动单元的另一侧的第二单元阵列; 布置在所述第一单元阵列和所述第二单元阵列之间的偏置电压产生单元，用于基于流过所述第一单元阵列中包括的所述第一参考电阻元件的电流和所述第二单元中包括的所述第二参考电阻元件来产生偏置电压 阵列 第一读取控制单元; 和第二读取控制单元。
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公开(公告)号：US09484091B2
公开(公告)日：2016-11-01
申请号：US14636740
申请日：2015-03-03
CPC分类号： G11C13/004 , G11C11/1673 , G11C11/1693 , G11C13/00 , G11C13/0026 , G11C13/0061 , G11C2013/0045 , G11C2013/0054 , G11C2213/79
摘要： According to one embodiment, a resistance change memory includes a memory cell, a sense amplifier and a global bit line. The memory cell is disposed at a location where a local bit line and a word line intersect each other. The memory cell is connected to both the local bit line and the word line. The sense amplifier reads data stored on the memory cell by supplying a read current to the memory cell. The global bit line is connected between the local bit line and the sense amplifier. The global bit line feeds the read current supplied by the sense amplifier to the local bit line. The sense amplifier charges the global bit line, before the local bit line and the global bit line are connected to each other.
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