Method for urea analysis
    11.
    发明授权
    Method for urea analysis 失效
    尿素分析方法

    公开(公告)号:US4505784A

    公开(公告)日:1985-03-19

    申请号:US399246

    申请日:1982-07-19

    CPC分类号: G01N33/5304 G01N33/62

    摘要: For determining the urea concentration in liquids in continuous operation, with high sensitivity and reliable determination of the urea content over an extended period of time, an electrode which is separated from the urea containing liquid by means of a diaphragm with a diffusion coefficient of less than 10.sup.-7 cm.sup.2 s.sup.-1 for urea has impressed on it potentiostatically and cyclically, two potential values, the more positive potential being between 0.9 and 2.0. V/H.sub.2 rev and the more negative potential being lower than 0.6 V/H.sub.2 rev, and at the more positive potential, the current flowing within a predetermined time interval is evaluated as the measuring signal.

    摘要翻译: 为了在连续操作中确定液体中的尿素浓度,在长时间内具有高灵敏度和可靠地测定尿素含量的电极,通过具有扩散系数小于10nm的膜片与含尿素的液体分离的电极 对于尿素,10-7 cm2 s-1对其进行了静电和循环印迹,有两个潜在值,正电位介于0.9和2.0之间。 V / H2rev,负电位低于0.6V / H2rev,在正电位下,将在预定时间间隔内流动的电流作为测量信号。

    Method for the manufacture of an electrode for electrochemical cells
    12.
    发明授权
    Method for the manufacture of an electrode for electrochemical cells 失效
    电化学电池用电极的制造方法

    公开(公告)号:US4126934A

    公开(公告)日:1978-11-28

    申请号:US545404

    申请日:1975-01-30

    IPC分类号: H01M4/98 H01M4/88

    摘要: A method for the manufacture of electrodes for electrochemical cells, is provided in which a Raney rare-metal catalytic layer is disposed on a metallic support structure in layer form. According to the invention, the Raney rare-metal catalytic layer is prepared by dissolving the inactive component of a layer, disposed on the support structure, of a homogeneous alloy of at least one of the metals of the platinum group of the periodic system of the elements as the active component and at least one of the metals of the iron group of the periodic system of the elements as the inactive component; the content of inactive component being at least 65 atom-percent.

    摘要翻译: 提供了一种制造用于电化学电池的电极的方法,其中阮内稀土金属催化剂层以层的形式设置在金属支撑结构上。 根据本发明,阮内稀土金属催化剂层是通过将位于支撑结构上的层的非活性组分溶解在均匀合金中的至少一种金属的周期性系统的铂族金属 作为活性组分的元素和元素的周期性系统的铁基团的至少一种金属作为非活性组分; 非活性组分的含量至少为65原子%。

    Projection exposure method and projection exposure apparatus for microlithography
    13.
    发明授权
    Projection exposure method and projection exposure apparatus for microlithography 有权
    投影曝光法和微光刻投影曝光装置

    公开(公告)号:US07800732B2

    公开(公告)日:2010-09-21

    申请号:US12643637

    申请日:2009-12-21

    IPC分类号: G03B27/42 G03B27/52 G03B27/58

    CPC分类号: G03F7/70333 G03F9/7026

    摘要: A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval. An active compensation of at least one portion of at least one imaging aberration induced by the change in the focus positions during the exposure time interval has the effect that the imaging quality is not significantly impaired by the alteration of the focusing during the exposure time interval.

    摘要翻译: 投影曝光方法,用于在布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像的布置在投影物镜的图像区域的区域中的辐射敏感基板的曝光包括曝光 在曝光时间间隔期间在投影物镜的有效图像场中具有图案的图像的基板,并且还可以在曝光时间间隔期间在曝光时间间隔期间改变基板的表面与投影物镜的焦点表面之间的相对定位 在曝光时间间隔期间,有效图像场中的图像点在掩模的图像的不同焦点位置被曝光的方式。 在曝光时间间隔期间由聚焦位置的变化引起的至少一个成像像差的至少一部分的有效补偿具有这样的效果,即在曝光时间间隔期间聚焦改变不会显着地损害成像质量。

    PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY
    14.
    发明申请
    PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY 有权
    投影曝光方法和投影曝光装置

    公开(公告)号:US20100157266A1

    公开(公告)日:2010-06-24

    申请号:US12643637

    申请日:2009-12-21

    IPC分类号: G03B27/42

    CPC分类号: G03F7/70333 G03F9/7026

    摘要: A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval. An active compensation of at least one portion of at least one imaging aberration induced by the change in the focus positions during the exposure time interval has the effect that the imaging quality is not significantly impaired by the alteration of the focusing during the exposure time interval.

    摘要翻译: 投影曝光方法,用于在布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像的布置在投影物镜的图像区域的区域中的辐射敏感基板的曝光包括曝光 在曝光时间间隔期间在投影物镜的有效图像场中具有图案的图像的基板,并且还可以在曝光时间间隔期间在曝光时间间隔期间改变基板的表面与投影物镜的焦点表面之间的相对定位 在曝光时间间隔期间,有效图像场中的图像点在掩模的图像的不同焦点位置被曝光的方式。 在曝光时间间隔期间由聚焦位置的变化引起的至少一个成像像差的至少一部分的有效补偿具有这样的效果,即在曝光时间间隔期间聚焦改变不会显着地损害成像质量。