ACETIC ACID AND HYPOCHLOROUS ACID COMPOSITIONS FOR TREATMENT OF SKIN TRAUMA

    公开(公告)号:US20220387484A1

    公开(公告)日:2022-12-08

    申请号:US17842100

    申请日:2022-06-16

    摘要: Disinfecting compositions containing hypochlorous acid and acetic acid are useful for treating biofilms in or on tissue, including biofilms related to wounds or other skin trauma. The compositions are useful for treating a variety of types of tissue, both on the surface on beneath the surface of tissue. Compositions are provided having various concentrations for different tissue types and infection levels. Compositions may be provided in gel form, and may include nanoparticle encapsulated molecules for controlled release.

    MULTI-CHAMBER HYPOCHLOROUS ACID DISPENSER

    公开(公告)号:US20210371279A1

    公开(公告)日:2021-12-02

    申请号:US17176085

    申请日:2021-02-15

    IPC分类号: C01B11/04 A01N59/00 B01J19/24

    摘要: The invention provides a skin disinfectant for treating skin with eczema, preventing bacterial proliferation, and removing biofilm. Compositions of the invention include hypochlorous acid, acetic acid, water, and one or more additives or excipients. The formulation process removes metal ions, reduces ionic strength, controls pH, and reduces exposure to air, thus improving stability and lengthening shelf-life.

    Hand disinfectant
    27.
    发明授权

    公开(公告)号:US10675299B2

    公开(公告)日:2020-06-09

    申请号:US15167076

    申请日:2016-05-27

    摘要: The invention provides a skin disinfectant for treating skin with eczema, preventing bacterial proliferation, and removing biofilm. Compositions of the invention include hypochlorous acid, acetic acid, water, and one or more additives or excipients. The formulation process removes metal ions, reduces ionic strength, controls pH, and reduces exposure to air, thus improving stability and lengthening shelf-life.

    Compositions of hypochlorous acid and methods of manufacture thereof

    公开(公告)号:US10577244B2

    公开(公告)日:2020-03-03

    申请号:US14618799

    申请日:2015-02-10

    IPC分类号: C01B11/04 A61K31/19 A61K33/20

    摘要: The invention generally relates to compositions of hypochlorous acid (HOCl) and methods of manufacture thereof. In certain aspects, the invention provides air-free compositions of HOCl. In other aspects, the invention provides methods of making HOCl that involve mixing together in water in an air-free environment, a compound that generates a proton (H+) in water and a compound that generates a hypochlorite anion (OCl−) in water to thereby produce air-free hypochlorous acid.