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公开(公告)号：US20250053106A1
公开(公告)日：2025-02-13
申请号：US18721718
申请日：2022-12-14
Applicant: ASML Netherlands B,V.
Inventor： Sebastianus Adrianus Goorden , Simon Reinald Huisman
IPC: G03F9/00
Abstract: Disclosed is an apparatus for and method of using local alignment position deviation parameters for alignment marks on a semiconductor wafer wherein the parameters are used to generate one or more values indicating a condition of the alignment marks, which values may be used to obtain an wafer grid model having an improved fit.
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22.发明申请公开(公告)号：US20240412067A1
公开(公告)日：2024-12-12
申请号：US18808844
申请日：2024-08-19
Applicant: ASML Netherlands B. V.
Inventor： Lorenzo TRIPODI , Patrick WARNAAR , Grzegorz GRZELA , Mohammadreza HAJIAHMADI , Farzad FARHADZADEH , Patricius Aloysius Jacobus TINNEMANS , Scott Anderson MIDDLEBROOKS , Adrianus Cornelis Matheus KOOPMAN , Frank STAALS , Brennan PETERSON , Anton Bernhard VAN OOSTEN
Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.
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公开(公告)号：US20240142885A1
公开(公告)日：2024-05-02
申请号：US18533662
申请日：2023-12-08
Applicant: ASML NETHERLANDS B. V.
Inventor： Sander Jeroen HERMANUSSEN , Johannes Petrus Martinus Bernardus VERMEULEN , Hans BUTLER , Bas JANSEN , Michael Marinus Anna STEUR
IPC: G03F7/00 , H01L21/687
CPC classification number: G03F7/70725 , G03F7/70708 , G03F7/70783 , H01L21/68735 , H01L21/6875 , H01L21/68785
Abstract: An object table configured to hold an object on a holding surface, the object table including: a main body; a plurality of burls extending from the main body, end surfaces of the burls defining the holding surface; an actuator assembly; and a further actuator assembly, wherein the actuator assembly is configured to deform the main body to generate a long stroke out-of-plane deformation of the holding surface based on shape information of the object that is to be held and the further actuator assembly is configured to generate a short stroke out-of-plane deformation of the holding surface.
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公开(公告)号：US11628498B2
公开(公告)日：2023-04-18
申请号：US17587236
申请日：2022-01-28
Applicant: ASML NETHERLANDS B. V.
Inventor： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC: B22F7/06 , G03F7/20 , B23K26/354 , B23K26/342 , B22F10/20 , B22F10/00 , B23Q3/18 , B05D3/06 , B05D5/00 , B33Y10/00 , B33Y80/00
Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
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公开(公告)号：US20220152703A1
公开(公告)日：2022-05-19
申请号：US17587236
申请日：2022-01-28
Applicant: ASML NETHERLANDS B. V.
Inventor： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC: B22F7/06 , B23K26/354 , B23K26/342 , G03F7/20 , B22F10/20 , B22F10/00 , B23Q3/18 , B05D3/06 , B05D5/00 , B33Y10/00 , B33Y80/00
Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
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Patent Agency Ranking
公开(公告)号：US20210107061A1
公开(公告)日：2021-04-15
申请号：US17132084
申请日：2020-12-23
Applicant: ASML NETHERLANDS B. V.
Inventor： Raymond Wilhelmus Louis LAFARRE , Sjoerd Nicolaas Lambertus DONDERS , Nicolaas TEN KATE , Nina Vladimirovna DZIOMKINA , Yogesh Pramod KARADE , Elisabeth Corinne RODENBURG
IPC: B22F7/06 , G03F7/20 , B05D5/00 , B23K26/342 , B23K26/354 , B23Q3/18 , B33Y10/00 , B33Y80/00 , B05D3/06 , B22F10/00
Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
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公开(公告)号：US20190072860A1
公开(公告)日：2019-03-07
申请号：US16115047
申请日：2018-08-28
Applicant: ASML NETHERLANDS B. V.
Inventor： Bastiaan Onne FAGGINGER AUER , Paul Christiaan HINNEN , Hugo Augustinus Joseph CRAMER , Anagnostis TSIATMAS , Mariya Vyacheslavivna MEDVEDYEVA
Abstract: A target formed on a substrate, the target having: an alignment structure; and a metrology structure; wherein the alignment structure comprises structures that are arranged to generate a beat pattern when the alignment structure is illuminated with source radiation. Advantageously, when the target is illuminated, the beat pattern that appears in an image of the target allows the target to be easily identified using a pattern recognition technique.
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公开(公告)号：US10185223B2
公开(公告)日：2019-01-22
申请号：US15935670
申请日：2018-03-26
Applicant: ASML NETHERLANDS B. V.
Inventor： Takeshi Kaneko , Kornelis Tijmen Hoekerd
IPC: G03F7/20
Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.
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公开(公告)号：US20180341053A1
公开(公告)日：2018-11-29
申请号：US16037751
申请日：2018-07-17
Applicant: ASML Netherlands B. V.
Inventor： Ekkehard BRUNE , Dieter Frerking , Thomas Thönlß , Claus Spruch
Abstract: A laser-operated light source encompasses a chamber for accommodating an ionizable gas and an ignition source for ionizing the gas in the chamber for generating a plasma. The light source furthermore encompasses a laser for inputting laser energy into the plasma such that, under the impact of the laser radiation, the plasma emits useful light, which forms the output signal of the light source, wherein provision is made for means for coupling the useful light into a transferring optical fiber. In the case of the light source according to the invention, at least one mode scrambler is assigned to the optical fiber or the optical fibers.
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30.发明申请公开(公告)号：US20160273906A1
公开(公告)日：2016-09-22
申请号：US15036471
申请日：2014-11-04
Applicant: ASML NETHERLANDS B .V.
Inventor： Maxim PISARENCO , Irwan Dani SETIJA
IPC: G01B11/02
CPC classification number: G01B11/02 , G03F7/705 , G03F7/70625 , G03F7/70633
Abstract: In scatterometry, a merit function including a regularization parameter is used in an iterative process to find values for the scattering properties of the measured target. An optimal value for the regularization parameter is obtained for each measurement target and in each iteration of the iterative process. Various methods can be used to find the value for the regularization parameter, including the Discrepancy Principle, the chi-squared method and novel modifications of the Discrepancy Principle and the chi-squared method including a merit function.
Abstract translation: 在散射法中，在迭代过程中使用包括正则化参数的优值函数来查找测量目标的散射特性的值。 为每个测量目标和迭代过程的每次迭代获得正则化参数的最优值。 可以使用各种方法来找出正则化参数的值，包括差异原理，卡方法和差异原理的新颖修改以及包括优值函数的卡方法。
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