Multilevel texture processing method for mapping multiple images onto 3D models
    21.
    发明申请
    Multilevel texture processing method for mapping multiple images onto 3D models 有权
    用于将多个图像映射到3D模型的多层纹理处理方法

    公开(公告)号:US20070188511A1

    公开(公告)日:2007-08-16

    申请号:US11783477

    申请日:2007-04-10

    IPC分类号: G09G5/00

    CPC分类号: G06T15/04

    摘要: A multilevel texture mapping process for a 3D model which maps different perspective images onto a 3D model is developed. The textures mapped to the 3D model are processed from image level to texture level, then to pixel level to ease the edge appearance problem at the boundary where neighboring images are stitched together caused by different lighting and viewing parameters. The result shows that the smooth transition between neighboring textures provides better visual quality than just blending the boundary where neighboring images stitched.

    摘要翻译: 开发了将不同透视图映射到3D模型的3D模型的多层纹理映射过程。 映射到3D模型的纹理从图像级别到纹理级别处理,然后到像素级别,以便在由不同的照明和查看参数引起的相邻图像被缝合在一起的边界处缓解边缘外观问题。 结果表明,相邻纹理之间的平滑过渡提供更好的视觉质量,而不仅仅是混合相邻图像拼接的边界。

    System for managing sound input/output and method for the same
    22.
    发明申请
    System for managing sound input/output and method for the same 审中-公开
    用于管理声音输入/输出的系统及其方法

    公开(公告)号:US20060259668A1

    公开(公告)日:2006-11-16

    申请号:US11125213

    申请日:2005-05-10

    IPC分类号: G06F13/12

    CPC分类号: G06F13/102 G06F3/16

    摘要: A system for managing a sound input/output and a method for the same are proposed in the present invention. The present invention is used to remove the inconvenience and trouble caused by management and selection of sound devices. A sound device having an identification key is used to drive an integrated sound input/output managing program of a host computer. The system can be used to manage the operation of at least a sound device of the host computer.

    摘要翻译: 在本发明中提出了一种用于管理声音输入/输出的系统及其方法。 本发明用于消除由声音设备的管理和选择引起的不便和麻烦。 使用具有识别键的声音设备来驱动主计算机的集成声音输入/输出管理程序。 该系统可用于管理至少主机的声音设备的操作。

    Method of improving alignment for semiconductor fabrication
    23.
    发明授权
    Method of improving alignment for semiconductor fabrication 有权
    改善半导体制造对准的方法

    公开(公告)号:US06346456B2

    公开(公告)日:2002-02-12

    申请号:US09189119

    申请日:1998-11-09

    申请人: Chia-Chen Chen

    发明人: Chia-Chen Chen

    IPC分类号: H01L23544

    摘要: A method of improving alignment for semiconductor fabrication. A semiconductor substrate is provided. The semiconductor comprises a field region and a scribe line on which an alignment mark is comprised. A plurality of shallow trench isolation structures are formed on the field region and the alignment mark. Each of the shallow trench isolation structures is filled with an insulation layer. The insulation layer within shallow trench isolation trench on the alignment is partly or completely removed. A gate oxide layer and a poly-silicon layer are formed over the semiconductor substrate in sequence. The poly-silicon layer is defined to form a poly-line.

    摘要翻译: 一种提高半导体制造对准的方法。 提供半导体衬底。 半导体包括场区域和划线,其上包括对准标记。 在场区域和对准标记上形成多个浅沟槽隔离结构。 每个浅沟槽隔离结构都填充有绝缘层。 部分或完全去除对准中的浅沟槽隔离沟槽内的绝缘层。 依次在半导体衬底上形成栅氧化层和多晶硅层。 多晶硅层被定义为形成多线。

    Depth image acquiring device, system and method
    24.
    发明授权
    Depth image acquiring device, system and method 有权
    深度图像采集装置,系统和方法

    公开(公告)号:US09030529B2

    公开(公告)日:2015-05-12

    申请号:US13442886

    申请日:2012-04-10

    IPC分类号: H04N13/02 G01B11/25 H04N13/00

    摘要: A depth image acquiring device is provided, which includes at least one projecting device and at least one image sensing device. The projecting device projects a projection pattern to an object. The image sensing device senses a real image. In addition, the projecting device also serves as a virtual image sensing device. The depth image acquiring device generates a disparity image by matching three sets of dual-images formed by two real images and one virtual image, and generates a depth image according to the disparity image. In addition, the depth image acquiring device also generates a depth image by matching two real images, or a virtual image and a real image without verification.

    摘要翻译: 提供一种深度图像获取装置,其包括至少一个投影装置和至少一个图像感测装置。 投影装置将投影图案投射到物体。 图像感测装置感测真实图像。 此外,投影装置还用作虚像摄像装置。 深度图像获取装置通过匹配由两个真实图像和一个虚拟图像形成的三组双重图像来生成视差图像,并且根据视差图像生成深度图像。 此外,深度图像获取装置还通过匹配两个真实图像或虚拟图像和实际图像而不进行验证来生成深度图像。

    Electronic device and fixing structure thereof
    25.
    发明授权
    Electronic device and fixing structure thereof 失效
    电子设备及其固定结构

    公开(公告)号:US08538497B2

    公开(公告)日:2013-09-17

    申请号:US13239975

    申请日:2011-09-22

    CPC分类号: H01Q1/243 H01Q1/12 H04W84/18

    摘要: A fixing structure including a metal housing and a fixing base is disclosed. The housing has a carrying plane and the fixing base having a first contact end and, opposite, a second contact end is disposed on the housing. The perpendicular distance from the first contact end to the carrying plane is greater than that from the second contact end to the carrying plane. A wireless transmission device is disposed on the fixing base and in contact with the first contact end and the second contact end, so that a perpendicular distance from an antenna end of the wireless transmission device to the carrying plane is greater than a perpendicular distance from a fixed end of the wireless transmission device to the carrying plane. Therefore, a relatively great distance is kept between the antenna end and the housing for preventing the antenna end from being interfered by the metal housing.

    摘要翻译: 公开了一种包括金属外壳和固定底座的固定结构。 壳体具有承载平面,并且固定底座具有第一接触端,并且相对于第二接触端设置在壳体上。 从第一接触端到承载平面的垂直距离大于从第二接触端到承载平面的垂直距离。 无线传输装置设置在固定基座上并与第一接触端和第二接触端接触,使得从无线传输装置的天线端到承载平面的垂直距离大于从一个 无线传输设备的固定端到承载平面。 因此,天线端和壳体之间保持相对较大的距离,以防止天线端被金属壳体干扰。

    Method of measuring the overlay accuracy of a multi-exposure process
    26.
    发明申请
    Method of measuring the overlay accuracy of a multi-exposure process 审中-公开
    测量多曝光过程的重叠精度的方法

    公开(公告)号:US20080153012A1

    公开(公告)日:2008-06-26

    申请号:US12068900

    申请日:2008-02-13

    IPC分类号: G03F7/20

    CPC分类号: G03F7/70633

    摘要: A method of measuring the overlay accuracy of a multi-exposure process is provided. The characteristic of this invention is utilizing a scanning electron microscope for monitoring the overlay accuracy real-time during the multi-exposure processes in stead of the conventional optical measurement method.

    摘要翻译: 提供了一种测量多曝光过程的重叠精度的方法。 本发明的特征是利用扫描电子显微镜来代替传统的光学测量方法在多次曝光过程中实时地监视重叠精度。

    Solidified and shelled alcohols
    27.
    发明申请
    Solidified and shelled alcohols 审中-公开
    固化和脱壳醇

    公开(公告)号:US20060101709A1

    公开(公告)日:2006-05-18

    申请号:US10992049

    申请日:2004-11-18

    申请人: Chia-Chen Chen

    发明人: Chia-Chen Chen

    IPC分类号: C10L7/00

    CPC分类号: C10L7/04

    摘要: Alcohols effectively solidified by using various hydroxides in combination with different cellulose compounds, and also, alcohols effectively solidified by using various cyanoacrylate monomers in combination with different cellulose compounds. The cyanoacrylate reactions complete very rapidly in seconds and generally release large amounts of heat. Suitable additives are added to slow down the reactions for gradual heat dissipation and easy manipulation. The alcohol liquids can be solidified as well. Solid alcohol blocks and alcohol gels may be shelled by dipping into cyanoacrylate and coating them with a cyanoacrylate shell for long term storage.

    摘要翻译: 通过使用各种氢氧化物与不同的纤维素化合物组合而有效地固化醇,以及通过使用各种氰基丙烯酸酯单体与不同的纤维素化合物组合而有效固化的醇。 氰基丙烯酸酯反应在几秒钟内非常快速地完成,并且通常释放大量的热量。 添加合适的添加剂以减缓反应,逐渐散热并易于操作。 酒精液体也可以固化。 固体醇嵌段和醇凝胶可以通过浸入氰基丙烯酸酯并用氰基丙烯酸酯壳体涂覆以长期储存来进行包覆。

    Method to form an alignment mark
    29.
    发明授权
    Method to form an alignment mark 有权
    形成对准标记的方法

    公开(公告)号:US6080659A

    公开(公告)日:2000-06-27

    申请号:US191306

    申请日:1998-11-13

    摘要: A method to form a better quality of an alignment pattern includes several steps, first starts from forming a polysilicon layer on a semiconductor substrate. Next, most of a central portion of the polysilicon layer is removed to expose the substrate. Then, an oxide layer is formed over the substrate and is patterned to form an opening, which exposes the substrate. A W layer is deposited over the substrate and is planarized by WCMP process to form a W plug inside the opening. A metal layer is formed over the substrate. The alignment mark pattern is formed on the metal layer.

    摘要翻译: 形成更好质量的取向图案的方法包括若干步骤,首先从在半导体衬底上形成多晶硅层开始。 接下来,去除多晶硅层的大部分中心部分以露出衬底。 然后,在衬底上形成氧化物层,并将其图案化以形成露出衬底的开口。 将W层沉积在衬底上并通过WCMP工艺平坦化,以在开口内形成W插头。 在衬底上形成金属层。 在金属层上形成对准标记图案。