ELECTRON GUN, ELECTRON BEAM APPLICATION DEVICE, METHOD FOR EMITTING ELECTRON USING ELECTRON GUN, AND ELECTRON BEAM FOCAL POSITION ADJUSTMENT METHOD

    公开(公告)号:US20210134551A1

    公开(公告)日:2021-05-06

    申请号:US17044856

    申请日:2019-08-07

    Inventor: Hokuto Iijima

    Abstract: The present invention addresses the problem of providing a device with which it is possible to adjust the focal point of an electron beam both toward a shorter focal point and toward a longer focal point after an electronic gun was fitted on a counterpart device.
    The aforementioned problem can be solved by an electron gun including a photocathode, and an anode, the electron gun furthermore comprising an intermediate electrode disposed between the photocathode and the anode, the intermediate electrode comprising an electron-beam passage hole through which an electron beam released from the photocathode passes, and the electron-beam passage hole having formed therein a drift space in which, when an electrical field is formed between the photocathode and the anode due to application of a voltage, the effect of the electrical field can be disregarded.

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