Electron gun, electron beam applicator, and method for controlling electron gun

    公开(公告)号:US12198889B2

    公开(公告)日:2025-01-14

    申请号:US17044850

    申请日:2020-05-08

    Abstract: The present disclosure addresses the problem of providing an electron gun that can directly monitor an intensity of an electron beam emitted from a photocathode using only the configuration provided to the electron gun, an electron beam applicator equipped with an electron gun, and a method for controlling an electron gun.
    The aforementioned problem can be solved by an electron gun comprising a light source, a photocathode that emits an electron beam in response to receiving light from the light source, an anode, an electron-beam-shielding member with which it is possible to shield part of the electron beam, and a measurement unit that measures the intensity of the electron beam emitted from the photocathode using a measurement electron beam shielded by the electron-beam-shielding member.

    Photocathode kit, electron gun, and electron beam applicator

    公开(公告)号:US12033827B2

    公开(公告)日:2024-07-09

    申请号:US17604368

    申请日:2020-07-31

    CPC classification number: H01J1/34 H01J37/073

    Abstract: Provided is a photocathode kit that does not require adjustment of the distance between a photocathode film and a lens focusing on the photocathode film when the photocathode and the lens are installed inside an electron gun. The photocathode kit includes: a photocathode including a substrate in which a photocathode film is formed on a first surface; a lens; and a holder that holds the substrate and the lens, and the holder has a retaining member that retains the photocathode film and the lens to be spaced apart by a predetermined distance, and a first communication path that communicates between inside of the holder and outside of the holder.

    ELECTRON GUN, ELECTRON BEAM APPLICATION DEVICE, METHOD FOR EMITTING ELECTRON USING ELECTRON GUN, AND ELECTRON BEAM FOCAL POSITION ADJUSTMENT METHOD

    公开(公告)号:US20210134551A1

    公开(公告)日:2021-05-06

    申请号:US17044856

    申请日:2019-08-07

    Inventor: Hokuto Iijima

    Abstract: The present invention addresses the problem of providing a device with which it is possible to adjust the focal point of an electron beam both toward a shorter focal point and toward a longer focal point after an electronic gun was fitted on a counterpart device.
    The aforementioned problem can be solved by an electron gun including a photocathode, and an anode, the electron gun furthermore comprising an intermediate electrode disposed between the photocathode and the anode, the intermediate electrode comprising an electron-beam passage hole through which an electron beam released from the photocathode passes, and the electron-beam passage hole having formed therein a drift space in which, when an electrical field is formed between the photocathode and the anode due to application of a voltage, the effect of the electrical field can be disregarded.

    Electron gun, electron beam applicator, method for releasing electrons using electron gun, and method for adjusting focal position of electron beam

    公开(公告)号:US11195685B2

    公开(公告)日:2021-12-07

    申请号:US17044856

    申请日:2019-08-07

    Inventor: Hokuto Iijima

    Abstract: The present invention addresses the problem of providing a device with which it is possible to adjust the focal point of an electron beam both toward a shorter focal point and toward a longer focal point after an electronic gun was fitted on a counterpart device.
    The aforementioned problem can be solved by an electron gun including a photocathode, and an anode, the electron gun furthermore comprising an intermediate electrode disposed between the photocathode and the anode, the intermediate electrode comprising an electron-beam passage hole through which an electron beam released from the photocathode passes, and the electron-beam passage hole having formed therein a drift space in which, when an electrical field is formed between the photocathode and the anode due to application of a voltage, the effect of the electrical field can be disregarded.

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