公开(公告)号：US20190189639A1

公开(公告)日：2019-06-20

申请号：US16051947

申请日：2018-08-01

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Yueping ZUO ,  Hongwei TIAN ,  Shuai ZHANG

IPC: H01L27/12 ,  H01L21/027

Abstract: A substrate and a manufacturing method thereof and a display device are provided. The substrate includes: a base including a bendable region; an interlayer on the base and in the bendable region; and a signal line at a side, facing away from the base, of the interlayer. In the bendable region, an orthographic projection of the signal line on the base is within an orthographic projection of the interlayer on the base; and in the bendable region, the interlayer is provided with a groove on at least one side of a portion, corresponding to the signal line, of the interlayer.

公开(公告)号：US20180025915A1

公开(公告)日：2018-01-25

申请号：US15546475

申请日：2016-04-07

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Yinghai MA ,  Liangjian LI ,  Yueping ZUO

IPC: H01L21/311 ,  H01J37/32 ,  H01L21/768

CPC classification number: H01L21/31116 ,  G02F1/1368 ,  G02F2202/104 ,  H01J37/3244 ,  H01J37/32871 ,  H01J2237/334 ,  H01J2237/3347 ,  H01L21/76805 ,  H01L27/1259

Abstract: A dry etching method includes performing at least two etching steps, and further includes injecting protective gas into an etch chamber for processing between any two successive etching steps, wherein the protective gas generates plasma to neutralize electrons accumulated on a side wall of an etching trench. According to the present disclosure, hydrogen plasma is added in an etching process to remove the electrons accumulated on the side wall of the etching trench so as to reduce the microetching effect in multiple etching. In this way, process stability and reliability of a display substrate are improved.