INTELLIGENT NETWORK MANAGEMENT SYSTEM

    公开(公告)号:US20220311652A1

    公开(公告)日:2022-09-29

    申请号:US17418272

    申请日:2020-12-29

    Inventor: Yang ZHANG

    Abstract: The present disclosure relates to an intelligent network management system. The intelligent network management system includes: a plurality of terminals, including at least one management terminal and at least one application terminal; and at least one server, coupled to the management terminal and the application terminal, and including a data management circuit, a service management circuit, and an application management circuit, the management terminal being configured to send a data management signal, a service management signal and an application management signal to the server, the data management circuit performing data layer management on the application terminal in response to the data management signal, the service management circuit performing service layer management on the application terminal in response to the service management signal, and the application management circuit performing application layer management on the application terminal in response to the application management signal.

    DISPLAY SUBSTRATE, METHOD FOR PREPARING THE SAME, AND DISPLAY DEVICE

    公开(公告)号:US20210313356A1

    公开(公告)日:2021-10-07

    申请号:US16761231

    申请日:2019-10-28

    Abstract: The present disclosure provides a display substrate, a method for preparing the same, and a display device including the display substrate. The method includes: forming a conductive layer; forming a first photoresist pattern and a second photoresist pattern on the conductive layer, in which the adhesion between the first photoresist pattern and the conductive layer is less than the adhesion between the second photoresist pattern and the conductive layer; and etching the conductive layer by using the first photoresist pattern and the second photoresist pattern as masks to form a first conductive pattern and a second conductive pattern, respectively, in which a line width difference between the first conductive pattern and the first photoresist pattern is greater than a line width difference between the second conductive pattern and the second photoresist pattern.

Patent Agency Ranking