公开(公告)号：US20140368568A1

公开(公告)日：2014-12-18

申请号：US14471699

申请日：2014-08-28

Applicant: FUJIFILM Corporation

Inventor： Kenichi KODAMA ,  Satoshi WAKAMATSU

IPC: B41J2/045 ,  B41J13/00

CPC classification number: B41J2/04501 ,  B41J3/407 ,  B41J13/0009 ,  B41J25/003

Abstract: According an aspect of the present invention, when causing the liquid ejection head to perform a feeding operation along a first direction, the substrate is retracted outside the projected feeding region of the liquid ejection head and the supporting member thereof prior to starting the feeding operation of the liquid ejection head, preventing dusts and other foreign matters, generated as a result of the feeding operation of the liquid ejection head and the supporting member, from being deposited on a surface of the substrate onto which the liquid is to be deposited.

Abstract translation: 根据本发明的一个方面，当使液体喷射头沿着第一方向进行进给操作时，在开始进给操作之前，将基板缩回到液体喷射头的突出进给区域和其支撑构件的外侧 液体喷射头，防止由于液体喷射头和支撑构件的进给操作而产生的灰尘等异物沉积在要沉积液体的基板的表面上。

公开(公告)号：US20140001675A1

公开(公告)日：2014-01-02

申请号：US14019622

申请日：2013-09-06

Applicant: FUJIFILM Corporation

Inventor： Kazuharu NAKAMURA ,  Satoshi WAKAMATSU

IPC: B29C59/02

CPC classification number: B29C59/022 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: In a nanoimprinting method, an assembly, of which the entire surface is directly exposable to the environment, is supported by a pressure vessel by a support member such that fluid pressure from the environment operates on the entire surface of the assembly. Gas is introduced into the pressure vessel, and fluid pressure exerted by the gas presses a mold and a substrate against each other. Thereby, pressing with uniform pressure onto a curable resin coated surface can be realized in nanoimprinting that employs a mesa type mold and/or a mesa type substrate to be processed, and the occurrence of residual film fluctuations can be suppressed.

Abstract translation: 在纳米压印方法中，整个表面直接暴露于环境的组件由压力容器由支撑构件支撑，使得来自环境的流体压力在组件的整个表面上操作。 将气体引入压力容器中，并且由气体施加的流体压力将模具和基板彼此压制。 由此，可以在使用台面型模具和/或台面型基板进行加工的纳米压印中实现均匀的压力压在可固化树脂涂覆表面上，并且可以抑制残留膜波动的发生。

公开(公告)号：US20130213930A1

公开(公告)日：2013-08-22

申请号：US13848461

申请日：2013-03-21

Applicant: FUJIFILM Corporation

Inventor： Satoshi WAKAMATSU ,  Tadashi OMATSU

IPC: B05D3/12

CPC classification number: B05D3/12 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: Droplets of resist material are coated using the ink jet method under conditions that: the viscosity of the resist material is within a range from 8 cP to 20 cP, the surface energy of the resist material is within a range from 25 mN/m to 35 mN/m, the amount of resist material in each of the droplets is within a range from 1 pl to 10 pl, and the placement intervals among the droplets are within a range from 10 μm to 1000 μm. A mold is pressed against the surface of the substrate in a He and/or a depressurized atmosphere such that: an intersection angle formed between a main scanning direction of the ink jet method and the direction of the lines of the linear pattern of protrusions and recesses, which is an intersection angle when pressing the mold against the surface of the substrate, is within a range from 30° to 90°.

Abstract translation: 在抗蚀剂材料的粘度在8cP至20cP的范围内的条件下，使用喷墨法涂覆抗蚀剂材料的液滴，抗蚀剂材料的表面能在25mN / m至35的范围内 mN / m，每个液滴中的抗蚀剂材料的量在1pl至10pl的范围内，并且液滴之间的放置间隔在10μm至1000μm的范围内。 在He和/或减压气氛中将模具压在衬底表面上，使得：在喷墨方法的主扫描方向与突出和凹陷的线状图案的线的方向之间形成的交叉角 是将模具压靠在基板的表面上时的交叉角度，在30°〜90°的范围内。