公开(公告)号：US20190196064A1

公开(公告)日：2019-06-27

申请号：US16288768

申请日：2019-02-28

Applicant: FUJIFILM Corporation

Inventor： Seigo NAKAMURA ,  Kenichi UMEDA ,  Yuichiro ITAI ,  Shinichiro SONODA

IPC: G02B1/111 ,  G02B1/113 ,  B32B15/04 ,  G02B1/18

CPC classification number: G02B1/111 ,  B32B7/02 ,  B32B9/00 ,  B32B15/04 ,  B32B27/00 ,  G02B1/113 ,  G02B1/18 ,  G02B15/20

Abstract: Provided is an antireflection film that is formed by laminating an interlayer, a silver-containing metal layer containing silver, and a dielectric layer, in this order, on a substrate, in which the interlayer is a multilayer film having two or more layers, in which a layer of high refractive index having a relatively high refractive index and a layer of low refractive index having a relatively low refractive index are alternately laminated, and the dielectric layer has a surface to be exposed to air and is a multilayer film having two or more layers including an oxide layer and a fluorocarbon layer which is a self-assembled film that is formed by a silane coupling reaction to the oxide layer in this order.

公开(公告)号：US20190170908A1

公开(公告)日：2019-06-06

申请号：US16269271

申请日：2019-02-06

Applicant: FUJIFILM Corporation

Inventor： Kenichi UMEDA ,  Seigo NAKAMURA ,  Yuichiro ITAI ,  Hideki YASUDA

IPC: G02B1/115

Abstract: An antireflection film is formed by laminating an interlayer, a silver-containing metal layer containing silver, and a dielectric layer in this order from the substrate, an anchor region including an oxide of an anchor metal is provided between the silver-containing metal layer and the interlayer, a cap region including an oxide of the anchor metal included in the anchor region is provided between the silver-containing metal layer and the dielectric layer, a crystal grain size obtained by X-ray diffraction measurement in the silver-containing metal layer is less than 6.8 nm, and the anchor metal has a surface energy less than a surface energy of silver and greater than a surface energy of a layer of the interlayer closest to the silver-containing metal layer.

公开(公告)号：US20180366590A1

公开(公告)日：2018-12-20

申请号：US16114610

申请日：2018-08-28

Applicant: FUJIFILM Corporation

Inventor： Seigo NAKAMURA ,  Yoshiki MAEHARA ,  Yuichiro ITAI ,  Yoshihisa USAMI

IPC: H01L29/786 ,  H01L51/05

Abstract: Provided is a method of manufacturing a film, including: a manufacturing step of forming a film by performing movement, in a state in which a blade surface of a coating blade disposed to be spaced so as to face a substrate surface of a substrate is in contact with a solution for forming a film which is provided between the blade surface and the substrate surface, in a first direction in a plane parallel to the substrate surface, in which the solution is stored in a liquid reservoir between the blade surface and the substrate surface, and at least a portion of an outer peripheral end portion of the coating blade which is in contact with the solution is tilted with respect to the first direction in a plane parallel to the substrate surface. Accordingly, a method of manufacturing a film for forming a high quality film with high productivity is provided.