公开(公告)号：US20200041909A1

公开(公告)日：2020-02-06

申请号：US16598042

申请日：2019-10-10

Applicant: Gigaphoton Inc.

Inventor： Atsushi UEDA

IPC: G03F7/20 ,  H01L21/3065 ,  G03F1/24 ,  H05G2/00

Abstract: An extreme ultraviolet light generation device includes: a chamber (2) having inside a plasma generating region (22) in which plasma is generated from a droplet of a target substance; an EUV light focusing mirror (23) having a reflection surface (23A) that reflects EUV light generated by the droplet being turned into the plasma in the plasma generating region; a magnetic field generation unit configured to generate a magnetic field ML for converging, toward a wall of the chamber, a charged particle generated by the droplet being turned into the plasma; and an etching gas supply unit (32) configured to supply etching gas along the reflection surface from an outer periphery of the EUV light focusing mirror, the etching gas supply unit being configured such that flow speed of etching gas supplied from one side of a plane S is higher than flow speed of etching gas supplied from the other side.

公开(公告)号：US20180224748A1

公开(公告)日：2018-08-09

申请号：US15945672

申请日：2018-04-04

Applicant: GIGAPHOTON INC.

Inventor： Shinji NAGAI ,  Atsushi UEDA ,  Takashi SAITO

IPC: G03F7/20 ,  H05G2/00 ,  H01J37/32 ,  G21K1/06

CPC classification number: G03F7/70033 ,  G21K1/06 ,  G21K5/02 ,  H01J37/3244 ,  H05G1/00 ,  H05G2/008

Abstract: An extreme ultraviolet light generating device may include a chamber, an EUV light focusing mirror provided therein, including a reflection surface having a concave curved shape and an outer peripheral portion around an outer edge of the reflection surface, and configured to focus EUV light radiated from plasma generated when a target is irradiated with laser light, a gas supplying device including peripheral heads provided on or along the outer peripheral portion; and a discharge device including a discharge path forming a discharge port near the outer peripheral portion, and configured to discharge an ion or a particle from the discharge port. The peripheral heads each may blow out a gas flow from the outer peripheral portion or a vicinity thereof along the reflection surface, and allow gas flows to join on the reflection surface to thereby form a gas flow along the reflection surface toward the discharge port.