公开(公告)号：US20160377986A1

公开(公告)日：2016-12-29

申请号：US15260625

申请日：2016-09-09

Applicant: Gigaphoton Inc.

Inventor： Yutaka SHIRAISHI ,  Hideki SHISHIBA

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  H01L21/027 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A target supply device may include a tank for storing a target material, a nozzle which is connected to the tank and outputs the target material, and a gas supply section for supplying the tank with gas. The gas supply section may include a booster which is connected to a gas line, boosts the gas supplied from the gas line, and outputs the boosted gas to the tank, a pressure sensor for measuring the pressure inside the tank, and a pressure controller which adjusts the pressure of the gas to be supplied to the tank on the basis of a measurement result from the pressure sensor.

Abstract translation: 目标供给装置可以包括用于存储目标材料的罐，连接到罐并输出目标材料的喷嘴，以及用于向罐供应气体的气体供应部。 气体供给部可以包括与气体管线连接的升压器，对从气体管线供给的气体进行升压，并将升压气体输出到水箱，用于测量罐内的压力的压力传感器和压力控制器， 基于来自压力传感器的测量结果来调节供给到罐的气体的压力。

公开(公告)号：US20160192470A1

公开(公告)日：2016-06-30

申请号：US15062896

申请日：2016-03-07

Applicant: Gigaphoton Inc.

Inventor： Fumio IWAMOTO ,  Yutaka SHIRAISHI ,  Tsukasa HORI ,  Takuya ISHII

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70908 ,  H05G2/005

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of greater than 90 degrees with the target.

Abstract translation: 极紫外光发生装置可以包括：当在室内的激光束照射靶时在其中产生极紫外光的室; 目标供给部构造成将所述目标物供给到所述室内; 以及目标集电器，其被配置为将目标供给部提供但不被激光束照射的目标物收集在收集容器中，通过在具有大于90度的接触角的接收表面上接收目标， 。

公开(公告)号：US20130221587A1

公开(公告)日：2013-08-29

申请号：US13770939

申请日：2013-02-19

Applicant: GIGAPHOTON INC.

Inventor： Yutaka SHIRAISHI ,  Osamu WAKABAYASHI

IPC: C22B9/00

CPC classification number: C22B9/00 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A target material refinement device may include a refinement tank to accommodate a target material, a heating section to heat the interior of the refinement tank, and an oxygen-atom removing section to remove oxygen atoms present in the target material.

Abstract translation: 目标材料细化装置可以包括用于容纳目标材料的精制罐，用于加热精制罐内部的加热部分和氧原子去除部分以除去存在于目标材料中的氧原子。