Stable, concentratable, water soluble cellulose free chemical mechanical polishing composition
    22.
    发明授权
    Stable, concentratable, water soluble cellulose free chemical mechanical polishing composition 有权
    稳定,浓缩,水溶性纤维素自由化学机械抛光组合物

    公开(公告)号:US08440097B2

    公开(公告)日:2013-05-14

    申请号:US13039705

    申请日:2011-03-03

    IPC分类号: C09K13/00

    CPC分类号: H01L21/3212 C09G1/16

    摘要: A chemical mechanical polishing composition useful for chemical mechanical polishing a semiconductor wafer containing an interconnect metal is provided, comprising, as initial components: water; an azole inhibitor; an alkali metal organic surfactant; a hydrotrope; a phosphorus containing agent; optionally, a non-saccharide water soluble polymer; optionally, a water soluble acid compound of formula I, wherein R is selected from a hydrogen and a C1-5 alkyl group, and wherein x is 1 or 2; optionally, a complexing agent; optionally, an oxidizer; optionally, an organic solvent; and, optionally, an abrasive. Also, provided is a method for making a chemical mechanical polishing composition of the present invention and a method for chemical mechanical polishing of a substrate, comprising: providing a substrate, wherein the substrate is a semiconductor wafer having copper interconnects; providing a chemical mechanical polishing composition of the present invention; providing a chemical mechanical polishing pad; creating dynamic contact at an interface between the chemical mechanical polishing pad and the substrate with a down force of 0.69 to 34.5 kPa; and, dispensing the chemical mechanical polishing composition onto the chemical mechanical polishing pad at or near the interface between the chemical mechanical polishing pad and the substrate; wherein the chemical mechanical polishing composition exhibits a pH adjusted to a pH of 2 to 6 through the addition of at least one of phosphoric acid, magnesium hydroxide and lithium hydroxide.

    摘要翻译: 提供了用于化学机械抛光含有互连金属的半导体晶片的化学机械抛光组合物,包括作为初始组分的水; 唑类抑制剂; 碱金属有机表面活性剂; 水溶助长剂 含磷剂; 任选地,非糖水溶性聚合物; 任选地,式I的水溶性酸化合物,其中R选自氢和C 1-5烷基,并且其中x是1或2; 任选地,络合剂; 任选的氧化剂; 任选的有机溶剂; 和任选的研磨剂。 此外,提供了制造本发明的化学机械抛光组合物的方法和基板的化学机械抛光方法,包括:提供基板,其中所述基板是具有铜互连的半导体晶片; 提供本发明的化学机械抛光组合物; 提供化学机械抛光垫; 在化学机械抛光垫和基板之间的界面处以0.69至34.5kPa的向下力产生动态接触; 并且将化学机械抛光组合物分配到化学机械抛光垫或化学机械抛光垫与基底之间界面附近的化学机械抛光垫上; 其中所述化学机械抛光组合物通过加入磷酸,氢氧化镁和氢氧化锂中的至少一种而显示pH调节至2至6的pH。

    Thermally-stable dielectric fluid
    24.
    发明授权
    Thermally-stable dielectric fluid 有权
    热稳定介质流体

    公开(公告)号:US08753549B2

    公开(公告)日:2014-06-17

    申请号:US13814571

    申请日:2011-09-15

    IPC分类号: C09K5/00

    摘要: The disclosure is directed to a thermally-stable dielectric fluid. The dielectric fluid includes (a) an oil, (b) a substituted, hindered phenolic antioxidant having at least two substituted cresol groups being covalently bonded to each other through a methylene bridge, and (c) a substituted, diphenyl amine antioxidant having at least two substituted phenyl groups being covalently bonded to each other through an amine bridge.

    摘要翻译: 本公开涉及一种热稳定介电流体。 介电流体包括(a)油,(b)具有至少两个取代的甲酚基团的取代的受阻酚类抗氧化剂,其通过亚甲基桥彼此共价键合,和(c)至少具有取代的二苯胺抗氧化剂 两个取代的苯基通过胺桥彼此共价键合。

    Polymerizing ethylene-ionic comonomer using inverse micellar process
    28.
    发明授权
    Polymerizing ethylene-ionic comonomer using inverse micellar process 失效
    使用反胶束法聚合乙烯 - 离子共聚单体

    公开(公告)号:US5241028A

    公开(公告)日:1993-08-31

    申请号:US891497

    申请日:1992-05-29

    IPC分类号: C08F2/04 C08F8/44

    CPC分类号: C08F8/44

    摘要: Nonrandom ionomers of ethylene and an ionic functional comonomer, such as zinc-2-ethylhexylmaleate, are prepared in a one-step, inverse micellar copolymerization process comprising contacting under copolymerization conditions ethylene and the comonomer in a manner such that the comonomer forms an inverse micelle within the ethylene. The comonomer is at least 20% neutralized, preferably 100% neutralized. The ionomers of this invention exhibit properties similar to nonrandom ionomers made by the traditional two-step process of copolymerizing ethylene and an alpha,beta-ethylenically unsaturated carboxylic acid, and then neutralizing the product with metal ions.

    摘要翻译: 乙烯和离子官能共聚单体的非随机离聚物如马来酸2-乙基己基酯是在一步反胶束共聚方法中制备的,包括在共聚合条件下使乙烯和共聚单体以共聚单体形成反胶束 在乙烯内。 共聚单体至少20%中和,优选100%中和。 本发明的离聚物具有类似于通过使乙烯和α,β-烯属不饱和羧酸共聚的传统两步法制备的非随机离聚物的性质,然后用​​金属离子中和产物。

    ACIDIC MICROEMULSION STRIPPING FORMULATIONS
    30.
    发明申请
    ACIDIC MICROEMULSION STRIPPING FORMULATIONS 审中-公开
    酸性微乳液剥离配方

    公开(公告)号:US20130274165A1

    公开(公告)日:2013-10-17

    申请号:US13988618

    申请日:2011-12-12

    IPC分类号: C09D9/04

    CPC分类号: C09D9/04 C09D9/005

    摘要: Described are stripper compositions, comprising an acidic microemulsion, said microemulsion comprising C1-4 carboxylic acid, a poorly water soluble solvent, a salt, a surfactant, and water, wherein the stripper composition comprises less than 40% of methyl benzoate, cyclic ketone, or a mixture thereof, and wherein the stripper composition is capable of removing a removable coating.

    摘要翻译: 描述的是汽提组合物,其包含酸性微乳液,所述微乳液包含C 1-4羧酸,水难溶性溶剂,盐,表面活性剂和水,其中汽提组合物包含小于40%的苯甲酸甲酯,环酮, 或其混合物,并且其中所述汽提组合物能够除去可除去的涂层。