公开(公告)号：US08753549B2

公开(公告)日：2014-06-17

申请号：US13814571

申请日：2011-09-15

申请人： Suh Joon Han ,  Dale C. Schmidt ,  Christopher J. Tucker

发明人： Suh Joon Han ,  Dale C. Schmidt ,  Christopher J. Tucker

IPC分类号： C09K5/00

CPC分类号： H01B3/20 ,  C08K5/13 ,  C08K5/18 ,  Y10T29/49002

摘要： The disclosure is directed to a thermally-stable dielectric fluid. The dielectric fluid includes (a) an oil, (b) a substituted, hindered phenolic antioxidant having at least two substituted cresol groups being covalently bonded to each other through a methylene bridge, and (c) a substituted, diphenyl amine antioxidant having at least two substituted phenyl groups being covalently bonded to each other through an amine bridge.

摘要翻译： 本公开涉及一种热稳定介电流体。 介电流体包括（a）油，（b）具有至少两个取代的甲酚基团的取代的受阻酚类抗氧化剂，其通过亚甲基桥彼此共价键合，和（c）至少具有取代的二苯胺抗氧化剂 两个取代的苯基通过胺桥彼此共价键合。

公开(公告)号：US20130163203A1

公开(公告)日：2013-06-27

申请号：US13814571

申请日：2011-09-15

申请人： Suh Joon Han ,  Dale C. Schmidt ,  Christopher J. Tucker

发明人： Suh Joon Han ,  Dale C. Schmidt ,  Christopher J. Tucker

IPC分类号： H05K7/20 ,  H01B3/20

CPC分类号： H01B3/20 ,  C08K5/13 ,  C08K5/18 ,  Y10T29/49002

摘要： The disclosure is directed to a thermally-stable dielectric fluid. The dielectric fluid includes (a) an oil, (b) a substituted, hindered phenolic antioxidant having at least two substituted cresol groups being covalently bonded to each other through a methylene bridge, and (c) a substituted, diphenyl amine antioxidant having at least two substituted phenyl groups being covalently bonded to each other through an amine bridge.

摘要翻译： 本公开涉及一种热稳定介电流体。 介电流体包括（a）油，（b）具有至少两个取代的甲酚基团的取代的受阻酚类抗氧化剂，其通过亚甲基桥彼此共价键合，和（c）至少具有取代的二苯胺抗氧化剂 两个取代的苯基通过胺桥彼此共价键合。

公开(公告)号：US09061027B2

公开(公告)日：2015-06-23

申请号：US11660012

申请日：2005-08-26

申请人： James E. Hitt ,  True L. Rogers ,  Ian B. Gillespie ,  Brian D. Scherzer ,  Paula C. Garcia ,  Nicholas S. Beck ,  Christopher J. Tucker ,  Timothy J. Young ,  David A. Hayes ,  Robert O. Williams, III ,  Keith P. Johnston ,  Jason T. McConville ,  Jay I. Peters ,  Robert Talbert ,  David Burgess

发明人： James E. Hitt ,  True L. Rogers ,  Ian B. Gillespie ,  Brian D. Scherzer ,  Paula C. Garcia ,  Nicholas S. Beck ,  Christopher J. Tucker ,  Timothy J. Young ,  David A. Hayes ,  Robert O. Williams, III ,  Keith P. Johnston ,  Jason T. McConville ,  Jay I. Peters ,  Robert Talbert ,  David Burgess

IPC分类号： A61K31/496 ,  A61K9/16 ,  A61K9/00

CPC分类号： A61K31/496 ,  A61K9/0073 ,  A61K9/008 ,  A61K9/19

摘要： Inhalable compositions are described. The inhalable compositions comprise one or more respirable aggregates, the respirable aggregates comprising one or more poorly water soluble active agents, wherein at least one of the active agents reaches a maximum lung concentration (Cmax) of at least about 0.25 μg/gram of lung tissue and remains at such concentration for a period of at least one hour after being delivered to the lung. Methods for making such compositions and methods for using such compositions are also disclosed.

摘要翻译： 描述了可吸入组合物。 可吸入组合物包含一种或多种可呼吸聚集体，可呼吸聚集体包含一种或多种难溶于水的活性剂，其中至少一种活性剂达到至少约0.25μg/ g肺组织的最大肺浓度（C max） 并在输送至肺后保持至少1小时的浓度。 还公开了制备这种组合物的方法和使用这些组合物的方法。

公开(公告)号：US20130101531A1

公开(公告)日：2013-04-25

申请号：US13688668

申请日：2012-11-29

申请人： Reed A. Shick ,  Christopher J. Tucker ,  Christian Piechocki ,  Letha A. Gatz

发明人： Reed A. Shick ,  Christopher J. Tucker ,  Christian Piechocki ,  Letha A. Gatz

IPC分类号： A61K8/06 ,  A61Q13/00 ,  A61Q17/00

CPC分类号： A61K8/068 ,  A61K8/345 ,  A61Q13/00 ,  A61Q17/00 ,  C11D3/2044 ,  C11D3/50 ,  C11D17/0021

摘要： The present invention relates to an ethanol-free, non-fatty, non-sticky perfumed aqueous cosmetic microemulsion composition, including one or more fragrance materials, a solvent, an aqueous medium, and optionally, one or more surfactants; wherein the solvent in the microemulsion is a vicinal diol such as 1,2-hexanediol.

摘要翻译： 本发明涉及无乙醇，非脂肪，非粘性的加香水性化妆品微乳液组合物，包括一种或多种香料，溶剂，水性介质和任选的一种或多种表面活性剂; 其中微乳液中的溶剂是邻二醇如1,2-己二醇。

公开(公告)号：US20120225556A1

公开(公告)日：2012-09-06

申请号：US13039705

申请日：2011-03-03

申请人： Hamed Lakrout ,  Jinjie Shi ,  Joseph Letizia ,  Xu Li ,  Thomas H. Kalantar ,  Francis Kelley ,  J. Keith Harris ,  Christopher J. Tucker

发明人： Hamed Lakrout ,  Jinjie Shi ,  Joseph Letizia ,  Xu Li ,  Thomas H. Kalantar ,  Francis Kelley ,  J. Keith Harris ,  Christopher J. Tucker

IPC分类号： H01L21/306 ,  C09K3/14 ,  C09K13/00

CPC分类号： H01L21/3212 ,  C09G1/16

摘要： A chemical mechanical polishing composition useful for chemical mechanical polishing a semiconductor wafer containing an interconnect metal is provided, comprising, as initial components: water; an azole inhibitor; an alkali metal organic surfactant; a hydrotrope; a phosphorus containing agent; optionally, a non-saccharide water soluble polymer; optionally, a water soluble acid compound of formula I, wherein R is selected from a hydrogen and a C1-5 alkyl group, and wherein x is 1 or 2; optionally, a complexing agent; optionally, an oxidizer; optionally, an organic solvent; and, optionally, an abrasive. Also, provided is a method for making a chemical mechanical polishing composition of the present invention and a method for chemical mechanical polishing of a substrate, comprising: providing a substrate, wherein the substrate is a semiconductor wafer having copper interconnects; providing a chemical mechanical polishing composition of the present invention; providing a chemical mechanical polishing pad; creating dynamic contact at an interface between the chemical mechanical polishing pad and the substrate with a down force of 0.69 to 34.5 kPa; and, dispensing the chemical mechanical polishing composition onto the chemical mechanical polishing pad at or near the interface between the chemical mechanical polishing pad and the substrate; wherein the chemical mechanical polishing composition exhibits a pH adjusted to a pH of 2 to 6 through the addition of at least one of phosphoric acid, magnesium hydroxide and lithium hydroxide.

摘要翻译： 提供了用于化学机械抛光含有互连金属的半导体晶片的化学机械抛光组合物，包括作为初始组分的水; 唑类抑制剂; 碱金属有机表面活性剂; 水溶助长剂 含磷剂; 任选地，非糖水溶性聚合物; 任选地，式I的水溶性酸化合物，其中R选自氢和C 1-5烷基，并且其中x是1或2; 任选地，络合剂; 任选地，氧化剂; 任选的有机溶剂; 和任选的研磨剂。 此外，提供了制造本发明的化学机械抛光组合物的方法和基板的化学机械抛光方法，包括：提供基板，其中所述基板是具有铜互连的半导体晶片; 提供本发明的化学机械抛光组合物; 提供化学机械抛光垫; 在化学机械抛光垫和基板之间的界面处以0.69至34.5kPa的向下力产生动态接触; 并且将化学机械抛光组合物分配到化学机械抛光垫或化学机械抛光垫与基底之间界面附近的化学机械抛光垫上; 其中所述化学机械抛光组合物通过加入磷酸，氢氧化镁和氢氧化锂中的至少一种而显示pH调节至2至6的pH。

公开(公告)号：US20120225555A1

公开(公告)日：2012-09-06

申请号：US13039723

申请日：2011-03-03

申请人： Hamed Lakrout ,  Jinjie Shi ,  Joseph Letizia ,  Xu Li ,  Thomas H. Kalantar ,  Francis Kelley ,  J. Keith Harris ,  Christopher J. Tucker

发明人： Hamed Lakrout ,  Jinjie Shi ,  Joseph Letizia ,  Xu Li ,  Thomas H. Kalantar ,  Francis Kelley ,  J. Keith Harris ,  Christopher J. Tucker

IPC分类号： H01L21/306 ,  C09K13/00

CPC分类号： H01L21/3212 ,  C09G1/16

摘要： A chemical mechanical polishing composition useful for chemical mechanical polishing a semiconductor wafer containing an interconnect metal is provided, comprising, as initial components: water; an azole inhibitor; an alkali metal organic surfactant; a hydrotrope; a phosphorus containing agent; a water soluble cellulose; optionally, a non-saccharide water soluble polymer; optionally, a water soluble acid compound of formula I, wherein R is selected from a hydrogen and a C1-5 alkyl group, and wherein x is 1 or 2; optionally, a complexing agent; optionally, an oxidizer; optionally, an organic solvent; and, optionally, an abrasive. Also, provided is a method of preparing a chemical mechanical polishing composition of the present invention and a method for chemical mechanical polishing of a substrate, comprising: providing a substrate, wherein the substrate is a semiconductor wafer having copper interconnects; providing a chemical mechanical polishing composition of the present invention; providing a chemical mechanical polishing pad; creating dynamic contact at an interface between the chemical mechanical polishing pad and the substrate with a down force of 0.69 to 34.5 kPa; and, dispensing the chemical mechanical polishing composition onto the chemical mechanical polishing pad at or near the interface between the chemical mechanical polishing pad and the substrate; wherein the chemical mechanical polishing composition exhibits a pH adjusted to a pH of 2 to 6 through the addition of at least one of phosphoric acid, magnesium hydroxide and lithium hydroxide.

摘要翻译： 提供了用于化学机械抛光含有互连金属的半导体晶片的化学机械抛光组合物，包括作为初始组分的水; 唑类抑制剂; 碱金属有机表面活性剂; 水溶助长剂 含磷剂; 水溶性纤维素; 任选地，非糖水溶性聚合物; 任选地，式I的水溶性酸化合物，其中R选自氢和C 1-5烷基，并且其中x是1或2; 任选地，络合剂; 任选地，氧化剂; 任选的有机溶剂; 和任选的研磨剂。 此外，提供了制备本发明的化学机械抛光组合物的方法和基材的化学机械抛光方法，包括：提供基材，其中所述基材是具有铜互连的半导体晶片; 提供本发明的化学机械抛光组合物; 提供化学机械抛光垫; 在化学机械抛光垫和基板之间的界面处以0.69至34.5kPa的向下力产生动态接触; 并且将化学机械抛光组合物分配到化学机械抛光垫或化学机械抛光垫与基底之间界面附近的化学机械抛光垫上; 其中所述化学机械抛光组合物通过加入磷酸，氢氧化镁和氢氧化锂中的至少一种而显示pH调节至2至6的pH。

公开(公告)号：US06835783B1

公开(公告)日：2004-12-28

申请号：US09913621

申请日：2001-08-15

申请人： Herbert A. Gartner ,  Steven W. Mork ,  Heike Herr ,  Reed A. Shick ,  John Klier ,  Christopher J. Tucker

发明人： Herbert A. Gartner ,  Steven W. Mork ,  Heike Herr ,  Reed A. Shick ,  John Klier ,  Christopher J. Tucker

IPC分类号： A61L1524

CPC分类号： C08F2/32 ,  A61L15/60 ,  C08L33/02

摘要： The present invention refers to a high internal phase polyclectrolyte emulsions which are useful for the manufacture of superabsorbent polymers having two phases: i) a continuous oil phase and the ii) a dispersed aqueous phase containing the aqueous monomer solution prior to polymerization and the polyelectrolyte in water-soluble, or water-swellable or very slightly crosslinked form after polymerization, wherein the polymerization occurs in the dispersed aqueous phase and wherein the dispersed aqueous phase contains a high concentration of polyclectrolyte. The present invention also refers to a process for preparing such emulsions and for inverting these emulsions so as to form films or other patterns of the superabsorbent polymer. Absorbent structures containing SAP films or other patterns prepared by the present invention are also contemplated.

摘要翻译： 本发明涉及一种高内相聚电解质乳液，其可用于制造具有两相的超吸收聚合物：i）连续油相和ii）在聚合之前含有单体水溶液的分散水相和聚合电解质 水溶性或水溶胀性或非常轻微交联的形式，其中聚合发生在分散的水相中，并且其中分散的水相含有高浓度的聚电解质。 本发明还涉及一种制备这种乳液并反转这些乳液以形成超吸收性聚合物的膜或其它图案的方法。 也考虑了含有SAP薄膜或本发明制备的其它图案的吸收结构。

公开(公告)号：US06759550B1

公开(公告)日：2004-07-06

申请号：US10149554

申请日：2002-11-13

申请人： John Klier ,  Christopher J. Tucker ,  Thomas H. Kalantar ,  Kenneth A. Burdett ,  Daniel Patrick Green ,  Luciano Piras ,  Sergio Schena ,  Guo-shuh John Lee

发明人： John Klier ,  Christopher J. Tucker ,  Thomas H. Kalantar ,  Kenneth A. Burdett ,  Daniel Patrick Green ,  Luciano Piras ,  Sergio Schena ,  Guo-shuh John Lee

IPC分类号： C07C5116

CPC分类号： C07C51/265 ,  C07C63/33 ,  C07C65/24 ,  C07C65/21 ,  C07C63/06 ,  C07C53/10

摘要： The present invention pertains to an improved method of oxidizing substituted aromatic compounds (such as p xylene) to their corresponding aromatic acids (such as terephthalic acid). The improvement involves carrying out the oxidation reaction in an aqueous medium, wherein the aqueous medium contains at least 30 percent water, preferably up to 30 percent surfactant and preferably a low molecular weight material containing a hydrophilic end group as a co-surfactant. The reaction is carried out at a pH of less than 3.0.

摘要翻译： 本发明涉及将取代的芳族化合物（例如对二甲苯）氧化成其相应的芳族酸（例如对苯二甲酸）的改进方法。 改进包括在水性介质中进行氧化反应，其中水性介质含有至少30％的水，优选至多30％的表面活性剂，优选含有亲水端基作为辅助表面活性剂的低分子量材料。 该反应在小于3.0的pH下进行。

公开(公告)号：US06750966B2

公开(公告)日：2004-06-15

申请号：US10214297

申请日：2002-08-06

申请人： Christopher J. Tucker

发明人： Christopher J. Tucker

IPC分类号： G01N2100

CPC分类号： G01N33/15 ,  G01N15/0205 ,  G01N21/51 ,  G01N2013/006 ,  G01N2015/0693

摘要： A method for determining the percent of a solid material dissolved into a liquid medium is disclosed. The method comprises the steps of combining the solid material and the liquid medium; determining the initial solid concentration (i); determining the dynamic solid concentration (d) using a light scattering technique; and calculating the percent dissolved material according to the formula: [(i−d)/i]×100. Methods for determining dissolution rate and particle size using turbidity measurements are also disclosed.

摘要翻译： 公开了一种测定溶解在液体介质中的固体材料的百分比的方法。 该方法包括将固体材料与液体介质结合的步骤; 确定初始固体浓度（i）; 使用光散射技术确定动态固体浓度（d）; 并根据以下公式计算溶解的百分数：[（i-d）/ i]×100。 还公开了使用浊度测量来确定溶解速率和粒径的方法。

公开(公告)号：US6051742A

公开(公告)日：2000-04-18

申请号：US211284

申请日：1998-12-14

申请人： Daniel P. Green ,  John Klier ,  Christopher J. Tucker ,  Michael S. Ferritto

发明人： Daniel P. Green ,  John Klier ,  Christopher J. Tucker ,  Michael S. Ferritto

IPC分类号： C07D301/24 ,  C07C29/66 ,  C07C31/36 ,  C07D303/04

CPC分类号： C07C29/66

摘要： A process for hypochlorinating unsaturated alpha-olefins to produce chlorohydrins which comprises forming a microemulsion of water and an unsaturated alpha-olefin and then adding an oxidant to the microemulsion under conditions sufficient to form the chlorohydrins. The microemulsion is formed by adding a non-nucleophilic surfactant and, optionally, a co-surfactant, to the mixture of water and unsaturated alpha-olefin.

摘要翻译： 一种用于低级不饱和α-烯烃以生产氯代醇的方法，其包括形成水和不饱和α-烯烃的微乳液，然后在足以形成氯代醇的条件下向微乳液中加入氧化剂。 通过向水和不饱和α-烯烃的混合物中加入非亲核表面活性剂和任选的助表面活性剂形成微乳液。