SPACER-INTEGRATED DIAPHRAGM FOR CONDENSER MICROPHONE
    21.
    发明申请
    SPACER-INTEGRATED DIAPHRAGM FOR CONDENSER MICROPHONE 审中-公开
    冷凝器麦克风的间隔式膜片

    公开(公告)号:US20110182448A1

    公开(公告)日:2011-07-28

    申请号:US12993315

    申请日:2009-05-13

    CPC classification number: H04R7/06 H04R19/04

    Abstract: The present invention relates to a spacer-integrated diaphragm, in which spacers are integrated with the diaphragm, in order to reduce the number of components and manufacturing processes needed and remove parasitic capacitance. A characterizing feature of the spacer-integrated diaphragm of the present invention is that it has an integrated structure comprising a diaphragm of a flat conductive film, and thermally insulative spacers formed so as to protrude on peripheral portions of the diaphragm through a PSR (Photo Solder Resist) printing process. The spacers are formed with a plurality of holes to remove parasitic capacitance, the diaphragm has a rectangular flat shape with round edges, and the spacers are formed near the four edges of the rectangular flat shape. In the spacer-integrated diaphragm of the present invention, because the spacers are formed of a PSR (Photo Solder Resist) material and are also formed with a plurality of holes, the present invention can prevent unnecessary parasitic capacitance from occurring and improve sound quality, and, because the diaphragm and the spacers are integrally formed, the present invention can reduce the number of processes needed when a condenser microphone is assembled and reduce the number of components required, thereby reducing manufacturing costs.

    Abstract translation: 本发明涉及一种间隔件集成隔膜,其中间隔件与隔膜结合在一起,以减少所需的部件数量和制造工艺,并消除寄生电容。 本发明的隔离件一体式隔膜的特征在于其具有包括平面导电膜的隔膜的整体结构和通过PSR(Photo Solder)在隔膜的周边部分上突出形成的隔热隔离物 抗拒)印刷工艺。 间隔件形成有多个孔以去除寄生电容,隔膜具有圆形边缘的矩形平面形状,并且间隔件形成在矩形平面形状的四个边缘附近。 在本发明的间隔物一体化隔膜中,由于间隔物由PSR(Photo Solder Resist)材料形成,并且还形成有多个孔,因此本发明可以防止发生不必要的寄生电容并提高声音质量, 并且由于隔膜和间隔件是整体形成的,所以本发明可以减少组装电容麦克风所需的处理次数,并减少所需部件的数量,从而降低制造成本。

    DUAL ROLL BLIND SYSTEM
    24.
    发明申请
    DUAL ROLL BLIND SYSTEM 失效
    双辊系统

    公开(公告)号:US20090283224A1

    公开(公告)日:2009-11-19

    申请号:US12306358

    申请日:2007-07-03

    Applicant: Jung-Min Kim

    Inventor: Jung-Min Kim

    Abstract: A dual roll blind system is able to adjust a light shading degree and comprises a winding roll which includes a roll casing rotatably supported between both side plates of a ceiling bracket; a driving winding roll which includes a moving member disposed between both side plates in parallel with the winding roll and is thread-engaged with a screw shaft rotating by means of a blind winding device of one side, a straight moving member which is provided for left and right straight movements by restricting the rotation of the moving member, and a roll casing engaged with the moving member and the straight moving member; a first blind raw material of which upper end is fixed at the winding roll and in which a light transmission part and a light non-transmission part having constant widths are alternately formed in a width wise direction; a second blind raw material of which upper end is fixed at the driving winding roll and which has a light transmission part and a light non-transmission part corresponding to the first blind raw material and is movable left and right; and a counter weight bar which fixes a lower end of the first blind raw material with a lower end of the second blind raw material being slidably inserted into the counter weight bar in a parallel direction.

    Abstract translation: 双卷帘系统能够调节遮光度,并且包括卷绕辊,该卷绕辊包括可旋转地支撑在天花板托架的两个侧板之间的辊壳体; 驱动卷绕辊,其包括设置在与卷绕辊平行的两个侧板之间的移动部件,并且与通过一侧的盲卷绕装置旋转的螺杆轴线接合,向左侧设置的直动部件 通过限制移动构件的旋转和与移动构件和直线移动构件接合的辊壳体的右侧直线运动; 第一盲原料,其上端固定在卷绕辊上,其中透光部分和具有恒定宽度的光非透射部分沿宽度方向交替形成; 第二盲原料,其上端固定在驱动卷绕辊上,并且具有光透射部分和与第一盲原材料对应的光非透射部分,并且可左右移动; 以及配重杆,其固定所述第一盲原材料的下端,所述第二盲原料的下端在平行方向上可滑动地插入所述配重杆。

    Apparatus and method for drying semiconductor wafers using IPA vapor drying method
    26.
    发明授权
    Apparatus and method for drying semiconductor wafers using IPA vapor drying method 有权
    使用IPA蒸气干燥法干燥半导体晶片的装置和方法

    公开(公告)号:US07131217B2

    公开(公告)日:2006-11-07

    申请号:US10384745

    申请日:2003-03-11

    CPC classification number: H01L21/67057 H01L21/67034 Y10S134/902

    Abstract: An apparatus for drying semiconductor wafers includes a bath for receiving semiconductor wafers and for holding a fluid, a chamber for providing an area where vapor is flowable over the bath, a supply pipeline for supplying vapor to the chamber, a vapor discharging pipeline for expunging vapor in the chamber, a fluid discharging pipeline for draining fluid in the chamber therefrom, and a protector for maintaining a distance between the semiconductor wafers during a drying process.

    Abstract translation: 用于干燥半导体晶片的装置包括用于接收半导体晶片并用于保持流体的槽,用于提供蒸气可以在浴上流动的区域的腔室,用于向腔室供应蒸气的供应管线,用于清除蒸气的蒸汽排放管道 在腔室中,用于排出腔室中的流体的流体排放管道,以及用于在干燥过程中保持半导体晶片之间的距离的保护器。

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