公开(公告)号：US20060002604A1

公开(公告)日：2006-01-05

申请号：US11119944

申请日：2005-05-03

申请人： Kaoru Sakai ,  Shunji Maeda ,  Hidetoshi Nishiyama

发明人： Kaoru Sakai ,  Shunji Maeda ,  Hidetoshi Nishiyama

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： According to the present invention, for a pattern inspection apparatus that compares images in corresponding areas of two patterns that are identical and that determines an unmatched portion between the images is a defect, a plurality of detection systems and a plurality of corresponding image comparison methods are provided. With this configuration, the affect of uneven brightnesses for a pattern that occurs due to differences in film thicknesses can be reduced, a highly sensitive pattern inspection can be performed, a variety of defects can be revealed, and the pattern inspection apparatus can be applied for processing performed within a wide range. Furthermore, the pattern inspection apparatus also includes a unit for converting the tone of image signals of comparison images for a plurality of different processing units, and when a difference in brightness occurs in the same pattern of the images, a defect can be correctly detected.

公开(公告)号：US20120002860A1

公开(公告)日：2012-01-05

申请号：US12960578

申请日：2010-12-06

申请人： Kaoru SAKAI ,  Shunji Maeda ,  Hisae Shibuya ,  Hidetoshi Nishiyama

发明人： Kaoru SAKAI ,  Shunji Maeda ,  Hisae Shibuya ,  Hidetoshi Nishiyama

IPC分类号： G06K9/00

CPC分类号： G06T7/0004 ,  G06T7/001 ,  G06T2207/30148

摘要： In a pattern inspection apparatus, influences of pattern brightness variations that is caused in association with, for example, a film thickness difference or a pattern width variation can be reduced, high sensitive pattern inspection can be implemented, and a variety of defects can be detected. Thereby, the pattern inspection apparatus adaptable to a broad range of processing steps is realized. In order to realize this, the pattern inspection apparatus of the present invention performs comparison between images of regions corresponding to patterns formed to be same patterns, thereby determining mismatch portions across the images to be defects. The apparatus includes multiple sensors capable of synchronously acquiring images of shiftable multiple detection systems different from one another, and an image comparator section corresponding thereto. In addition, the apparatus includes means of detecting a statistical offset value from the feature amount to be a defect, thereby enabling the defect to be properly detected even when a brightness difference is occurring in association with film a thickness difference in a wafer.

摘要翻译： 在图案检查装置中，可以减少与膜厚差或图案宽度变化相关联引起的图案亮度变化的影响，可以实现高灵敏度图案检查，并且可以检测各种缺陷 。 由此，可以实现适应于广泛的处理步骤的图案检查装置。 为了实现这一点，本发明的图案检查装置对与形成为相同图案的图案相对应的区域的图像进行比较，从而确定跨越图像的不匹配部分是缺陷。 该装置包括能够同时获取彼此不同的可移动多个检测系统的图像的多个传感器，以及与其对应的图像比较部。 此外，该装置包括检测从特征量成为缺陷的统计偏移值的装置，从而即使当与膜中的厚度差相关联地发生亮度差时，也能够适当地检测缺陷。

公开(公告)号：US20110274342A1

公开(公告)日：2011-11-10

申请号：US13141375

申请日：2009-10-22

申请人： Shunji Maeda ,  Kaoru Sakai ,  Hidetoshi Nishiyama

发明人： Shunji Maeda ,  Kaoru Sakai ,  Hidetoshi Nishiyama

IPC分类号： G06K9/00

CPC分类号： H01L22/20 ,  G01N21/95623 ,  G06T7/001 ,  G06T2207/30148 ,  H01L22/12

摘要： The invention provides a defect inspection method and a defect inspection device which enable a defect to be inspected regardless of optical conditions. The invention comprises the steps of setting a target local region and a plurality of corresponding local regions in the image signals, the target local region including a target pixel and an area surrounding the target pixel, the corresponding local regions including pixels corresponding to the target pixel and areas surrounding the corresponding pixels; searching similarities between the image signal of the target local region and the image signals of the plurality of corresponding local regions; determining a plurality of image signals that represent corresponding local regions and are similar to the image signal of the target local region; and comparing the image signal of the target local region with the image signals that represent the corresponding local regions.

摘要翻译： 本发明提供一种缺陷检查方法和缺陷检查装置，其能够在不考虑光学条件的情况下检查缺陷。 本发明包括以下步骤：在图像信号中设置目标局部区域和多个对应的局部区域，目标局部区域包括目标像素和围绕目标像素的区域，对应的局部区域包括与目标像素对应的像素 和相应像素周围的区域; 搜索所述目标局部区域的图像信号与所述多个对应的局部区域的图像信号之间的相似度; 确定表示对应的局部区域并且与目标局部区域的图像信号相似的多个图像信号; 并将目标局部区域的图像信号与表示对应的局部区域的图像信号进行比较。

公开(公告)号：US07973920B2

公开(公告)日：2011-07-05

申请号：US12950243

申请日：2010-11-19

申请人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

发明人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC分类号： G01N21/88

CPC分类号： G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

摘要： A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.

摘要翻译： 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。

公开(公告)号：US07768635B2

公开(公告)日：2010-08-03

申请号：US12328357

申请日：2008-12-04

申请人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

发明人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC分类号： G01N21/00

CPC分类号： G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

摘要： A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.

摘要翻译： 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。

公开(公告)号：US08467594B2

公开(公告)日：2013-06-18

申请号：US12960578

申请日：2010-12-06

申请人： Kaoru Sakai ,  Shunji Maeda ,  Hisae Shibuya ,  Hidetoshi Nishiyama

发明人： Kaoru Sakai ,  Shunji Maeda ,  Hisae Shibuya ,  Hidetoshi Nishiyama

IPC分类号： G06K9/00 ,  G06K9/68

CPC分类号： G06T7/0004 ,  G06T7/001 ,  G06T2207/30148

摘要： In a pattern inspection apparatus, influences of pattern brightness variations that is caused in association with, for example, a film thickness difference or a pattern width variation can be reduced, high sensitive pattern inspection can be implemented, and a variety of defects can be detected. Thereby, the pattern inspection apparatus adaptable to a broad range of processing steps is realized. In order to realize this, the pattern inspection apparatus of the present invention performs comparison between images of regions corresponding to patterns formed to be same patterns, thereby determining mismatch portions across the images to be defects. The apparatus includes multiple sensors capable of synchronously acquiring images of shiftable multiple detection systems different from one another, and an image comparator section corresponding thereto. In addition, the apparatus includes means of detecting a statistical offset value from the feature amount to be a defect, thereby enabling the defect to be properly detected even when a brightness difference is occurring in association with film a thickness difference in a wafer.

摘要翻译： 在图案检查装置中，可以减少与膜厚差或图案宽度变化相关联引起的图案亮度变化的影响，可以实现高灵敏度图案检查，并且可以检测各种缺陷 。 由此，可以实现适应于广泛的处理步骤的图案检查装置。 为了实现这一点，本发明的图案检查装置对与形成为相同图案的图案相对应的区域的图像进行比较，从而确定跨越图像的不匹配部分是缺陷。 该装置包括能够同时获取彼此不同的可移动多个检测系统的图像的多个传感器，以及与其对应的图像比较部。 此外，该装置包括检测从特征量成为缺陷的统计偏移值的装置，从而即使当与膜中的厚度差相关联地发生亮度差时，也能够适当地检测缺陷。

公开(公告)号：US08270700B2

公开(公告)日：2012-09-18

申请号：US12591179

申请日：2009-11-12

申请人： Kaoru Sakai ,  Shunji Maeda ,  Hidetoshi Nishiyama

发明人： Kaoru Sakai ,  Shunji Maeda ,  Hidetoshi Nishiyama

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： According to the present invention, for a pattern inspection apparatus that compares images in corresponding areas of two patterns that are identical and that determines an unmatched portion between the images is a defect, a plurality of detection systems and a plurality of corresponding image comparison methods are provided. With this configuration, the affect of uneven brightnesses for a pattern that occurs due to differences in film thicknesses can be reduced, a highly sensitive pattern inspection can be performed, a variety of defects can be revealed, and the pattern inspection apparatus can be applied for processing performed within a wide range. Furthermore, the pattern inspection apparatus also includes a unit for converting the tone of image signals of comparison images for a plurality of different processing units, and when a difference in brightness occurs in the same pattern of the images, a defect can be correctly detected.

摘要翻译： 根据本发明，对于对相同的两个图案的相应区域中的图像进行比较并且确定图像之间的不匹配部分的图像的图案检查装置是缺陷，多个检测系统和多个对应的图像比较方法是 提供。 利用这种结构，可以降低由于膜厚度差异而产生的图案的不均匀亮度的影响，可以进行高灵敏度图案检查，可以显示各种缺陷，并且图案检查装置可以应用于 在广泛的范围内进行处理。 此外，图案检查装置还包括用于转换多个不同处理单元的比较图像的图像信号的色调的单元，并且当在相同图案中出现亮度差时，可以正确地检测缺陷。

公开(公告)号：US08218138B2

公开(公告)日：2012-07-10

申请号：US13172233

申请日：2011-06-29

申请人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

发明人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC分类号： G01N21/00 ,  G01N21/88

CPC分类号： G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

摘要： A defect inspection apparatus and method includes utilizing an irradiation optical system that focuses a beam flux emitted from a laser light source and formed into a slit-shaped beam so as to irradiate the beam onto the surface of the substrate to be inspected, utilizing a detection optical system that detects light from the substrate that has been irradiated with the slit-shaped beam, and utilizing a signal processor that processes a signal output from the detection optical system. The irradiation optical system includes a cylindrical lens for focusing the beam that has been emitted from the laser light source onto the substrate to be inspected, as the slit-shaped beam, wherein the cylindrical lens is disposed so as to obtain a distance between an incidence surface or emitting surface thereof and the slit-shaped beam upon the substrate to be inspected to be equal to a focal distance of the cylindrical lens.

摘要翻译： 缺陷检查装置和方法包括利用照射光学系统，其将从激光源发射的光束束聚焦并形成为狭缝状光束，以便将光束照射到待检查的基板的表面上，利用检测 光学系统，其检测来自已经被狭缝形光束照射的基板的光，以及利用处理从检测光学系统输出的信号的信号处理器。 照射光学系统包括用于将从激光光源发射的光束聚焦到待检查的基板上的柱面透镜作为狭缝状光束，其中，设置柱面透镜以获得入射光 表面或发射表面以及待检查的基板上的狭缝状光束等于柱面透镜的焦距。

公开(公告)号：US20110255074A1

公开(公告)日：2011-10-20

申请号：US13172233

申请日：2011-06-29

申请人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

发明人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC分类号： G01N21/17 ,  G01J4/00

CPC分类号： G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

摘要： A defect inspection apparatus and method includes utilizing an irradiation optical system that focuses a beam flux emitted from a laser light source and formed into a slit-shaped beam so as to irradiate the beam onto the surface of the substrate to be inspected, utilizing a detection optical system that detects light from the substrate that has been irradiated with the slit-shaped beam, and utilizing a signal processor that processes a signal output from the detection optical system. The irradiation optical system includes a cylindrical lens for focusing the beam that has been emitted from the laser light source onto the substrate to be inspected, as the slit-shaped beam, wherein the cylindrical lens is disposed so as to obtain a distance between an incidence surface or emitting surface thereof and the slit-shaped beam upon the substrate to be inspected to be equal to a focal distance of the cylindrical lens.

摘要翻译： 缺陷检查装置和方法包括利用照射光学系统，其将从激光源发射的光束束聚焦并形成为狭缝状光束，以便将光束照射到待检查的基板的表面上，利用检测 光学系统，其检测来自已经被狭缝形光束照射的基板的光，以及利用处理从检测光学系统输出的信号的信号处理器。 照射光学系统包括用于将从激光光源发射的光束聚焦到待检查的基板上的柱面透镜作为狭缝状光束，其中，设置柱面透镜以获得入射光 表面或发射表面以及待检查的基板上的狭缝状光束等于柱面透镜的焦距。

公开(公告)号：US07848563B2

公开(公告)日：2010-12-07

申请号：US11328231

申请日：2006-01-10

申请人： Kaoru Sakai ,  Shunji Maeda ,  Hisae Shibuya ,  Hidetoshi Nishiyama

发明人： Kaoru Sakai ,  Shunji Maeda ,  Hisae Shibuya ,  Hidetoshi Nishiyama

IPC分类号： G06K9/62 ,  G06K9/36

CPC分类号： G06T7/0004 ,  G06T7/001 ,  G06T2207/30148

摘要： In a pattern inspection apparatus, influences of pattern brightness variations that is caused in association with, for example, a film thickness difference or a pattern width variation can be reduced, high sensitive pattern inspection can be implemented, and a variety of defects can be detected. Thereby, the pattern inspection apparatus adaptable to a broad range of processing steps is realized. In order to realize this, the pattern inspection apparatus of the present invention performs comparison between images of regions corresponding to patterns formed to be same patterns, thereby determining mismatch portions across the images to be defects. The apparatus includes multiple sensors capable of synchronously acquiring images of shiftable multiple detection systems different from one another, and an image comparator section corresponding thereto. In addition, the apparatus includes means of detecting a statistical offset value from the feature amount to be a defect, thereby enabling the defect to be properly detected even when a brightness difference is occurring in association with film a thickness difference in a wafer.

摘要翻译： 在图案检查装置中，可以减少与膜厚差或图案宽度变化相关联引起的图案亮度变化的影响，可以实现高灵敏度图案检查，并且可以检测各种缺陷 。 由此，可以实现适应于广泛的处理步骤的图案检查装置。 为了实现这一点，本发明的图案检查装置对与形成为相同图案的图案相对应的区域的图像进行比较，从而确定跨越图像的不匹配部分是缺陷。 该装置包括能够同时获取彼此不同的可移动多个检测系统的图像的多个传感器，以及与其对应的图像比较部。 此外，该装置包括检测从特征量成为缺陷的统计偏移值的装置，从而即使当与膜中的厚度差相关联地发生亮度差时，也能够适当地检测缺陷。