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公开(公告)号：US09447594B2
公开(公告)日：2016-09-20
申请号：US13487839
申请日：2012-06-04
CPC分类号： E04H4/141 , E04H4/0087 , E04H2004/0068
摘要： The present invention provides a pool wall and deck support member including modular and symmetrical upper and lower halves adapted to be interconnected to one another to form a unitary support member. Each half is essentially V-shaped with the bottom of the V having a pair of fastening elements disposed thereon and adapted to securely engage corresponding fastening elements disposed on the bottom of the V of the opposite half. Disposed on the ends of the upwardly extending legs of the V-shaped members are fastening elements that are adapted to engage a cross bar that extends across the V-shaped member.
摘要翻译： 本发明提供一种池壁和甲板支撑构件，其包括适于彼此互连以形成整体支撑构件的模块化和对称的上半部和下半部。 每个半部基本上是V形的，其中V的底部具有一对紧固元件，其上设置有一对紧固元件，并且适于牢固地接合设置在相对的一半的V的底部上的对应的紧固元件。 在V形构件的向上延伸的腿的端部上设置有紧固元件，其适于接合跨过V形构件延伸的横杆。
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22.发明授权
公开(公告)号：US5283163A
公开(公告)日：1994-02-01
申请号：US992682
申请日：1992-12-18
IPC分类号： G03C7/00 , C07D257/04 , C07D403/12 , G03C7/305 , G03C7/32 , G03C1/46
CPC分类号： C07D257/04 , C07D403/12 , G03C7/30541 , Y10S430/158
摘要： A photographic development inhibitor releasing compound comprises a releasable development inhibitor group comprising an amide group containing a carbon alpha to the amide functionality which is di- or tri-fluorinated. Such a compound is useful in photographic silver halide materials and processes to enable increased image sharpness and good interimage results.
摘要翻译： 包含照相显影抑制剂的化合物包括可释放的显影抑制剂组，其包含二酰基或三氟化的酰胺官能团含有碳的酰胺基团。 这种化合物可用于摄影卤化银材料和用于增强图像清晰度和良好的图像结果的方法。
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公开(公告)号：US4912025A
公开(公告)日：1990-03-27
申请号：US209614
申请日：1988-06-21
IPC分类号： C07D231/08 , G03C1/06 , G03C7/305
CPC分类号： G03C7/30558 , C07D231/08 , Y10S430/16
摘要： A photographic recording material capable of accelerated development is described. The recording material comprises an image-forming coupler compound, a development inhibitor releasing compound and a compound capable of imagewise release of an electron transfer agent.
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24.发明授权
公开(公告)号：US4859578A
公开(公告)日：1989-08-22
申请号：US209611
申请日：1988-06-21
IPC分类号： G03C7/305
CPC分类号： G03C7/30594 , G03C7/30541 , Y10S430/156 , Y10S430/16
摘要： A photographic recording material is disclosed which is capable of providing improved granularity properties without sacrifice in other desirable photographic properties. The recording material comprises an image dye-forming coupler compound, a development inhibitor releasing compound, a compound capable of imagewise release of a soluble mercaptan compound and a compound capable of imagewise release of an electron transfer agent.
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25.发明授权Apparatus and method for reducing defects in a semiconductor lithographic process 有权用于减少半导体光刻工艺中的缺陷的装置和方法公开(公告)号：US06222936B1
公开(公告)日：2001-04-24
申请号：US09394871
申请日：1999-09-13
IPC分类号： G06K900
CPC分类号： G03F7/70616 , G03F7/7065
摘要： An arrangement for optimizing a lithographic process forms a pattern on a silicon wafer using a photocluster cell system to simulate an actual processing condition for a semiconductor product. The resist pattern is then inspected using a wafer inspection system. An in-line low voltage scanning electron microscope (SEM) system reviews and classifies defect types, enabling generation of an alternative processing specification. The alternative processing specification can then be tested by forming patterns on different wafers, and then performing split-series testing to analyze the patterns on the different wafers for comparison with the existing lithographic process and qualification for production.
摘要翻译： 用于优化光刻工艺的布置使用光集电池系统在硅晶片上形成图案，以模拟半导体产品的实际处理条件。 然后使用晶片检查系统检查抗蚀剂图案。 在线低电压扫描电子显微镜（SEM）系统评估和分类缺陷类型，实现替代处理规范的生成。 然后可以通过在不同晶片上形成图案来测试替代处理规范，然后进行分裂式测试以分析不同晶片上的图案，以与现有的光刻工艺和生产资格进行比较。
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公开(公告)号：US5985497A
公开(公告)日：1999-11-16
申请号：US17678
申请日：1998-02-03
CPC分类号： G03F7/70616 , G03F7/7065
摘要： An arrangement for optimizing a lithographic process forms a pattern on a silicon wafer using a photocluster cell system to simulate an actual processing condition for a semiconductor product. The resist pattern is then inspected using a wafer inspection system. An in-line low voltage scanning electron microscope (SEM) system reviews and classifies defect types, enabling generation of an alternative processing specification. The alternative processing specification can then be tested by forming patterns on different wafers, and then performing split-series testing to analyze the patterns on the different wafers for comparison with the existing lithographic process and qualification for production.
摘要翻译： 用于优化光刻工艺的布置使用光集电池系统在硅晶片上形成图案，以模拟半导体产品的实际处理条件。 然后使用晶片检查系统检查抗蚀剂图案。 在线低电压扫描电子显微镜（SEM）系统评估和分类缺陷类型，实现替代处理规范的生成。 然后可以通过在不同晶片上形成图案来测试替代处理规范，然后进行分裂式测试以分析不同晶片上的图案，以与现有的光刻工艺和生产资格进行比较。
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