公开(公告)号：US20220390848A1

公开(公告)日：2022-12-08

申请号：US17834154

申请日：2022-06-07

Applicant: SEMES CO., LTD.

Inventor： Ki Hoon CHOI ,  Se Hoon OH ,  Young Dae CHUNG ,  Tae Hee KIM ,  Young Eun JEON

IPC: G03F7/30 ,  G03F7/20 ,  G03F7/42

Abstract: The present invention provides a substrate treating apparatus including: a support unit for supporting and rotating a substrate on which a first pattern and a second pattern different from the first pattern are formed; a liquid supply unit for supplying a treatment liquid to the substrate supported on the support unit; and a heating unit for heating any one of the first pattern and the second pattern.

公开(公告)号：US20160013080A1

公开(公告)日：2016-01-14

申请号：US14749010

申请日：2015-06-24

Applicant: Semes Co., Ltd.

Inventor： Tae Keun KIM ,  Oh Jin KWON ,  Ki Hoon CHOI

IPC: H01L21/67 ,  B08B3/10 ,  B08B3/02

CPC classification number: B08B3/10 ,  B08B3/12 ,  B08B7/028 ,  H01L21/67017 ,  H01L21/67051

Abstract: Embodiments of the inventive concepts provide an apparatus and a method for treating a substrate. The apparatus includes a substrate support unit supporting the substrate, and a liquid supply unit supplying a treatment solution to the substrate supported by the substrate support unit. The liquid supply unit includes a nozzle discharging the treatment solution to the substrate, a liquid supply line supplying the treatment solution to the nozzle, a mixing member installed on the liquid supply line, a mixing space formed within the mixing member, and a gas supply line connected to the mixing member to supply a gas into the mixing space. The mixing member includes a body within which the mixing space is formed, and an inflow port combined with the body such that the gas supplied through the inflow port is mixed with the treatment solution in the mixing space to form nano-sized bubbles.

Abstract translation: 本发明构思的实施例提供了一种用于处理基底的装置和方法。 该装置包括支撑基板的基板支撑单元和向由基板支撑单元支撑的基板供应处理溶液的液体供应单元。 液体供给单元包括将处理液排出到基板的喷嘴，向喷嘴供给处理液的液体供给管线，安装在液体供给管线上的混合部件，形成在混合部件内的混合空间和气体供给部 线路连接到混合构件以将气体供应到混合空间中。 混合构件包括形成混合空间的主体和与主体结合的流入口，使得通过流入口供应的气体与混合空间中的处理溶液混合以形成纳米级气泡。