公开(公告)号：US20220369568A1

公开(公告)日：2022-11-24

申请号：US17619801

申请日：2020-06-15

Applicant: SHOWA DENKO K.K.

Inventor： Ichiro FUJITA ,  Makoto SAITO ,  Hiroshi UCHIDA ,  Hisashi KIMOTO

IPC: A01G7/06 ,  A01C21/00 ,  A01P21/00

Abstract: Physiological processes in plants are regulated and reinforced, and crop vitality, yield, quality and post-harvesting storage life are improved. A plant vitalizer that includes a cellooligosaccharide is applied to the plants.

公开(公告)号：US20210238123A1

公开(公告)日：2021-08-05

申请号：US17049792

申请日：2019-04-25

Applicant: SHOWA DENKO K.K.

Inventor： Yasuyuki UEDA ,  Akira SHIBUYA ,  Hideo MIYATA ,  Hiroshi UCHIDA

IPC: C07C231/06 ,  B01J31/02

Abstract: A method of producing an N,N-disubstituted amide of the present invention is a method of reacting a nitrile with an alcohol in the presence of a catalyst, wherein the nitrile is a compound represented by R1CN (R1 represents an alkyl group having 10 or less carbon atoms or an aryl group having 10 or less carbon atoms), wherein the alcohol is a compound represented by R2OH (R2 represents an alkyl group having 10 or less carbon atoms), wherein the catalyst is a metal salt represented by MXn (M represents a metal cation having an oxidation number of n, X represents a monovalent anion including a substituted sulfonyl group represented by —S(═O)2—R3 (R3 represents a hydrocarbon group having 10 or less carbon atoms or a group in which some or all of hydrogen atoms in the hydrocarbon group are substituted with fluorine atoms), and n represents an integer of 1 to 4), a substituent bonded to a carbon atom in a carbonyl group of the N,N-disubstituted amide is R1, and two substituents bonded to nitrogen atoms in an amide group are both R2.

公开(公告)号：US20180282494A1

公开(公告)日：2018-10-04

申请号：US15531587

申请日：2015-12-11

Applicant: SHOWA DENKO K.K.

Inventor： Hiromi OTAKE ,  Aoi NAKANO ,  Chika YAMASHITA ,  Yoshitaka ISHIBASHI ,  Hiroshi UCHIDA

IPC: C08J3/24 ,  C08G8/32 ,  C08K3/36

Abstract: Provided is a thermosetting resin composition which is capable of obtaining, as a result of being cured, a highly reliable cured product exhibiting excellent moisture resistance, heat resistance, and mechanical strength. The present invention includes a polyalkenyl phenol resin (A) and an aromatic polymaleimide compound (B). The polyalkenyl phenol resin (A) has, in a molecule thereof, at least one aromatic ring unit (a1) which has or does not have a 2-alkenyl group bonded thereto, and in which a phenolic hydroxyl group is alkyl-etherified, and at least one aromatic ring unit (a2) which has a phenolic hydroxyl group, and which has or does not have a 2-alkenyl group bonded thereto. At least one of the aromatic ring units (a1, a2) has a 2-alkenyl group. Each of the aromatic ring units is bonded by a linking group. When m represents the number of the aromatic ring units (a1), and n represents the number of the aromatic ring units (a2), the ratio of n to (m+n) is 10-60%. The polyalkenyl phenol resin (A) is included in an amount at which the amount of 2-alkenyl groups becomes 0.4-1.5 mol per mol of maleimide groups in the aromatic polymaleimide compound (B).

公开(公告)号：US20130307195A1

公开(公告)日：2013-11-21

申请号：US13872384

申请日：2013-04-29

Applicant: SHOWA DENKO K.K.

Inventor： Yoshikazu ARAI ,  Hiroshi UCHIDA

IPC: B29D17/00

CPC classification number: B29D17/00 ,  C08F220/40 ,  C08G77/045 ,  C08G77/14 ,  C08G77/38 ,  G11B5/855

Abstract: The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. The curable composition for transfer materials comprises a silsesquioxane skeleton-containing compound having, in its molecule, a specific silsesquioxane skeleton and a curable functional group.

Abstract translation: 本发明的目的是提供一种转印材料用固化性组合物。 该可固化组合物可应用于能够形成具有高通量的微图案的UV纳米压印法，在一些情况下可应用于热纳米压印工艺，并且能够形成对氟基气体和 氧气 用于转移材料的可固化组合物包括在其分子中具有特定倍半硅氧烷骨架和可固化官能团的含硅倍半硅氧烷骨架的化合物。