Abstract:
A lateral insulated-gate bipolar transistor includes a buried insulation layer which opens only part of the collector ion implantation region and isolates the other regions, thereby reducing the loss by the turn-off time. The lateral insulated-gate bipolar transistor further includes a deep ion implantation region formed to face towards the open part of the collector ion implantation region, thereby decreasing the hole current injected into a base region under an emitter ion implantation region, and thereby greatly increasing the latch-up current level by relatively increasing the hole current injected into the deep ion implantation region having no latch-up effect.
Abstract:
Provided is an optical system for a thermal image microscope. The optical system includes an image forming unit and a relay unit. The image forming unit forms a focus. The relay unit elongates an optical path. Here, the image forming unit includes six lenses. The relay unit includes two lenses. Aspherical surfaces of the lenses are all convex surfaces.
Abstract:
Provided is an optical system for a thermal image microscope. The optical system includes an image forming unit and a relay unit. The image forming unit forms a focus. The relay unit elongates an optical path. Here, the image forming unit includes six lenses. The relay unit includes two lenses. Aspherical surfaces of the lenses are all convex surfaces.
Abstract:
An automatic exposure (AE) controlling device and method are provided. According to the method, an electric shutter (ES) value and an analog gain control (AGC) value can be calculated through a proportional integral control method according to a brightness value of an inputted image frame. Then, AE compensation on a present image frame can be performed using the calculated ES value and AGC value.
Abstract:
An automatic exposure (AE) controlling device and method are provided. According to the method, an electric shutter (ES) value and an analog gain control (AGC) value can be calculated through a proportional integral control method according to a brightness value of an inputted image frame. Then, AE compensation on a present image frame can be performed using the calculated ES value and AGC value.
Abstract:
A liquid crystal display device includes first and second substrates facing each other; gate lines and data lines formed on the first substrate such that the gate lines and the data lines intersect each other to define pixel regions; thin film transistors formed at respective intersections of the gate lines and the data lines; a black matrix layer formed on the second substrate such that the black matrix layer corresponds to a region other than the pixel regions; color filter layers extending in an extension direction of the data lines in respective pixel regions; a liquid crystal layer interposed between the first and second substrates; first column spacers formed on one of the first and second substrates such that each first column spacer corresponds to an associated one. of the gate lines or to a channel region of an associated one of the thin film transistors.
Abstract:
An insulated gate bipolar transistor according to an embodiment includes a first conductive type collector ion implantation area in a substrate; a second conductive type buffer layer, including a first segment buffer layer and a second segment buffer layer, on the first conductive collector ion implantation area; a first conductive type base area on the second conductive type buffer layer; a gate on the substrate at a side of the first conductive type base area; a second conductive type emitter ion implantation area in the first conductive type base area; an insulating layer on the gate; an emitter electrode electrically connected to the second conductive type emitter ion implantation area; and a collector electrode electrically connected to the first conductive collector ion implantation area. The first segment buffer layer can be aligned below a portion of the base area and can have a lower density of second conductive type ions than that of the second segment buffer layer adjacent the first segment buffer layer.
Abstract:
A method of forming a gate insulating layer and nitrogen density measuring method thereof, by which a transistor having enhanced electric characteristics can be fabricated without employing separate ion implantation in a manner of providing parameters for enhancing perfection of the transistor via nitridation measurement. The method includes forming a first oxide layer on a silicon substrate having first to fourth regions defined thereon, patterning the first oxide layer in the first and fourth regions to have a predetermined thickness, and forming a nitride layer on the oxide layer in the third and fourth regions.
Abstract:
The present invention relates to a programmable location control encoder, wherein the encoder has a new function of combining a sequential control function to conventional rotary encoders. The present invention comprises: a rotary disk having an absolute location code indicative of each location, that is, an address code formed by a combination of binary numbers; an optical sensor for detecting said binary address code; a signal amplification unit for amplifying an output signal of the optical sensor; and a control circuit board for outputting a digital signal by using a signal outputted from the signal amplification unit. According to the present invention, it is possible to convert a partition angle or a location control code by configuring a software resolution, and to maximize work efficiency by combining a sequential control function to conventional rotary encoders.