公开(公告)号：US20060266489A1

公开(公告)日：2006-11-30

申请号：US11435722

申请日：2006-05-18

申请人： Hiroyuki Takamura

发明人： Hiroyuki Takamura

IPC分类号： D21F3/00

CPC分类号： D21F3/0227 ,  D21F3/0236 ,  Y10S162/901

摘要： [Problem to be Solved]To provide a belt for shoe-press of paper machine having water drain grooves which is usable for long time by preventing occurrence of cracks in side walls of the water drain grooves. [Solving Means]The surface condition of the water drain grooves side wall is arranged to be pear-skin state having minute unevenness, preferably to have an average surface roughness in a range of 10 to 50 micrometers in at least upper two thirds of the total distance (depth) of side wall of the water drain grooves between the top of a groove and a bottom thereof. The water drain grooves having such roughness can be manufactured in the following arrangement. A rotary cutting blades are disposed in a position contacting with a roll around which a belt is wound, the roll and the rotary cutting blades rotate simultaneously and a groove cutting device is shifted in the width direction of a belt so that water drain grooves are formed in the belt, in which the belt running speed on the roll is set at 2 to 20 m/min, preferably 5 to 15 m/min, rotation speed of the rotary cutting blades is set at 1,000 to 8,000 rpm, preferably 3,000 to 6,000 rpm, and thus grooves can be manufactured.

摘要翻译： [待解决的问题]为了提供一种具有排水槽的造纸机的压榨带，其可以长时间使用，以防止排水槽的侧壁发生裂纹。 [解决方案]排水槽侧壁的表面状态被布置为具有微小凹凸的梨皮状态，优选至少在总共的三分之二以上具有10至50微米的平均表面粗糙度 沟槽顶部和底部之间的排水槽的侧壁的距离（深度）。 具有这种粗糙度的排水槽可以按照以下的结构制造。 旋转切割刀片设置在与卷绕的辊对接的位置，辊和旋转切割刀片同时旋转，并且槽切割装置沿带的宽度方向移动，从而形成排水槽 在辊中的带运行速度设定为2〜20m / min，优选为5〜15m / min的带中，旋转切割刀片的转速设定为1,000〜8000rpm，优选为3,000〜6000 rpm，因此可以制造凹槽。

公开(公告)号：US20060118261A1

公开(公告)日：2006-06-08

申请号：US11273262

申请日：2005-11-15

申请人： Jun Ishino ,  Hiroyuki Takamura

发明人： Jun Ishino ,  Hiroyuki Takamura

IPC分类号： D21F3/00

CPC分类号： D21F3/0227

摘要： To provide a shoe press belt that is more excellent in the properties such as abrasion resistance, bending fatigue, crack resistance, and compression fatigue resistance. The shoe press belt has polyurethane and a substrate, wherein the polyurethane contains a non-reactive polydimethylsiloxane liquid substance and has a JIS A hardness of 93° to 96°.

摘要翻译： 为了提供耐磨性，弯曲疲劳，抗裂纹性和抗压缩疲劳性等性能更优异的靴式压榨带。 靴型压榨带具有聚氨酯和基材，其中聚氨酯含有非反应性聚二甲基硅氧烷液体物质，并且具有93°至96°的JIS A硬度。

公开(公告)号：US20050287373A1

公开(公告)日：2005-12-29

申请号：US11165187

申请日：2005-06-24

申请人： Atsushi Ishino ,  Hiroyuki Takamura ,  Tsutomu Ishii

发明人： Atsushi Ishino ,  Hiroyuki Takamura ,  Tsutomu Ishii

IPC分类号： D21F3/02 ,  D21F7/08 ,  D21G1/00 ,  C08G18/10 ,  B32B27/00

CPC分类号： D21F3/0227 ,  D21F3/0236 ,  D21F7/083 ,  D21F7/086 ,  D21G1/0066 ,  Y10T428/31551

摘要： A papermaking machine belt has a polyurethane and a substrate. The polyurethane is obtained by curing a mixture of an urethane prepolymer, a curing agent, and a non-reactive liquid poly(dimethyl siloxane) in which an amount ratio thereof with respect to a sum of the amount of the urethane prepolymer and the curing agent is from 0.5 to 25% by weight.

摘要翻译： 造纸机带具有聚氨酯和基材。 聚氨酯通过将氨基甲酸酯预聚物，固化剂和非反应性液体聚（二甲基硅氧烷）的混合物固化而得到，其中其相对于氨基甲酸酯预聚物和固化剂的总量的量的比例 为0.5〜25重量％。

公开(公告)号：US20050207932A1

公开(公告)日：2005-09-22

申请号：US11078262

申请日：2005-03-11

申请人： Shunsuke Takeguchi ,  Hiroyuki Takamura

发明人： Shunsuke Takeguchi ,  Hiroyuki Takamura

IPC分类号： F16H53/02 ,  B22F3/16 ,  B22F3/24 ,  B22F5/00 ,  B22F5/10 ,  F01L1/047 ,  F01L1/08

CPC分类号： F01L1/047 ,  B22F5/10 ,  B22F2999/00 ,  F01L1/08 ,  F01L2101/02 ,  B22F2203/05 ,  B22F3/16

摘要： The temporary compacting of the powder for use in sintering is carried out, the temporary sintering is carried out, the main compacting is carried out, the main sintering is carried out, and the thickness of the radius direction of the base part of the cam before the heat-treatment is set to 3.0 mm or more.

摘要翻译： 进行用于烧结的粉末的临时压实，进行临时烧结，进行主压实，进行主烧结，并且凸轮的基部的半径方向的厚度在 热处理设定为3.0mm以上。

公开(公告)号：US5219775A

公开(公告)日：1993-06-15

申请号：US836592

申请日：1992-02-18

申请人： Yukihiro Saeki ,  Osamu Matsumoto ,  Masayuki Yoshida ,  Takahide Mizutani ,  Nobuyoshi Chida ,  Tomohisa Shigematsu ,  Teruo Uemura ,  Kenji Toyoda ,  Hiroyuki Takamura

发明人： Yukihiro Saeki ,  Osamu Matsumoto ,  Masayuki Yoshida ,  Takahide Mizutani ,  Nobuyoshi Chida ,  Tomohisa Shigematsu ,  Teruo Uemura ,  Kenji Toyoda ,  Hiroyuki Takamura

IPC分类号： H01L21/8247 ,  H01L27/115 ,  H01L29/788 ,  H01L29/792

CPC分类号： H01L27/11521 ,  Y10S148/106

摘要： A manufacturing method of a semiconductor memory device includes the steps of selectively forming a field oxide film and a gate oxide film on a semiconductor substrate, depositing a first conductive layer on an entire surface of the resultant structure, selectively etching the first conductive layer located in a region other than an element region, depositing a second conductive layer on an entire surface of the resultant structure, and etching the first conductive layer and the second conductive layer using the same mask to form a plurality of floating gates by the first conductive layer and to form a plurality of control gates by the second conductive layer, wherein the step of selectively etching the first conductive layer includes the first etching step of forming cell slits for separating the plurality of floating gates from each other and the second etching step of forming removed regions each of which includes only one end of each of the plurality of control gates.