公开(公告)号：US20200073261A1

公开(公告)日：2020-03-05

申请号：US16675921

申请日：2019-11-06

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chi YANG ,  Ssu-Yu CHEN ,  Shang-Chieh CHIEN ,  Chieh HSIEH ,  Tzung-Chi FU ,  Bo-Tsun LIU ,  Li-Jui CHEN ,  Po-Chung CHENG

IPC: G03F7/20 ,  H05G2/00

Abstract: A radiation source apparatus is provided. The radiation source apparatus includes a chamber, a target droplet generator, an exhaust module, a measuring device, and a controller. The target droplet generator is configured to provide a plurality of target droplets to the chamber. The exhaust module is configured to extract debris corresponding to the target droplets out of the chamber according to a first gas flow rate. The measuring device is configured to measure concentration of the debris in the chamber. The controller is configured to adjust the first gas flow rate according to the measured concentration of the debris.

公开(公告)号：US20200060015A1

公开(公告)日：2020-02-20

申请号：US16535005

申请日：2019-08-07

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Chun-Chia HSU ,  Po-Chung CHENG ,  Li-Jui CHEN ,  Shang-Chieh CHIEN ,  Yen-Shuo SU ,  Chieh HSIEH ,  Chi YANG

IPC: H05G2/00 ,  G02B7/182

Abstract: An apparatus for generating extreme ultraviolet (EUV) radiation comprises a droplet generator, an excitation laser source, an energy detector, and a feedback controller. The droplet generator is configured to generate target droplets. The excitation laser is configured to generate a pre-pulse and a main pulse to convert the target droplets to plasma by heating. The energy detector is configured to measure a variation in EUV energy generated when the target droplets are converted to plasma. The feedback controller is configured to adjust a time delay between a subsequent pre-pulse and main pulse generated by the excitation laser based on the variation in EUV energy generated by a given main pulse.

公开(公告)号：US20190101831A1

公开(公告)日：2019-04-04

申请号：US16029408

申请日：2018-07-06

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Jen-Yang CHUNG ,  Chieh HSIEH ,  Shang-Chieh CHIEN ,  Li-Jui CHEN ,  Po-Chung CHENG

IPC: G03F7/20 ,  G03F1/24

Abstract: A method of controlling a droplet illumination module/droplet detection module system of an extreme ultraviolet (EUV) radiation source includes irradiating a target droplet with light from a droplet illumination module and detecting light reflected and/or scattered by the target droplet. The method includes determining whether an intensity of the detected light is within an acceptable range. In response to determining that the intensity of the detected light is not within the acceptable range, a parameter of the droplet illumination module is automatically adjusted to set the intensity of the detected light within the acceptable range.

公开(公告)号：US20190094717A1

公开(公告)日：2019-03-28

申请号：US16057208

申请日：2018-08-07

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chi YANG ,  Ssu-Yu CHEN ,  Shang-Chieh CHIEN ,  Chieh HSIEH ,  Tzung-Chi FU ,  Bo-Tsun LIU ,  Li-Jui CHEN ,  Po-Chung CHENG

IPC: G03F7/20 ,  H05G2/00

Abstract: A light source for extreme ultraviolet (EUV) radiation is provided. The light source includes a target droplet generator, a laser generator, a measuring device, and a controller. The target droplet generator is configured to provide a plurality of target droplets to a source vessel. The laser generator is configured to provide a plurality of first laser pulses according to a control signal to irradiate the target droplets in the source vessel, so as to generate plasma as the EUV radiation. The measuring device is configured to measure process parameters including temperature of the source vessel, droplet positions of the target droplets, and beam sizes and focal points of the first laser pulses. The controller is configured to provide the control signal according to at least two of the process parameters.