Multi-Function Overlay Marks for Reducing Noise and Extracting Focus and Critical Dimension Information

    公开(公告)号:US20220384358A1

    公开(公告)日:2022-12-01

    申请号:US17816030

    申请日:2022-07-29

    Abstract: An overlay mark includes a first, a second, a third, and a fourth component. The first component is located in a first region of the first overlay mark and includes a plurality of gratings that extend in a first direction. The second component is located in a second region of the first overlay mark and includes a plurality of gratings that extend in the first direction. The third component is located in a third region of the first overlay mark and includes a plurality of gratings that extend in a second direction different from the first direction. The fourth component is located in a fourth region of the first overlay mark and includes a plurality of gratings that extend in the second direction. The first region is aligned with the second region. The third region is aligned with the fourth region.

    Multi-function overlay marks for reducing noise and extracting focus and critical dimension information

    公开(公告)号:US11448975B2

    公开(公告)日:2022-09-20

    申请号:US17171119

    申请日:2021-02-09

    Abstract: An overlay mark includes a first, a second, a third, and a fourth component. The first component is located in a first region of the first overlay mark and includes a plurality of gratings that extend in a first direction. The second component is located in a second region of the first overlay mark and includes a plurality of gratings that extend in the first direction. The third component is located in a third region of the first overlay mark and includes a plurality of gratings that extend in a second direction different from the first direction. The fourth component is located in a fourth region of the first overlay mark and includes a plurality of gratings that extend in the second direction. The first region is aligned with the second region. The third region is aligned with the fourth region.

    Pellicle assembly in photolithography process and method for using the same

    公开(公告)号:US10031412B1

    公开(公告)日:2018-07-24

    申请号:US15491795

    申请日:2017-04-19

    Abstract: A pellicle assembly is provided. The pellicle assembly includes a frame and a membrane connected to the frame. The pellicle assembly also includes housing connected to the frame. The pellicle assembly further includes capping member passing through an upper opening of the housing and movable along a longitudinal axis of the housing. In addition, the pellicle assembly includes fastening member connected to the capping member and movable along a direction that is perpendicular to the longitudinal axis. When the capping member is in a released position, the fastening member is located within the housing, and when the capping member is in a fastening position, a portion of the fastening member is moved to the outside of the housing for fixing a mask.

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