摘要:
A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: wherein R1 and R2 are each independently —CH3, —C2H5, —C3H7 or —C6H5; wherein R3, R4 and R5 are each independently —CH3, —C2H5, —C3H7 or —C6H5. Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.
摘要翻译:提供光聚合引发剂。 光聚合引发剂在分子中含有至少一个不饱和双键和至少一个肟酯基团。 光聚合引发剂包括由式1或2表示的化合物:其中R 1和R 2各自独立地是-CH 3,-C 2 H 5,-C 3 H 7或-C 6 H 5; 其中R3,R4和R5各自独立地是-CH3,-C2H5,-C3H7或-C6H5。 还提供了包含光聚合引发剂的感光性树脂组合物。 在光刻中使用感光性树脂组合物可减少后期显影烘烤时的挥发性残留物的形成。
摘要:
The present invention relates to a folding table and is intended to improve the ease of use of the table by enabling the folding and unfolding operation of the support legs to be performed more quickly and easily. In order to realize this, the present invention provides a folding table in which the support legs 20 are foldably formed on both side bottom surfaces of the tabletop plate 10, and a support member 30 for supporting the unfolded state is connected to the support legs 20. A guide panel 40 for guiding the movement of the support member 30 is fixed to the bottom surface of the tabletop plate 10 and guide grooves 41 are formed on both side walls of the guide panel 40. A guide rod 31, which is guided along the guide grooves 41, is integrally formed at one end of the support member 30. A rotary plate 50 is rotatably connected to the guide panel 40 by a hinge 52 formed at one end thereof, and the rotary plate 50 has an engaging jaw 51 so that the guide rod 31 can be hooked thereto. The guide panel 40 is provided with an elastic spring 53 for supporting the rotary plate 50 with a certain elastic force.
摘要:
A composition for forming column spacers is provided. The composition comprises a radical polymerization inhibitor. The use of the composition enables simultaneous formation of a saturated pattern and a semi-transmissive pattern as column spacer patterns having different shapes, whose difference in thickness is controllable as desired although the sensitivity is slightly reduced, through a slit or semi-transmissive mask by varying the kind and amount of the radical polymerization inhibitor. Further provided are column spacers formed using composition and a liquid crystal display using the column spacers.
摘要:
A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: wherein R1, R2, R3, A, X, Y, n and m are as defined in the specification. The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices. In addition, the photosensitive resin composition has excellent thermal processing characteristics.
摘要:
A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: wherein R1 and R2 are each independently —CH3, —C2H5, —C3H7 or —C6H5; wherein R3, R4 and R5 are each independently —CH3, —C2H5, —C3H7 or —C6H5. Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.
摘要翻译:提供光聚合引发剂。 光聚合引发剂在分子中含有至少一个不饱和双键和至少一个肟酯基团。 光聚合引发剂包括由式1或2表示的化合物:其中R 1和R 2各自独立地是-CH 3,-C 2 H 5,-C 3 H 7或-C 6 H 5; 其中R3,R4和R5各自独立地是-CH3,-C2H5,-C3H7或-C6H5。 还提供了包含光聚合引发剂的感光性树脂组合物。 在光刻中使用感光性树脂组合物可减少后期显影烘烤时的挥发性残留物的形成。
摘要:
The present invention relates to a photoactive compound of a novel structure represented by Chemical Formula 1 below In Chemical Formula 1, R1 and R2, R3, and A are as defined in the specification, and a photosensitive resin composition comprising the same. The photoactive compound of the present invention comprises a nitro group and a phosphonate structure and thus exhibits excellent sensitivity through efficient absorption for UV light, excellent compatibility between the photoactive compound and the alkali-soluble binder resin, and an improved solubility of the photosensitive resin composition. Furthermore, the photosensitive resin composition of the present invention has excellent residual film thickness and mechanical strength characteristics and heat-resistant, chemical-resistant, and development-resistant properties. Accordingly, the photosensitive resin composition of the present invention is advantageous in hardening the column spacers of liquid crystal displays, an overcoat, and passivation materials and also advantageous in a high-temperature process characteristic.
摘要:
The present invention relates to functional organic particles having functional nanoparticles dispersed in an organic polymeric matrix, wherein the distribution of the functional nanoparticles is increased in the direction toward increasing the particle diameter from the center of the functional organic particles, and to a method for preparing the same.