摘要:
An exposure apparatus which includes a projection optical system and exposes a substrate to radiant energy via the projection optical system, includes a temperature measuring device configured to perform measurement of a temperature of a temperature measurement portion of the projection optical system, and a controller configured to perform prediction of a change in an optical characteristic of the projection optical system based on a change in temperature measured by the temperature measuring device, and to perform processing of reduction, based on the prediction, of a change in a state of an image formed on the substrate by the projection optical system, wherein the controller is configured to perform the prediction in accordance with a second-order lag response function to the change in temperature of the temperature measurement portion.
摘要:
An image forming method includes forming an electrostatic latent image on an image bearing member having a surface of which contact angle with water is at least 90.degree., forming a toner layer on a toner carrying member, bringing the toner layer into contact with the surface of the image bearing member on which the electrostatic latent image has been formed, while rotating the image bearing member and the toner carrying member reciprocally, and developing the electrostatic latent image by the use of the toner of the toner layer to form a toner image.
摘要:
An electrophotographic image forming method including a toner image transfer step and eliminating an independent step for cleaning transfer residual toner is operated without causing ghost images and with good gradation and dot reproducibilities. In the method, the photosensitive member is exposed at an exposure intensity which is at least a minimum exposure intensity and below a maximum exposure intensity. The minimum exposure intensity is determined on a surface potential-exposure intensity characteristic curve of the photosensitive member by determining a first slope S1 of a straight line connecting a point giving a dark part potential Vd and a point giving a value of (Vd+ a residual potential Vr)/2, determining a contact point between a tangent line having a slope of S1/20 and the surface potential-exposure intensity characteristic curve and determining the minimum exposure intensity as an exposure intensity at the contact point. The maximum exposure intensity is determined as 5 times a half-attenuation exposure intensity.
摘要:
An image forming process is carried out through the steps of electrostatically charging a cylindrical electrophotographic photosensitive member, forming an electrostatic latent image by image exposure, developing the latent image and transferring the developed image to a transfer member. The photosensitive member is comprised of a conductive support and a photosensitive layer which contains oxytitanium phthalocyanine as a charge-generating material and a charge-transporting material. The charge-generating material and the charge-transporting material have a work function (W.sub.F.sup.CG) and a work function (W.sub.F.sup.CT), respectively. Those work functions satisfies the following relationship:-0.2
摘要:
An photosensitive member suitable for use in the electrophotographic apparatus of reversal development-type is formed by an electroconductive support, a charge-generation layer and a charge-transport layer disposed in this order. The charge-generation layer comprises oxytitanium phthalocyanine and the charge-transport layer is formed in a thickness of 22 microns or larger. The oxytitanium phthalocyanine is highly sensitive so that a low dark-part potential of 600V or lower (absolute) is sufficient. Because of the low dark-part potential and the thick charge transport layer, image defect, such as fog and black spots are effectively suppressed.
摘要:
An electrophotographic photosensitive member is formed by a cylindrical substrate and a photosensitive layer disposed on the cylindrical substrate. The cylindrical substrate has a circumferential end section adjacent to at least one longitudinal end of the cylindrical substrate, and the circumferential end section has the photosensitive layer thereon removed and has been subjected to cutting. The electrophotographic photosensitive member is characterized by the circumferential end section having a smooth surface on the cylindrical substrate. The photosensitive member co-operates with a peripheral member, such as a spacer or a sealing member, at the end section in performing a stable electrophotographic process.
摘要:
An electrophotographic photosensitive member comprises an electroconductive support, and at least an undercoating layer, a charge generation layer and a charge transport layer, laid successively on the electroconductive support in this order, and the undercoating layer contains N-methoxymethylated nylon 6 containing not more than 10 ppm of components having a molecular weight of not more than 1,000.
摘要:
An exposure apparatus for exposing a substrate to a light comprises a projection optical system including an optical element and configured to project a light from an original onto the substrate, an adjusting device configured to adjust at least one of a position, an orientation and a shape of the optical element, and a controller configured to obtain an adjusting amount of the optical element based on a value of an objective function relating to an optical characteristic of the projection optical system, and to control the adjusting device based on the obtained adjusting amount. The objective function includes a variable which represents an upper limit of the adjusting amount.
摘要:
An exposure apparatus for exposing a substrate to a light comprises a projection optical system including an optical element and configured to project a light from an original onto the substrate, an adjusting device configured to adjust at least one of a position, an orientation and a shape of the optical element, and a controller configured to obtain an adjusting amount of the optical element based on a value of an objective function relating to an optical characteristic of the projection optical system, and to control the adjusting device based on the obtained adjusting amount. The objective function includes a variable which represents an upper limit of the adjusting amount.
摘要:
An aberration changing optical system to be used with a projection optical system of a projection exposure apparatus, includes an optical element having at least one of a cylindrical surface and a toric surface and being rotatable about and tiltable to an optical axis of the optical system. In another form, the aberration changing optical system includes an optical element having different refracting powers in two orthogonal directions or having a refracting power only in one direction, the optical element being made rotatable about and tiltable to an optical axis of the optical system.