Exposure apparatus and method of manufacturing device
    21.
    发明授权
    Exposure apparatus and method of manufacturing device 有权
    曝光装置及其制造方法

    公开(公告)号:US09383660B2

    公开(公告)日:2016-07-05

    申请号:US13464114

    申请日:2012-05-04

    IPC分类号: G03B27/52 G03F7/20

    CPC分类号: G03F7/70883 G03F7/705

    摘要: An exposure apparatus which includes a projection optical system and exposes a substrate to radiant energy via the projection optical system, includes a temperature measuring device configured to perform measurement of a temperature of a temperature measurement portion of the projection optical system, and a controller configured to perform prediction of a change in an optical characteristic of the projection optical system based on a change in temperature measured by the temperature measuring device, and to perform processing of reduction, based on the prediction, of a change in a state of an image formed on the substrate by the projection optical system, wherein the controller is configured to perform the prediction in accordance with a second-order lag response function to the change in temperature of the temperature measurement portion.

    摘要翻译: 一种包括投影光学系统并通过投影光学系统将基板暴露于辐射能的曝光装置,包括:温度测量装置,被配置为执行投影光学系统的温度测量部分的温度测量;以及控制器,被配置为 基于由温度测量装置测量的温度变化来执行投影光学系统的光学特性的变化的预测,并且基于预测,执行基于预测的图像形成状态的变化的处理 所述投影光学系统的所述基板,其中,所述控制器被配置为根据所述温度测量部分的温度变化的二阶滞后响应函数来执行所述预测。

    Image forming method
    23.
    发明授权
    Image forming method 失效
    图像形成方法

    公开(公告)号:US5576810A

    公开(公告)日:1996-11-19

    申请号:US536843

    申请日:1995-09-29

    IPC分类号: G03G15/32 G03G21/00 G03G15/04

    摘要: An electrophotographic image forming method including a toner image transfer step and eliminating an independent step for cleaning transfer residual toner is operated without causing ghost images and with good gradation and dot reproducibilities. In the method, the photosensitive member is exposed at an exposure intensity which is at least a minimum exposure intensity and below a maximum exposure intensity. The minimum exposure intensity is determined on a surface potential-exposure intensity characteristic curve of the photosensitive member by determining a first slope S1 of a straight line connecting a point giving a dark part potential Vd and a point giving a value of (Vd+ a residual potential Vr)/2, determining a contact point between a tangent line having a slope of S1/20 and the surface potential-exposure intensity characteristic curve and determining the minimum exposure intensity as an exposure intensity at the contact point. The maximum exposure intensity is determined as 5 times a half-attenuation exposure intensity.

    摘要翻译: 包括调色剂图像转印步骤和消除用于清洁转印残余调色剂的独立步骤的电子照相图像形成方法被操作而不引起重影并具有良好的灰度和点重现性。 在该方法中,感光构件以至少最小曝光强度并低于最大曝光强度的曝光强度曝光。 通过确定连接提供暗部电位Vd的点的直线的第一斜率S1和给出(Vd + a残留电位)的点,确定感光构件的表面电位 - 曝光强度特性曲线上的最小曝光强度 Vr)/ 2,确定具有S1 / 20的斜率的切线与表面电位 - 曝光强度特性曲线之间的接触点,并确定最小曝光强度作为接触点处的曝光强度。 最大曝光强度被确定为半衰减曝光强度的5倍。

    Image forming method
    24.
    发明授权
    Image forming method 失效
    图像形成方法

    公开(公告)号:US5384625A

    公开(公告)日:1995-01-24

    申请号:US171409

    申请日:1993-12-22

    摘要: An image forming process is carried out through the steps of electrostatically charging a cylindrical electrophotographic photosensitive member, forming an electrostatic latent image by image exposure, developing the latent image and transferring the developed image to a transfer member. The photosensitive member is comprised of a conductive support and a photosensitive layer which contains oxytitanium phthalocyanine as a charge-generating material and a charge-transporting material. The charge-generating material and the charge-transporting material have a work function (W.sub.F.sup.CG) and a work function (W.sub.F.sup.CT), respectively. Those work functions satisfies the following relationship:-0.2

    摘要翻译: 通过对圆柱形电子照相感光构件静电充电,通过图像曝光形成静电潜像,显影潜像并将显影图像转印到转印构件的步骤进行图像形成处理。 感光构件由导电性支持体和含有氧钛酞菁作为电荷发生材料和电荷输送材料的感光层构成。 电荷产生材料和电荷输送材料分别具有功函数(WFCG)和功函数(WFCT)。 这些功函数满足以下关系:-0.2

    Photosensitive member, electrophotographic apparatus and image forming
method using same
    25.
    发明授权
    Photosensitive member, electrophotographic apparatus and image forming method using same 失效
    感光构件,电子照相设备和使用其的成像方法

    公开(公告)号:US5376485A

    公开(公告)日:1994-12-27

    申请号:US611642

    申请日:1990-11-13

    IPC分类号: G03G5/047 G03G5/06

    CPC分类号: G03G5/0696 G03G5/047

    摘要: An photosensitive member suitable for use in the electrophotographic apparatus of reversal development-type is formed by an electroconductive support, a charge-generation layer and a charge-transport layer disposed in this order. The charge-generation layer comprises oxytitanium phthalocyanine and the charge-transport layer is formed in a thickness of 22 microns or larger. The oxytitanium phthalocyanine is highly sensitive so that a low dark-part potential of 600V or lower (absolute) is sufficient. Because of the low dark-part potential and the thick charge transport layer, image defect, such as fog and black spots are effectively suppressed.

    摘要翻译: 适用于反转显影型的电子照相设备的感光构件由依次设置的导电性支持体,电荷产生层和电荷输送层形成。 电荷产生层包含氧钛酞菁,电荷传输层的厚度为22微米或更大。 氧钛酞菁是高度敏感的,使得600V或更低(绝对)的低暗部电位就足够了。 由于暗部电位低,电荷输送层厚,因此有效地抑制了雾点和黑点等图像缺陷。

    Electrophotographic photosensitive member and apparatus including same
    26.
    发明授权
    Electrophotographic photosensitive member and apparatus including same 失效
    电子照相感光构件及包括其的设备

    公开(公告)号:US5362588A

    公开(公告)日:1994-11-08

    申请号:US920637

    申请日:1992-07-28

    CPC分类号: G03G15/751 G03G5/02

    摘要: An electrophotographic photosensitive member is formed by a cylindrical substrate and a photosensitive layer disposed on the cylindrical substrate. The cylindrical substrate has a circumferential end section adjacent to at least one longitudinal end of the cylindrical substrate, and the circumferential end section has the photosensitive layer thereon removed and has been subjected to cutting. The electrophotographic photosensitive member is characterized by the circumferential end section having a smooth surface on the cylindrical substrate. The photosensitive member co-operates with a peripheral member, such as a spacer or a sealing member, at the end section in performing a stable electrophotographic process.

    摘要翻译: 电子照相感光构件由圆柱形基底和设置在圆柱形基底上的感光层形成。 圆筒形基板具有与圆柱形基板的至少一个纵向端部相邻的圆周端部分,并且圆周端部部分具有去除其上的感光层并且已经被切割。 电子照相感光构件的特征在于圆柱形基底上的圆周端部具有光滑的表面。 在执行稳定的电子照相处理时,感光构件在端部与外围构件例如间隔件或密封构件协作。

    Electrophotographic photosensitive member with substituted nylon
interlayer
    27.
    发明授权
    Electrophotographic photosensitive member with substituted nylon interlayer 失效
    带有取代尼龙夹层的电子照相感光构件

    公开(公告)号:US5017449A

    公开(公告)日:1991-05-21

    申请号:US468838

    申请日:1990-01-19

    IPC分类号: G03G5/06 G03G5/14

    CPC分类号: G03G5/142

    摘要: An electrophotographic photosensitive member comprises an electroconductive support, and at least an undercoating layer, a charge generation layer and a charge transport layer, laid successively on the electroconductive support in this order, and the undercoating layer contains N-methoxymethylated nylon 6 containing not more than 10 ppm of components having a molecular weight of not more than 1,000.

    摘要翻译: 电子照相感光构件包括导电载体,以及至少底涂层,电荷产生层和电荷输送层,依次铺设在导电载体上,底涂层含有不超过载体的N-甲氧基甲基化尼龙6 10ppm的分子量不大于1,000的组分。

    Exposure apparatus and device manufacturing method
    28.
    发明授权
    Exposure apparatus and device manufacturing method 失效
    曝光装置和装置制造方法

    公开(公告)号:US08634061B2

    公开(公告)日:2014-01-21

    申请号:US12787037

    申请日:2010-05-25

    IPC分类号: G03B27/52 G03F7/20

    摘要: An exposure apparatus for exposing a substrate to a light comprises a projection optical system including an optical element and configured to project a light from an original onto the substrate, an adjusting device configured to adjust at least one of a position, an orientation and a shape of the optical element, and a controller configured to obtain an adjusting amount of the optical element based on a value of an objective function relating to an optical characteristic of the projection optical system, and to control the adjusting device based on the obtained adjusting amount. The objective function includes a variable which represents an upper limit of the adjusting amount.

    摘要翻译: 用于将基板曝光的曝光装置包括:投影光学系统,包括光学元件并被配置为将来自原稿的光投射到基板上;调节装置,被配置为调节位置,取向和形状中的至少一个 以及控制器,被配置为基于与投影光学系统的光学特性相关的目标函数的值来获得光学元件的调整量,并且基于获得的调节量来控制调节装置。 目标函数包括表示调整量的上限的变量。

    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    29.
    发明申请
    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 失效
    曝光装置和装置制造方法

    公开(公告)号:US20100302524A1

    公开(公告)日:2010-12-02

    申请号:US12787037

    申请日:2010-05-25

    IPC分类号: G03B27/54

    摘要: An exposure apparatus for exposing a substrate to a light comprises a projection optical system including an optical element and configured to project a light from an original onto the substrate, an adjusting device configured to adjust at least one of a position, an orientation and a shape of the optical element, and a controller configured to obtain an adjusting amount of the optical element based on a value of an objective function relating to an optical characteristic of the projection optical system, and to control the adjusting device based on the obtained adjusting amount. The objective function includes a variable which represents an upper limit of the adjusting amount.

    摘要翻译: 用于将基板曝光的曝光装置包括:投影光学系统,包括光学元件并被配置为将来自原稿的光投射到基板上;调节装置,被配置为调节位置,取向和形状中的至少一个 以及控制器,被配置为基于与投影光学系统的光学特性相关的目标函数的值来获得光学元件的调整量,并且基于获得的调节量来控制调节装置。 目标函数包括表示调整量的上限的变量。

    Aberration correcting optical system
    30.
    发明授权
    Aberration correcting optical system 失效
    畸变校正光学系统

    公开(公告)号:US06924937B2

    公开(公告)日:2005-08-02

    申请号:US09438491

    申请日:1999-11-12

    IPC分类号: G02B27/00 G03F7/20 G02B13/08

    摘要: An aberration changing optical system to be used with a projection optical system of a projection exposure apparatus, includes an optical element having at least one of a cylindrical surface and a toric surface and being rotatable about and tiltable to an optical axis of the optical system. In another form, the aberration changing optical system includes an optical element having different refracting powers in two orthogonal directions or having a refracting power only in one direction, the optical element being made rotatable about and tiltable to an optical axis of the optical system.

    摘要翻译: 与投影曝光设备的投影光学系统一起使用的像差变化光学系统包括具有圆柱形表面和复曲面表面中的至少一个并且可围绕光学系统的光轴旋转并可倾斜的光学元件。 在另一种形式中,像差变化光学系统包括在两个正交方向上具有不同屈光力或仅在一个方向上具有折射能力的光学元件,该光学元件可围绕光学系统的光轴旋转并可倾斜。