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32 条记录 (耗时 0.012 秒)

    System to reduce heat-induced distortion of photomasks during lithography
    31.
    发明授权
    System to reduce heat-induced distortion of photomasks during lithography 失效
    在光刻期间减少光掩模的热诱导失真的系统

    公开(公告)号：US06521901B1

    公开(公告)日：2003-02-18

    申请号：US09451683

    申请日：1999-11-30

    申请人： Bassam Shamoun ,  David Trost

    发明人： Bassam Shamoun ,  David Trost

    IPC分类号： G01B1126

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/00 ,  H01J37/3174 ,  H01J2237/31794

    摘要： The present invention relates generally to methods, apparatuses and materials to reduce or minimize the heating of a substrate (and associated distortions of the photomask) caused by electron-beam energy deposited in the substrate during patterning. The present invention provides useful materials and methods for reducing such reflection or re-radiation effects, leading to temperature stability of the substrate, reduced thermal distortion and the possibility of increased patterning accuracy. The infrared absorbing materials of the present invention also possess sufficient electrical conductivity to dissipate scattered electrons residing on the material, and sufficient thermal conductivity to dissipate heat rapidly and not result in local heating or significant temperature rise of the absorber.

    摘要翻译： 本发明一般涉及减少或最小化在图案化期间由衬底中沉积的电子束能量引起的衬底加热（和光掩模的相关变形）的方法，装置和材料。 本发明提供用于减少这种反射或再辐射效应的有用的材料和方法，导致衬底的温度稳定性，降低的热变形和增加图案精度的可能性。 本发明的红外线吸收材料还具有足够的电导率以消散驻留在材料上的散射电子，并且具有足够的导热性以快速散发热量，并且不会导致吸收体的局部加热或显着的温度升高。

    System and method to correct for distortion caused by bulk heating in a substrate
    32.
    发明授权
    System and method to correct for distortion caused by bulk heating in a substrate 失效
    校正基板中体积加热引起的变形的系统和方法

    公开(公告)号：US06424879B1

    公开(公告)日：2002-07-23

    申请号：US09291167

    申请日：1999-04-13

    申请人： Francis C. Chilese ,  Bassam Shamoun ,  David Trost

    发明人： Francis C. Chilese ,  Bassam Shamoun ,  David Trost

    IPC分类号： G06F1900

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/30455 ,  H01J2237/30461

    摘要： An electron beam writing system includes an electron beam patterning machine operable to emit an electron beam to form a pattern on a substrate. A computer control system, coupled to the electron beam patterning machine, has a plurality of pre-computed distortion maps. Each distortion map describes expected distortions of the substrate caused by bulk heating resulting from exposure to the electron beam. The computer control system controls the electron beam patterning machine using the distortion maps in order to adjust for the expected distortions.

    摘要翻译： 电子束写入系统包括可操作以发射电子束以在衬底上形成图案的电子束图案形成机。 耦合到电子束图案机的计算机控制系统具有多个预先计算的失真图。 每个失真图描述了由于暴露于电子束而产生的体积加热引起的基板的预期失真。 计算机控制系统使用失真图来控制电子束图形机，以便对预期的失真进行调整。