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公开(公告)号:US20180257934A1
公开(公告)日:2018-09-13
申请号:US15761040
申请日:2016-06-29
Applicant: IWATANI CORPORATION
Inventor: Naohisa MAKIHIRA , Koichi IZUMI , Masahiro FURUTANI
CPC classification number: C01B13/11 , B01D53/04 , B01D53/0407 , B01D53/0446 , B01D53/0454 , B01D2253/106 , B01D2256/14 , B01D2257/404 , B01D2259/40086 , B01D2259/40088
Abstract: A method for supplying an ozone gas includes the steps of: supplying an ozone gas from an ozone gas source through a second channel; and switching the ozone gas to a state where the ozone gas is supplied through a first channel and supplying the ozone gas having a reduced concentration of nitrogen oxide. The step of supplying the ozone gas through the second channel includes the step of introducing a part of the ozone gas to a first vessel so that ozone adsorbability of a first adsorbent is reduced. In the step of supplying the ozone gas to the object through the first channel, the ozone gas passes through the first vessel holding the first adsorbent having reduced ozone adsorbability.
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公开(公告)号:US09533268B2
公开(公告)日:2017-01-03
申请号:US14511214
申请日:2014-10-10
Applicant: Iwatani Corporation , CENTRAL GLASS COMPANY, LIMITED
Inventor: Kunihiko Koike , Yu Yoshino , Naohisa Makihira , Takehiko Senoo , Toshihiro Aida , Tomoya Biro , Hiroshi Ichimaru , Masahiro Tainaka
CPC classification number: B01F5/10 , B01F15/00162 , B01F15/005 , B01F15/026 , G05D11/001 , G05D11/138 , Y10T137/0391 , Y10T137/8766
Abstract: A method and apparatus, for supplying high-pressure mixed gas of a low-vapor-pressure first gas as an active gas and a high-vapor-pressure second gas, are arranged to reduce an amount of the first gas discarded. The mixed gas in a high-pressure state is supplied from a mixing container to a use point. Upon reduction of pressure in the mixing container to a setpoint as a result of supply to the use point, a predetermined amount of the first gas is charged into a replenishment container connected to the mixing container by a replenishment line having a replenishment valve, and which is evacuated. As the second gas is charged into the replenishment container charged with the first gas, the replenishment valve is opened such that the first gas in the replenishment container is forced out by the second gas, thereby charging the mixing container with the mixed gas in the high-pressure condition.
Abstract translation: 用于提供作为活性气体的低蒸气压第一气体和高蒸气压的第二气体的高压混合气体的方法和装置被布置成减少废弃的第一气体的量。 高压状态的混合气体从混合容器供给到使用点。 在将混合容器中的压力降低到作为使用点的供给量的设定点时,将预定量的第一气体通过具有补充阀的补充管线装入连接到混合容器的补充容器中,并且 被疏散。 随着第二气体被充入装有第一气体的补充容器中,补充阀打开,使得补充容器中的第一气体被第二气体强制排出,从而将混合容器与高混合气体充满 压力条件
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公开(公告)号:US20160010798A1
公开(公告)日:2016-01-14
申请号:US14789122
申请日:2015-07-01
Applicant: IWATANI CORPORATION , TOYOTA JIDOSHA KABUSHIKI KAISHA
Inventor: Yoshihiro HORI , Yuu MATSUNO , Hiroaki NEMOTO , Hideyo OMORI , Toshiyuki KONDO
IPC: F17C5/04
CPC classification number: F17C5/04 , Y02E60/321
Abstract: A suction method that sucks inside of a filling nozzle used for supply of hydrogen by using a suction nozzle that is engaged with the filling nozzle, the suction method comprising: evacuating a vacuum chamber by using a vacuum pump; and sucking inside of the suction nozzle by using the evacuated vacuum chamber.
Abstract translation: 一种抽吸方法,其通过使用与所述填充喷嘴接合的吸嘴吸入用于供给氢的填充喷嘴内部,所述抽吸方法包括:通过使用真空泵抽真空室; 并通过使用真空室吸入吸嘴内部。
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公开(公告)号:US09159622B2
公开(公告)日:2015-10-13
申请号:US14454136
申请日:2014-08-07
Applicant: DISCO CORPORATION , IWATANI CORPORATION
Inventor: Sakae Matsuzaki , Takatoshi Masuda , Nozomi Maemoto , Yu Yoshino , Takehiko Senoo , Toshihiro Aida , Tomoya Biro
IPC: H01L21/78 , H01L21/268 , H01L21/3065
CPC classification number: H01L21/78 , H01L21/02076 , H01L21/2686 , H01L21/3065
Abstract: A dividing method for a wafer includes a step of irradiating a laser beam along streets to form modified regions in an inside of a wafer, a step of dividing the wafer into individual chips beginning with starting points given by the modified regions, a step of placing a processing chamber in which the wafer is charged to a vacuum state and fill the processing chamber with inert gas, and a step of introducing etching gas into the processing chamber filled with the inert gas to etch side faces of the chips.
Abstract translation: 晶片的分割方法包括沿着街道照射激光束以在晶片的内部形成改质区域的步骤,将晶片分成以修改区域给出的起始点开始的各个芯片的步骤,放置 处理室,其中将晶片充电至真空状态并用惰性气体填充处理室;以及将蚀刻气体引入填充有惰性气体的处理室中以蚀刻芯片的侧面的步骤。
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公开(公告)号:US20150075516A1
公开(公告)日:2015-03-19
申请号:US14260797
申请日:2014-04-24
Applicant: Iwatani Corporation , Asahi Seisakusho Co., Ltd.
Inventor: Kenichiro Inada , Akio Wada
CPC classification number: F24C3/12 , A47J37/0713 , A47J2037/0777
Abstract: A structure which performs safety operation with certainty when a gas container is replaced or when an abnormality occurs and is easy to used is provided. A cartridge-type gas grill 11 having a plurality of systems includes two gas container accommodation sections 12; two burners 13; and gas flow paths for connecting the gas container accommodation sections 12 and the burners 13 in a one-to-one relationship. All the gas container accommodation sections 12 are each provided with a container attachment switch 19 for detecting that a gas container 15 is connected. Open/close valves 18, provided in the gas flow paths, for adjusting a gas flow are each formed of an electromagnetic valve. Operation knobs 63 each for making an operation on the corresponding open/close valve 18 are each provided with an ignition switch 20, which is turned ON when the corresponding open/close valve 18 is opened and is turned OFF when the corresponding open/close valve 18 is closed. The container attachment switches 19, the open/close valves 18, and the ignition switches 20 are electronically controlled. For an ignition process, the ignition switches are validated under the condition that all the container attachment switches 19 are ON. For a recovery process, all the ignition switches 19 need to be turned OFF.
Abstract translation: 提供一种在更换气体容器或发生异常并易于使用时确实进行安全操作的结构。 具有多个系统的盒式气体格栅11包括两个气体容纳容纳部分12; 两个燃烧器13; 以及用于以一对一的关系连接气体容器容纳部分12和燃烧器13的气体流动路径。 所有的气体容纳容纳部分12均设有用于检测气体容器15连接的容器附接开关19。 设置在气体流动路径中用于调节气体流量的打开/关闭阀18各自由电磁阀形成。 每个用于在相应的开/关阀18上进行操作的操作旋钮63分别设置有点火开关20,其在相应的打开/关闭阀18打开时接通,并且当相应的开/关阀 18关闭。 容器安装开关19,打开/关闭阀18和点火开关20被电子控制。 对于点火过程,点火开关在所有容器安装开关19接通的条件下被验证。 对于恢复过程,所有点火开关19都需要关闭。
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公开(公告)号:USD719394S1
公开(公告)日:2014-12-16
申请号:US29481781
申请日:2014-02-10
Applicant: Iwatani Corporation
Designer: Kenichiro Inada
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