公开(公告)号：US20190384184A1

公开(公告)日：2019-12-19

申请号：US16431833

申请日：2019-06-05

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscu Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Raaymakers ,  Marinus Petrus Reijnders

IPC: G03F7/20 ,  G01N21/956

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US10180630B2

公开(公告)日：2019-01-15

申请号：US15639467

申请日：2017-06-30

Applicant: ASML Netherlands B.V.

Inventor： Teunis Willem Tukker ,  Nitesh Pandey ,  Coen Adrianus Verschuren

IPC: G03F7/20 ,  F21V9/30 ,  F21V14/08 ,  F21Y115/10

Abstract: An illumination system has a microLED array 502. The microLED array 502 is imaged or placed very close to a phosphor coated glass disc 504 which upconverts the light from the microLED array into a narrow band emission. The plate has at least two different photoluminescent materials arranged to be illuminated by the microLED array and to thereby emit output light. The different photoluminescent materials have different emission spectral properties of the output light, e.g. different center wavelength and optionally different bandwidth. Illumination of different photoluminescent materials by the illumination sources is selectable, by selective activation of the microLEDs or by movement of the photoluminescent materials relative to the illumination sources, to provide different illumination of the different photoluminescent materials. This provides tunable spectral properties of the output light. Selectively configurable filters 506 are arranged to filter the output light in accordance with the selected illumination of the different photoluminescent materials.

公开(公告)号：US20180173111A1

公开(公告)日：2018-06-21

申请号：US15833130

申请日：2017-12-06

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Armand Eugene Albert Koolen

IPC: G03F7/20 ,  H01L21/68

Abstract: Metrology apparatus and methods for measuring a structure formed on a substrate by a lithographic process are disclosed. In one arrangement an optical system illuminates the structure with radiation and detects radiation scattered by the structure. The optical system comprises a first dispersive element. The first dispersive element spectrally disperses scattered radiation exclusively from a first portion of a pupil plane field distribution along a first dispersion direction. A second dispersive element, separated from the first dispersive element, spectrally disperses scattered radiation exclusively from a second portion of the pupil plane field distribution, different from the first portion of the pupil plane field distribution, along a second dispersion direction.

公开(公告)号：US20180004095A1

公开(公告)日：2018-01-04

申请号：US15639467

申请日：2017-06-30

Applicant: ASML Netherlands B.V.

Inventor： Teunis Willem TUKKER ,  Nitesh Pandey ,  Coen Adrianus Verschuren

IPC: G03F7/20 ,  F21V9/16 ,  F21V14/08 ,  F21Y2115/10

CPC classification number: G03F7/70191 ,  F21V9/30 ,  F21V14/08 ,  F21Y2115/10 ,  G03F7/7005 ,  G03F7/70575 ,  G03F7/70625 ,  G03F7/70633

Abstract: An illumination system has a microLED array 502. The microLED array 502 is imaged or placed very close to a phosphor coated glass disc 504 which upconverts the light from the microLED array into a narrow band emission. The plate has at least two different photoluminescent materials arranged to be illuminated by the microLED array and to thereby emit output light. The different photoluminescent materials have different emission spectral properties of the output light, e.g. different center wavelength and optionally different bandwidth. Illumination of different photoluminescent materials by the illumination sources is selectable, by selective activation of the microLEDs or by movement of the photoluminescent materials relative to the illumination sources, to provide different illumination of the different photoluminescent materials. This provides tunable spectral properties of the output light. Selectively configurable filters 506 are arranged to filter the output light in accordance with the selected illumination of the different photoluminescent materials.

公开(公告)号：US11086240B2

公开(公告)日：2021-08-10

申请号：US16470905

申请日：2017-11-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Sebastianus Adrianus Goorden ,  Nitesh Pandey ,  Duygu Akbulut ,  Alessandro Polo ,  Simon Reinaid Huisman

IPC: G01B11/02 ,  G03F9/00 ,  G03F7/20

Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.

公开(公告)号：US10996571B2

公开(公告)日：2021-05-04

申请号：US16856128

申请日：2020-04-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Robert John Socha ,  Arie Jeffrey Den Boef ,  Nitesh Pandey

IPC: G03F7/20 ,  G01N21/956 ,  G01B11/27 ,  G01N21/88

Abstract: A method of adjusting a metrology apparatus, the method including: spatially dividing an intensity distribution of a pupil plane of the metrology apparatus into a plurality of pixels; and reducing an effect of a structural asymmetry in a target on a measurement by the metrology apparatus on the target, by adjusting intensities of the plurality of pixels.

公开(公告)号：US20210123724A1

公开(公告)日：2021-04-29

申请号：US17141698

申请日：2021-01-05

Applicant: ASML Netherlands B.V.

Inventor： Marinus Johannes Maria VAN DAM ,  Arie Jeffrey Den Boef ,  Nitesh Pandey

IPC: G01B11/25 ,  G02F1/01 ,  G02F1/33

Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source configured to generate illumination radiation; at least two illumination branches comprising at least one optical fiber and configured to illuminate a structure on a substrate from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.

公开(公告)号：US10816909B2

公开(公告)日：2020-10-27

申请号：US16150879

申请日：2018-10-03

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Nitesh Pandey ,  Vasco Tomas Tenner ,  Willem Marie Julia Marcel Coene ,  Patrick Warnaar

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/47 ,  G01N21/95 ,  G01B11/06 ,  G01B11/02

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US10788758B2

公开(公告)日：2020-09-29

申请号：US15954995

申请日：2018-04-17

Applicant: ASML Netherlands B.V.

Inventor： Jin Lian ,  Nitesh Pandey

IPC: G03F7/20

Abstract: Methods and apparatus for measuring a parameter of interest of a target structure formed on substrate are disclosed. In one arrangement, the target structure comprises a first sub-target and a second sub-target. The first sub-target comprises a first bias and the second sub-target comprises a second bias. The method comprises determining the parameter of interest using a detected or estimated reference property of radiation at a first wavelength scattered from the first sub-target and a detected or estimated reference property of radiation at a second wavelength scattered from the second sub-target. The first wavelength is different to the second wavelength.

公开(公告)号：US10386735B2

公开(公告)日：2019-08-20

申请号：US15754470

申请日：2016-08-22

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus Mathijssen ,  Arie Jeffrey Den Boef ,  Nitesh Pandey ,  Patricius Aloysius Jacobus Tinnemans ,  Stefan Michiel Witte ,  Kjeld Sijbrand Eduard Eikema

IPC: G03F9/00 ,  G03F7/20 ,  G06T7/73 ,  G01B11/27

Abstract: A lithographic apparatus comprises comprise a substrate table constructed to hold a substrate; and a sensor configured to sense a position of an alignment mark provided onto the substrate held by the substrate table. The sensor comprises a source of radiation configured to illuminate the alignment mark with a radiation beam, a detector configured to detect the radiation beam, having interacted with the alignment mark, as an out of focus optical pattern, and a data processing system. The data processing system is configured to receive image data representing the out of focus optical pattern, and process the image data for determining alignment information, comprising applying a lensless imaging algorithm to the out of focus optical pattern.